|
Patent 6204086: Method for manufacturing semiconductor components having micromechanical structures
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL : Physical stress responsive : Having diaphragm element : Packaging (e.g., with mounting, encapsulating, etc.) or treatment of packaged semiconductor)
Patent 6204087: Fabrication of three-dimensional architecture for solid state radiation detectors
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL : Responsive to corpuscular radiation (e.g., nuclear particle detector, etc.) : Packaging (e.g., with mounting, encapsulating, etc.) or treatment of packaged semiconductor)
Patent 6204088: Glue-free backside illuminated photodiode apparatus and fabrication process
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING DEVICE OR CIRCUIT RESPONSIVE TO NONELECTRICAL SIGNAL : Responsive to electromagnetic radiation : Packaging (e.g., with mounting, encapsulating, etc.) or treatment of packaged semiconductor)
Patent 6204089: Method for forming flip chip package utilizing cone shaped bumps
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Assembly of plural semiconductive substrates each possessing electrical device : Flip-chip-type assembly : Chalcogen (i.e., oxygen (O), sulfur (S), selenium (Se), tellurium (Te)) containing)
Patent 6204090: Method for attaching a die to a carrier utilizing an electrically nonconductive layer
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Assembly of plural semiconductive substrates each possessing electrical device : Flip-chip-type assembly : Chalcogen (i.e., oxygen (O), sulfur (S), selenium (Se), tellurium (Te)) containing)
Patent 6204091: Method of assembling a semiconductor chip package
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Assembly of plural semiconductive substrates each possessing electrical device : Flip-chip-type assembly : Chalcogen (i.e., oxygen (O), sulfur (S), selenium (Se), tellurium (Te)) containing)
Patent 6204092: Apparatus and method for transferring semiconductor die to a carrier
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Making plural separate devices : Substrate dicing : And encapsulating)
Patent 6204093: Method and apparatus for applying viscous materials to a lead frame
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Including adhesive bonding step : Substrate dicing)
Patent 6204094: Method and apparatus for populating an adhesive sheet with particles
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : With vibration step : Electrically conductive adhesive)
Patent 6204095: Method of forming overmolded chip scale package and resulting product
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : PACKAGING (E.G., WITH MOUNTING, ENCAPSULATING, ETC.) OR TREATMENT OF PACKAGED SEMICONDUCTOR : Encapsulating : And encapsulating)
Patent 6204096: Method for reducing critical dimension of dual damascene process using spin-on-glass process
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING DEVICE ARRAY AND SELECTIVELY INTERCONNECTING : Encapsulating)
Patent 6204097: Semiconductor device and method of manufacture
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING REGENERATIVE-TYPE SWITCHING DEVICE (E.G., SCR, IGBT, THYRISTOR, ETC.) : Using structure alterable to nonconductive state (i.e., fuse))
Patent 6204098: Method of formation in a silicon wafer of an insulated well
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : On insulating substrate or layer (e.g., TFT, etc.) : Substantially incomplete signal charge transfer (e.g., bucket brigade, etc.))
Patent 6204099: Method for producing insulated gate thin film semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : On insulating substrate or layer (e.g., TFT, etc.) : Having insulated gate : Vertical channel)
Patent 6204100: CMOS device and method for fabricating the same
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : On insulating substrate or layer (e.g., TFT, etc.) : Having insulated gate : Complementary field effect transistors : Complementary field effect transistors)
Patent 6204101: Method of manufacturing semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : On insulating substrate or layer (e.g., TFT, etc.) : Having insulated gate : Including recrystallization step : Including differential oxidation)
Patent 6204102: Method of fabricating compound semiconductor devices using lift-off of insulating film
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having Schottky gate (e.g., MESFET, HEMT, etc.) : Self-aligned : Doping of semiconductive region : T-gate : Having blooming suppression structure (e.g., antiblooming drain, etc.))
Patent 6204103: Process to make complementary silicide metal gates for CMOS technology
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Complementary insulated gate field effect transistors (i.e., CMOS) : Including isolation structure : Dielectric isolation formed by grooving and refilling with dielectric material : Having well structure of opposite conductivity type : Plural wells :)
Patent 6204104: Semiconductor device and manufacturing method thereof
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including bipolar transistor (i.e., BiMOS) : And contact formation)
Patent 6204105: Method for fabricating a polycide semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204106: Method of fabricating a DRAM access transistor with dual gate oxide technique
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204107: Method for forming multi-layered liner on sidewall of node contact opening
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204108: Method of fabricating a dynamic random access memory capacitor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204109: Method for forming a cylindrical capacitor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204110: Methods of forming an SRAM
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Lateral bipolar transistor)
Patent 6204111: Fabrication method of capacitor for integrated circuit
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Plural doping steps)
Patent 6204112: Process for forming a high density semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Trench capacitor : Including transistor formed on trench sidewalls)
Patent 6204113: Method of forming data storage capacitors in dynamic random access memory cells
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204114: Method of making high density semiconductor memory
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204115: Manufacture of high-density pillar memory cell arrangement
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204116: Method of fabricating a capacitor with a low-resistance electrode structure in integrated circuit
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204117: Removal of silicon oxynitride on a capacitor electrode for selective hemispherical grain growth
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204118: Method for fabrication an open can-type stacked capacitor on local topology
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including doping of semiconductive region)
Patent 6204119: Manufacturing method for a capacitor in an integrated memory circuit
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including selectively removing material to undercut and expose storage node layer : Multiple doping steps)
Patent 6204120: Semiconductor wafer pretreatment utilizing ultraviolet activated chlorine
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including texturizing storage node layer : Multiple doping steps)
Patent 6204121: Method for bottom electrode of capacitor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including passive device (e.g., resistor, capacitor, etc.) : Capacitor : Stacked capacitor : Including texturizing storage node layer : Multiple doping steps)
Patent 6204122: Methods of forming nonvolatile integrated circuit memory devices having high capacitive coupling ratios
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Having additional gate electrode surrounded by dielectric (i.e., floating gate) : Capacitor)
Patent 6204123: Vertical floating gate transistor with epitaxial channel
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Having additional gate electrode surrounded by dielectric (i.e., floating gate) : Including forming gate electrode in trench or recess in substrate : Stacked capacitor)
Patent 6204124: Method for forming high density nonvolatile memories with high capacitive-coupling ratio
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Having additional gate electrode surrounded by dielectric (i.e., floating gate) : Tunneling insulator : Tunneling insulator)
Patent 6204125: Method of forming a gate in a stack gate flash EEPROM cell
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Having additional gate electrode surrounded by dielectric (i.e., floating gate) : Tunneling insulator : Tunneling insulator)
Patent 6204126: Method to fabricate a new structure with multi-self-aligned for split-gate flash
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Having additional gate electrode surrounded by dielectric (i.e., floating gate) : Having additional, nonmemory control electrode or channel portion (e.g., for accessing field effect transistor structure, etc.) : Including forming gate electrode as conductive sidewall spacer to another electrode : Contacts formed by selective growth or deposition)
Patent 6204127: Method of manufacturing bit lines in memory
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Vertical channel : Gate electrode in trench or recess in semiconductor substrate : Including forming gate electrode as conductive sidewall spacer to another electrode)
Patent 6204128: Method for fabricating semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Vertical channel : Gate electrode in trench or recess in semiconductor substrate : Including forming gate electrode as conductive sidewall spacer to another electrode)
Patent 6204129: Method for producing a high-voltage and low-voltage MOS transistor with salicide structure
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Making plural insulated gate field effect transistors of differing electrical characteristics : Having integral short of source and base regions)
Patent 6204130: Semiconductor device having reduced polysilicon gate electrode width and method of manufacture thereof
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Gate insulator structure constructed of diverse dielectrics (e.g., MNOS, etc.) or of nonsilicon compound : Introducing a dopant into the channel region of selected transistors)
Patent 6204131: Trench structure for isolating semiconductor elements and method for forming the same
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Including isolation structure : Using channel conductivity dopant of opposite type as that of source and drain)
Patent 6204132: Method of forming a silicide layer using an angled pre-amorphization implant
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Recessed oxide formed by localized oxidation (i.e., LOCOS))
Patent 6204133: Self-aligned extension junction for reduced gate channel
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Recessed oxide formed by localized oxidation (i.e., LOCOS))
Patent 6204134: Method for fabricating a self aligned contact plug
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Source or drain doping : Doping region beneath recessed oxide (e.g., to form chanstop, etc.))
Patent 6204135: Method for patterning semiconductors with high precision, good homogeneity and reproducibility
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Source or drain doping : Doping region beneath recessed oxide (e.g., to form chanstop, etc.))
Patent 6204136: Post-spacer etch surface treatment for improved silicide formation
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Source or drain doping : Utilizing gate sidewall structure : Plural doping steps : Multiple doping steps)
Patent 6204137: Method to form transistors and local interconnects using a silicon nitride dummy gate technique
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Source or drain doping : Utilizing gate sidewall structure : Plural doping steps : Multiple doping steps)
Patent 6204138: Method for fabricating a MOSFET device structure which facilitates mitigation of junction capacitance and floating body effects
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING FIELD EFFECT DEVICE HAVING PAIR OF ACTIVE REGIONS SEPARATED BY GATE STRUCTURE BY FORMATION OR ALTERATION OF SEMICONDUCTIVE ACTIVE REGIONS : Having insulated gate (e.g., IGFET, MISFET, MOSFET, etc.) : Self-aligned : Source or drain doping : Plural doping steps : Using same conductivity-type dopant : Multiple doping steps)
Patent 6204139: Method for switching the properties of perovskite materials used in thin film resistors
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Resistor : Deposited thin film resistor : Altering resistivity of conductor : Plural doping steps)
Patent 6204140: Dynamic random access memory
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Trench capacitor : Deposited thin film resistor)
Patent 6204141: Method of manufacturing a deep trench capacitor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Trench capacitor : Deposited thin film resistor)
Patent 6204142: Methods to form electronic devices
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Stacked capacitor : Including doping of semiconductive region)
Patent 6204143: Method of forming high aspect ratio structures for semiconductor devices
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Stacked capacitor : Including doping of semiconductive region)
Patent 6204144: Method for forming a metal capacitor with two metal electrodes
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : MAKING PASSIVE DEVICE (E.G., RESISTOR, CAPACITOR, ETC.) : Stacked capacitor : Including doping of semiconductive region)
Patent 6204145: Silicon-on-insulator islands and method for their formation
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Total dielectric isolation : Air isolation (e.g., beam lead supported semiconductor islands, etc.) : Semiconductor islands formed upon insulating substrate or layer (e.g., mesa isolation, etc.) : Plural doping steps)
Patent 6204146: Method of fabricating shallow trench isolation
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Grooved and refilled with deposited dielectric material : Enclosed cavity)
Patent 6204147: Method of manufacturing shallow trench isolation
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Grooved and refilled with deposited dielectric material : Enclosed cavity)
Patent 6204148: Method of making a semiconductor device having a grown polysilicon layer
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Grooved and refilled with deposited dielectric material : And deposition of polysilicon or noninsulative material into groove : Reflow of insulator)
Patent 6204149: Methods of forming polished material and methods of forming isolation regions
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Grooved and refilled with deposited dielectric material : Multiple insulative layers in groove : From doped insulator in groove)
Patent 6204150: Semiconductor device and method of manufacturing semiconductor device wherein field oxide is protected from overetching
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF ELECTRICALLY ISOLATED LATERAL SEMICONDUCTIVE STRUCTURE : Recessed oxide by localized oxidation (i.e., LOCOS) : Utilizing oxidation mask having polysilicon component : Masking of groove sidewall)
Patent 6204151: Smoothing method for cleaved films made using thermal treatment
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : SEMICONDUCTOR SUBSTRATE DICING : Thinning of semiconductor substrate)
Patent 6204152: Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : GETTERING OF SUBSTRATE : By implanting or irradiating : And electrical conductor formation (i.e., metallization))
Patent 6204153: Argon doped epitaxial layers for inhibiting punchthrough within a semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) : By vapor phase surface reaction)
Patent 6204154: Semiconductor device and fabrication method thereof
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) : Amorphous semiconductor : And subsequent crystallization : Hydrogen plasma (i.e., hydrogenization))
Patent 6204155: Semiconductor device and production thereof
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) : Amorphous semiconductor : And subsequent crystallization : Hydrogen plasma (i.e., hydrogenization))
Patent 6204156: Method to fabricate an intrinsic polycrystalline silicon film
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : FORMATION OF SEMICONDUCTIVE ACTIVE REGION ON ANY SUBSTRATE (E.G., FLUID GROWTH, DEPOSITION) : Polycrystalline semiconductor : And subsequent crystallization)
Patent 6204157: Method for establishing shallow junction in semiconductor device to minimize junction capacitance
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : INTRODUCTION OF CONDUCTIVITY MODIFYING DOPANT INTO SEMICONDUCTIVE MATERIAL : Ion implantation of dopant into semiconductor region : Including multiple implantation steps : Providing nondopant ion (e.g., proton, etc.) : Using same conductivity-type dopant)
Patent 6204158: Reduced diffusion of a mobile specie from a metal oxide ceramic into the substrate
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : INTRODUCTION OF CONDUCTIVITY MODIFYING DOPANT INTO SEMICONDUCTIVE MATERIAL : Diffusing a dopant : From solid dopant source in contact with semiconductor region : Glassy source or doped oxide : Using same conductivity-type dopant)
Patent 6204159: Method of forming select gate to improve reliability and performance for NAND type flash memory devices
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : Insulated gate formation : Possessing plural conductive layers (e.g., polycide) : Separated by insulator (i.e., floating gate) : Tunnelling dielectric layer : Through same mask opening)
Patent 6204160: Method for making electrical contacts and junctions in silicon carbide
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : To compound semiconductor : Using structure alterable to nonconductive state (i.e., fuse))
Patent 6204161: Self aligned contact pad in a semiconductor device and method for forming the same
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Forming solder contact or bonding pad : Transparent conductor)
Patent 6204162: Production of semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Forming solder contact or bonding pad : Transparent conductor)
Patent 6204163: Integrated circuit package for flip chip with alignment preform feature and method of forming same
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Forming solder contact or bonding pad : Bump electrode : Ga and As containing semiconductor)
Patent 6204164: Method of making electrical connections to integrated circuit
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Forming solder contact or bonding pad : Bump electrode : Including fusion of conductor : Through same mask opening)
Patent 6204165: Practical air dielectric interconnections by post-processing standard CMOS wafers
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Air bridge structure : Including fusion of conductor)
Patent 6204166: Method for forming dual damascene structures
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) : Separating insulating layer is laminate or composite of plural insulating materials : By wire bonding)
Patent 6204167: Method of making a multi-level interconnect having a refractory metal wire and a degassed oxidized, TiN barrier layer
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) : At least one metallization level formed of diverse conductive layers : At least one layer forms a diffusion barrier : Using same conductivity-type dopant)
Patent 6204168: Damascene structure fabricated using a layer of silicon-based photoresist material
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Multiple metal levels, separated by insulating layer (i.e., multiple level metallization) : With formation of opening (i.e., viahole) in insulative layer : Having viaholes of diverse width : Silicide formation)
Patent 6204169: Processing for polishing dissimilar conductive layers in a semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Diverse conductors : Having planarization step : Having viahole of tapered shape)
Patent 6204170: Method for manufacturing semiconductor device having metal silicide film and metal film in which metal film can be selectively removed
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Contacting multiple semiconductive regions (i.e., interconnects) : Diverse conductors : Having refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof) : Silicide : Silicide formation)
Patent 6204171: Process for forming a film composed of a nitride of a diffusion barrier material
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Plural layered electrode or conductor : At least one layer forms a diffusion barrier : Having noble group metal (i.e., silver (Ag), gold (Au), platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), iridium (Ir), osmium (Os), or alloy thereof))
Patent 6204172: Low temperature deposition of barrier layers
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Plural layered electrode or conductor : At least one layer forms a diffusion barrier : Having noble group metal (i.e., silver (Ag), gold (Au), platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), iridium (Ir), osmium (Os), or alloy thereof))
Patent 6204173: Multiple implantation and grain growth method
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Altering composition of conductor : Implantation of ion into conductor : Having noble group metal (i.e., silver (Ag), gold (Au), platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), iridium (Ir), osmium (Os), or alloy thereof))
Patent 6204174: Method for high rate deposition of tungsten
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Utilizing chemical vapor deposition (i.e., CVD) : Pretreatment of surface to enhance or retard deposition)
Patent 6204175: Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Utilizing chemical vapor deposition (i.e., CVD) : Of organo-metallic precursor (i.e., MOCVD) : Forming silicide)
Patent 6204176: Substituted phenylethylene precursor deposition method
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Utilizing chemical vapor deposition (i.e., CVD) : Of organo-metallic precursor (i.e., MOCVD) : Forming silicide)
Patent 6204177: Method of forming junction leakage free metal silicide in a semiconductor wafer by alloying refractory metal
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Silicide : Of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof) : Forming silicide)
Patent 6204178: Nucleation and deposition of PT films using ultraviolet irradiation
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Noble group metal (i.e., silver (Ag), gold (Au), platinum (Pt), palladium (Pd), rhodium (Rh), ruthenium (Ru), iridium (Ir), osmium (Os), or alloy thereof) : Of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof))
Patent 6204179: Copper diffusion barrier, aluminum wetting layer and improved methods for filling openings in silicon substrates with copper
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING WITH ELECTRICALLY OR THERMALLY CONDUCTIVE MATERIAL : To form ohmic contact to semiconductive material : Copper of copper alloy conductor : Of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof))
Patent 6204180: Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : To form ohmic contact to semiconductive material)
Patent 6204181: Finishing method for semiconductor wafers using a lubricating boundary layer
Patent 6204182: In-situ fluid jet orifice
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) : Combined mechanical and chemical material removal : Of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof))
Patent 6204184: Method of manufacturing semiconductor devices
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) : Combined mechanical and chemical material removal : Simultaneous (e.g., chemical-mechanical polishing, etc.) : Forming silicide)
Patent 6204185: Method for forming self-align stop layer for borderless contact process
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) : Combined mechanical and chemical material removal : Simultaneous (e.g., chemical-mechanical polishing, etc.) : Forming silicide)
Patent 6204186: Method of making integrated circuit capacitor including tapered plug
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Combined with coating step : Formation of groove or trench : Plural coating steps)
Patent 6204187: Contact and deep trench patterning
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Combined with coating step : Formation of groove or trench : Plural coating steps : Utilizing particulate abradant)
Patent 6204188: Heat treatment method for a silicon wafer and a silicon wafer heat-treated by the method
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Plural coating steps)
Patent 6204189: Fabrication of precision high quality facets on molecular beam epitaxy material
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Plural coating steps)
Patent 6204190: Method for producing an electronic device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Utilizing electromagnetic or wave energy : By creating electric field (e.g., plasma, glow discharge, etc.) : Reactive ion beam etching (i.e., RIBE) : Silicide)
Patent 6204191: Method of manufacturing semiconductor devices and semiconductor device capacitor manufactured thereby
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Utilizing electromagnetic or wave energy : By creating electric field (e.g., plasma, glow discharge, etc.) : Forming tapered profile (e.g., tapered etching, etc.) : Silicide)
Patent 6204192: Plasma cleaning process for openings formed in at least one low dielectric constant insulation layer over copper metallization in integrated circuit
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Utilizing electromagnetic or wave energy : By creating electric field (e.g., plasma, glow discharge, etc.) : Silicon oxide or glass : Silicide)
Patent 6204193: Method for etching
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : CHEMICAL ETCHING : Vapor phase etching (i.e., dry etching) : Utilizing electromagnetic or wave energy : By creating electric field (e.g., plasma, glow discharge, etc.) : Silicon oxide or glass : Silicide)
Patent 6204194: Method and apparatus for producing a semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Liquid phase etching)
Patent 6204195: Method to prevent CMP overpolish
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Combined with the removal of material by nonchemical means : Silicon nitride)
Patent 6204196: Method of forming a film having enhanced reflow characteristics at low thermal budget
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Utilizing reflow (e.g., planarization, etc.) : Silicon nitride)
Patent 6204197: Semiconductor device, manufacturing method, and system
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Multiple layers : Layers formed of diverse composition or by diverse coating processes : Silicide)
Patent 6204198: Rapid thermal annealing of doped polycrystalline silicon structures formed in a single-wafer cluster tool
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : By reaction with substrate : Implantation of ion (e.g., to form ion amorphousized region prior to selective oxidation, reacting with substrate to form insulative region, etc.) : Silicide)
Patent 6204199: Method for producing a semiconductor device
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : By reaction with substrate : Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) : Oxidation : In atmosphere containing halogen : Microwave gas energizing)
Patent 6204200: Process scheme to form controlled airgaps between interconnect lines to reduce capacitance
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.))
Patent 6204201: Method of processing films prior to chemical vapor deposition using electron beam processing
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.))
Patent 6204202: Low dielectric constant porous films
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Depositing organic material (e.g., polymer, etc.) : Subsequent heating modifying organic coating composition : Using electromagnetic or wave energy)
Patent 6204203: Post deposition treatment of dielectric films for interface control
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Insulative material is compound of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof) : Introduction simultaneous with deposition)
Patent 6204204: Method and apparatus for depositing tantalum-based thin films with organmetallic precursor
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Insulative material is compound of refractory group metal (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), tungsten (W), or alloy thereof) : Introduction simultaneous with deposition)
Patent 6204205: Using H2anneal to improve the electrical characteristics of gate oxide
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Silicon oxide formation : Introduction simultaneous with deposition)
Patent 6204206: Silicon nitride deposition method
(SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS : COATING OF SUBSTRATE CONTAINING SEMICONDUCTOR REGION OR OF SEMICONDUCTOR SUBSTRATE : Insulative material deposited upon semiconductive substrate : Silicon nitride formation : Organic reactant)
Patent 6204207: Extruded netting exhibiting stretch and bonding
(FABRIC (WOVEN, KNITTED, OR NONWOVEN TEXTILE OR CLOTH, ETC.) : SCRIM (E.G., OPEN NET OR MESH, GAUZE, LOOSE OR OPEN WEAVE OR KNIT, ETC.) : Woven scrim : Comprising at least two chemically different fibers :)
Patent 6204208: Method and composition for treating substrates for wettability and skin wellness
(FABRIC (WOVEN, KNITTED, OR NONWOVEN TEXTILE OR CLOTH, ETC.) : COATED OR IMPREGNATED WOVEN, KNIT, OR NONWOVEN FABRIC WHICH IS NOT (A) ASSOCIATED WITH ANOTHER PREFORMED LAYER OR FIBER LAYER OR, (B) WITH RESPECT TO WOVEN AND KNIT, CHARACTERIZED, RESPECTIVELY, BY A PARTICULAR OR DIFFERENTIAL WEAVE OR KNIT, WHEREIN THE COATING OR IMPREGNATION IS NEITHER A FOAMED MATERIAL NOR A FREE METAL OR ALLOY LAYER : Coating or impregnation is water absorbency-increasing or hydrophilicity-increasing or hydrophilicity-imparting : Sulphur containing)
Patent 6204209: Acoustical composite headliner
(FABRIC (WOVEN, KNITTED, OR NONWOVEN TEXTILE OR CLOTH, ETC.) : NONWOVEN FABRIC (I.E., NONWOVEN STRAND OR FIBER MATERIAL) : Including a foamed layer or component : Nonwoven fabric is coated, impregnated, or autogenously bonded : Synthetic polymeric strand or fiber material)
Patent 6204210: Composite nonwoven material fabrication, process and application to absorbent hygienic articles
(FABRIC (WOVEN, KNITTED, OR NONWOVEN TEXTILE OR CLOTH, ETC.) : NONWOVEN FABRIC (I.E., NONWOVEN STRAND OR FIBER MATERIAL) : Including an additional nonwoven fabric : Mechanically interengaged by needling or impingement of fluid (e.g., gas or liquid stream, etc.) : Needled : Synthetic polymeric strand or fiber material is of staple length)
Patent 6204211: Luminous glass ceramics
(COMPOSITIONS: CERAMIC : CERAMIC COMPOSITIONS : Devitrified glass-ceramics : Nonsilica and nonsilicate crystalline phase (e.g., spinel, barium titanate, etc.) : Divalent metal oxide aluminosilicate crystalline phase (e.g., anorthite, slagcerams, etc.))
Patent 6204212: Borosilicate glass of greater resistance to chemical attack and applications thereof
(COMPOSITIONS: CERAMIC : CERAMIC COMPOSITIONS : Glass compositions, compositions containing glass other than those wherein glass is a bonding agent, or glass batch forming compositions : Silica containing : 40 percent - 90 percent by weight silica : And boron : And aluminum : And zinc or zirconium : And aluminum)
Patent 6204213: Whisker reinforced ceramic cutting tool and composition thereof
(COMPOSITIONS: CERAMIC : CERAMIC COMPOSITIONS : Refractory : Fiber or fiber containing : Composites (continuous matrix with dispersed fiber phase) : Whisker containing : And zinc)
Patent 6204214: Pumpable/injectable phosphate-bonded ceramics
(COMPOSITIONS: CERAMIC : CERAMIC COMPOSITIONS : Composed of waste material : Clay pretreatment)
Patent 6204215: Solid catalyst component for olefin polymerization, catalyst for olefin polymerization, and method for producing olefin polymers
(CATALYST, SOLID SORBENT, OR SUPPORT THEREFOR: PRODUCT OR PROCESS OF MAKING : CATALYST OR PRECURSOR THEREFOR : Plural component system comprising A - Group I to IV metal hydride or organometallic compound - and B - Group IV to VIII metal, lanthanide or actinde compound - (i.e., alkali metal, Ag, Au, Cu, alkaline earth metal, Be, Mg, Zn, Cd, Hg, Sc, Y, Al, Ga, In, Tl, Ti, Zn, Hf, Ge, Sn or Pb hydride or organometallic compound and Ti, Zr, Hf, Ge, Sn, Pb, V, Nb, Ta, As, Sb, Bi, Cr, Mo, W, Po, Mn, Tc, Re, Iron group, Platinum group, atomic number 57 to 71 inclusive or atomic number 89 or higher compound) : Component A metal is Group IA, IIA or IIIA and component B metal is Group IVB to VIIB or VIII (i.e., alkali metal, alkaline earth Metal, Be, Mg, Al, Ga, In or Tl and Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, iron Group or Platinum group) (e.g., Ziegler Catalyst, etc.) : Sulfuric or hydrochloric acid)
Patent 6204216: Olefin polymerization catalysts containing amine derivatives
(CATALYST, SOLID SORBENT, OR SUPPORT THEREFOR: PRODUCT OR PROCESS OF MAKING : CATALYST OR PRECURSOR THEREFOR : Plural component system comprising A - Group I to IV metal hydride or organometallic compound - and B - Group IV to VIII metal, lanthanide or actinde compound - (i.e., alkali metal, Ag, Au, Cu, alkaline earth metal, Be, Mg, Zn, Cd, Hg, Sc, Y, Al, Ga, In, Tl, Ti, Zn, Hf, Ge, Sn or Pb hydride or organometallic compound and Ti, Zr, Hf, Ge, Sn, Pb, V, Nb, Ta, As, Sb, Bi, Cr, Mo, W, Po, Mn, Tc, Re, Iron group, Platinum group, atomic number 57 to 71 inclusive or atomic number 89 or higher compound) : Component A metal is Group IA, IIA or IIIA and component B metal is Group IVB to VIIB or VIII (i.e., alkali metal, alkaline earth Metal, Be, Mg, Al, Ga, In or Tl and Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, iron Group or Platinum group) (e.g., Ziegler Catalyst, etc.) : Sulfuric or hydrochloric acid)
Patent 6204217: Process for the preparation of micro-mesoporous gel
(CATALYST, SOLID SORBENT, OR SUPPORT THEREFOR: PRODUCT OR PROCESS OF MAKING : CATALYST OR PRECURSOR THEREFOR : Silicon containing or process of making : Forming silica gel : Metal, metal oxide, or metal hydroxide containing : Of Group IV metal (i.e., Ti, Zr, Hf, Ge, Sn or Pb) : Magnesium compound)
Patent 6204218: Catalyst and process for purifying streams of materials
(CATALYST, SOLID SORBENT, OR SUPPORT THEREFOR: PRODUCT OR PROCESS OF MAKING : CATALYST OR PRECURSOR THEREFOR : Silicon containing or process of making : With metal, metal oxide, or metal hydroxide : Of Group I (i.e., Alkali, Ag, Au or Cu) : Of Group IV metal (i.e., Ti, Zr, Hf, Ge, Sn or Pb))
Patent 6204219: Thermally stable support material and method for making the same
(CATALYST, SOLID SORBENT, OR SUPPORT THEREFOR: PRODUCT OR PROCESS OF MAKING : CATALYST OR PRECURSOR THEREFOR : Metal, metal oxide or metal hydroxide : Of lanthanide series (i.e., atomic number 57 to 71 inclusive) : Cerium : Platinum group (i.e., Ru, Rh, Pd, Os, Ir or Pt))
Patent 6204220: Substituted 2-oxo-3-alkynoic acids and methods of use thereof
(PLANT PROTECTING AND REGULATING COMPOSITIONS : PLANT GROWTH REGULATING COMPOSITIONS (E.G., HERBICIDES, ETC.) : Plural active ingredients : Active ingredient contains -C(=X)X-, wherein the X`s are the same or diverse chalcogens : Oxygen containing hetero ring)
Patent 6204221: Herbicides
(PLANT PROTECTING AND REGULATING COMPOSITIONS : PLANT GROWTH REGULATING COMPOSITIONS (E.G., HERBICIDES, ETC.) : Organic active compound containing : Hetero ring containing : Hetero ring is six-membered consisting of one nitrogen and five carbons : Additional hetero ring containing : The additional hetero ring is five-membered including nitrogen : Plural ring nitrogens in the additional hetero ring :)
Patent 6204222: Substituted cyclohexene-1,2-dicarboxylic acid derivatives and intermediates for their preparation
(PLANT PROTECTING AND REGULATING COMPOSITIONS : PLANT GROWTH REGULATING COMPOSITIONS (E.G., HERBICIDES, ETC.) : Organic active compound containing : Hetero ring containing : Hetero ring is five-membered consisting of one nitrogen and four carbons : Polycyclo ring system having the five-membered hetero ring as one of the cyclos (e.g., indoles, etc.) : Chalcogen or nitrogen bonded directly to ring carbon of the diazole ring)
Patent 6204223: Packaged agrochemical composition
(PLANT PROTECTING AND REGULATING COMPOSITIONS : PLANT GROWTH REGULATING COMPOSITIONS (E.G., HERBICIDES, ETC.) : Designated nonactive ingredient containing : Liquid carrier containing (e.g., water, hydrocarbon, etc.) : Gel (i.e., a colloidal solution of a liquid in a solid : Organic nitrogen containing solvent, emulsifier, or foaming agent of formula R1N(R2)2)
Patent 6204224: Polyalkyl methacrylate copolymers for rheological modification and filtration control for ester and synthetic based drilling fluids
(EARTH BORING, WELL TREATING, AND OIL FIELD CHEMISTRY : EARTH BORING : Contains organic component : Organic component is solid synthetic resin : Resin is polymer derived from ethylenic monomers only (e.g., maleic, itaconic, etc.) : Hetero nitrogen ring is attached directly or indirectly to the ethylenic monomer by nonionic bonding : Nitrogen is attached directly or indirectly to the acrylic acid monomer or derivative by nonionic bonding (e.g., acrylamide, acrylonitrile, etc.))
Patent 6204225: Water-dispersible metal working fluid
(SOLID ANTI-FRICTION DEVICES, MATERIALS THEREFOR, LUBRICANT OR SEPARANT COMPOSITIONS FOR MOVING SOLID SURFACES, AND MISCELLANEOUS MINERAL OIL COMPOSITIONS : LUBRICANTS OR SEPARANTS FOR MOVING SOLID SURFACES AND MISCELLANEOUS MINERAL OIL COMPOSITIONS (E.G., WATER CONTAINING, ETC.) : Inorganic compound (except water) (Overbased or carbonated organic acidic compounds are not classified in this subclass or its indents on the basis of inorganic overbasing or carbonating agents; the overbased or carbonated compounds are treated as complexes, and are classified with the particular organic acidic compound) : With organic -C(=O)O- compound (e.g., ester waxes, etc.) : The inorganic compound is a metal hydroxide or metal oxide : The heavy metal is molybdenum or tungsten (e.g., molybdenum sulfide, etc.))
Patent 6204226: Mixture of alkyl-phenyl-sulfonates of alkaline earth metals, its application as an additive for lubricating oil, and methods of preparation
(SOLID ANTI-FRICTION DEVICES, MATERIALS THEREFOR, LUBRICANT OR SEPARANT COMPOSITIONS FOR MOVING SOLID SURFACES, AND MISCELLANEOUS MINERAL OIL COMPOSITIONS : LUBRICANTS OR SEPARANTS FOR MOVING SOLID SURFACES AND MISCELLANEOUS MINERAL OIL COMPOSITIONS (E.G., WATER CONTAINING, ETC.) : Organic sulfur compound, wherein the sulfur is single bonded directly to oxygen (e.g., sulfites, etc.) : The sulfur is part of an -O-S(=O)(=O)- group (i.e., sulfonates) : With organic chalcogen compound that does not contain phosphorus)
Patent 6204227: Metal working lubricant composition
(SOLID ANTI-FRICTION DEVICES, MATERIALS THEREFOR, LUBRICANT OR SEPARANT COMPOSITIONS FOR MOVING SOLID SURFACES, AND MISCELLANEOUS MINERAL OIL COMPOSITIONS : LUBRICANTS OR SEPARANTS FOR MOVING SOLID SURFACES AND MISCELLANEOUS MINERAL OIL COMPOSITIONS (E.G., WATER CONTAINING, ETC.) : Organic phosphorus compound, wherein the phosphorus is single bonded directly to chalcogen by nonionic bonding (e.g., phosphorus acids, esters, etc.) : Divalent chalcogen double bonded directly to the phosphorus : Plural carbons bonded directly to the chalcogen or to a chain of chalcogens)
Patent 6204228: Light-colored sulfur-containing extreme pressure lubricant additives
(SOLID ANTI-FRICTION DEVICES, MATERIALS THEREFOR, LUBRICANT OR SEPARANT COMPOSITIONS FOR MOVING SOLID SURFACES, AND MISCELLANEOUS MINERAL OIL COMPOSITIONS : LUBRICANTS OR SEPARANTS FOR MOVING SOLID SURFACES AND MISCELLANEOUS MINERAL OIL COMPOSITIONS (E.G., WATER CONTAINING, ETC.) : Organic nitrogen compound : Oxygen, sulfur, or phosphorus attached directly to the nitrogen by nonionic bonding : One of the cations is aluminum or heavy metal)
Patent 6204229: Composition to be applied to hair or skin
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : WITH OXYGEN, HALOGEN, SULFUR, OR NITROGEN CONTAINING OR ETHYLENICALLY UNSATURATED COMPONENT WHICH IS A FRAGRANCE OR AROMA ENHANCER (E.G., PERFUME, ORGANOLEPTIC MATERIAL, ETC.) :)
Patent 6204230: Antibacterial compositions containing a solvent, hydrotrope, and surfactant
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) : For human skin : With halogen, nitrogen, oxygen, or phosphorus containing antiseptic, biocidal, or deodorizing component : With a urea or with polyoxyalkylene containing component devoid of covalently bonded anionic substituents)
Patent 6204231: Cleaning agent for food-industry facilities, its use and method of cleaning such facilities using the agent
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) : For equipment used in processing, handling, storing, or serving edible product (e.g., dairy or brewery equipment, household utensils, etc.) : For no-wax floor covering)
Patent 6204232: .alpha.-amlase mutants
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) : For equipment used in processing, handling, storing, or serving edible product (e.g., dairy or brewery equipment, household utensils, etc.) : For use in automatic dishwasher : Enzyme component of specific activity or source (e.g., protease, ethanol oxidase, of bacterial origin, etc.) : Alkali metal hydroxide component)
Patent 6204233: Laundry pre-treatment or pre-spotting compositions used to improve aqueous laundry processing
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) : For textile material (e.g., laundry detergent, etc.) : For removing stains (other than merely in the course of laundering or dry-cleaning operation) : Prior to laundering (e.g., spotting stick, pre-spot, etc.) : Plural inhibitor or stabilizer components)
Patent 6204234: Cleaning compositions comprising a specific oxygenase
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker`s pipe, etc.) : For textile material (e.g., laundry detergent, etc.) : Enzyme component of specific activity or source (e.g., protease, of bacterial origin, etc.) : Liquid composition (e.g., slurry, etc.) : With polycarboxylic acid component, or salt or anhydride thereof (e.g., carboxylic acid copolymer, etc.))
Patent 6204235: Active chlorine preparations containing stabilized optical brighteners
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : With oxygen or halogen containing chemical bleach or oxidant component : Chlorine-containing bleach or oxidant component : Perborate salt component)
Patent 6204236: Enzyme granulates comprising an enzyme and an organic disulfide core
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : Enzyme component of specific activity or source (e.g., protease, of bacterial origin, etc.) : Quaternary ammonium or sulfonium or iodine containing antiseptic or biocidal component (e.g., elemental iodine, etc.))
Patent 6204237: Glycol-based cleaning solvent
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : Liquid composition : Nonaqueous liquid : Halogenated hydrocarbon component : Oxygen containing component)
Patent 6204238: Fatty acid derivatives and their use as surfactants in detergents and cleaners
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : Specific organic component (e.g., triazines, etc.) : Nitrogen in the component (except triazines) (e.g., amine, etc.) : Amido nitrogen (e.g., urea, etc.) : Hydroxy in the component : With diverse sulfonic acid or sulfate monoester component, or salt thereof (e.g., sulfate and sulfonate, etc.))
Patent 6204239: Fabric cleaning composition containing zeolite
(CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS : CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) : Clay or inorganic aluminosilicate salt component (e.g., bentonite, zeolite, etc.) : Oxygen in the component (except substituted triazines))
Patent 6204240: TGF-.beta.1 to improve neural outcome
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI :)
Patent 6204241: Method for treating nervous system pathophysiologies using glial growth factors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI :)
Patent 6204242: Method for treating rheumatoid arthritis with composition containing histone
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI :)
Patent 6204243: Pharmaceutical preparations for the targeted treatment of crohn's disease and ulcerative colitis
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : Glycoprotein (carbohydrate containing) : With an additional active ingredient)
Patent 6204244: Amino acid compositions and use thereof in immunosuppression
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : Cyclopeptides : With an additional active ingredient)
Patent 6204245: Treatment of narcolepsy with immunosuppressants
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : Cyclopeptides : Monocyclic :)
Patent 6204246: Hybrid toxin
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : 25 or more peptide repeating units in known peptide chain structure : Monocyclic)
Patent 6204247: Chemical modification of proteins to improve biocompatibility and bioactivity
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : 25 or more peptide repeating units in known peptide chain structure : Monocyclic)
Patent 6204248: Pharmaceutical preparations of glutathione and methods of administration thereof
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Peptide containing (e.g., protein, peptones, fibrinogen, etc.) DOAI : Produced by or extracted from animal tissue : Guanidine containing)
Patent 6204249: L-benzimidazole nucleosides
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : N-glycoside : Nitrogen containing hetero ring : Two or more nitrogen atoms bonded directly to the cyclohexyl ring)
Patent 6204250: Immunization of infants
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : N-glycoside : Nitrogen containing hetero ring : Polynucleotide (e.g., RNA, DNA, etc.) : Two saccharide radicals bonded through only oxygen to 4- and 6- positions of the cyclohexyl ring)
Patent 6204251: Ocular gene therapy
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : N-glycoside : Nitrogen containing hetero ring : Polynucleotide (e.g., RNA, DNA, etc.) : Two saccharide radicals bonded through only oxygen to 4- and 6- positions of the cyclohexyl ring)
Patent 6204252: Characterization of granulocytic ehrlichia and methods of use
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : N-glycoside : Nitrogen containing hetero ring : Polynucleotide (e.g., RNA, DNA, etc.) : Two saccharide radicals bonded through only oxygen to 4- and 6- positions of the cyclohexyl ring)
Patent 6204253: Factors which interact with oncoproteins
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : N-glycoside : Nitrogen containing hetero ring : Polynucleotide (e.g., RNA, DNA, etc.) : Two saccharide radicals bonded through only oxygen to 4- and 6- positions of the cyclohexyl ring)
Patent 6204254: Biocompatible surfaces and a method for their preparation
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : Polysaccharide : Nitrogen containing hetero ring)
Patent 6204255: Solid, non-deliquescent formulations of sodium valproate
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : Polysaccharide : Dextrin or derivative : Phosphorus containing (e.g., Vitamin B12, etc.))
Patent 6204256: Acylated cyclodextrin derivatives
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Carbohydrate (i.e., saccharide radical containing) DOAI : Polysaccharide : Dextrin or derivative : Phosphorus containing (e.g., Vitamin B12, etc.))
Patent 6204257: Water soluble prodrugs of hindered alcohols
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Phosphorus containing other than solely as part of an inorganic ion in an addition salt DOAI : Oxygen bonded directly to a carbon or hydrogen and wherein the oxygen is not bonded directly to phosphorus : The oxygen is bonded directly to a benzene ring : Sulfur bonded directly to a benzene ring)
Patent 6204258: Method of treating alopecia
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Cyclopentanohydrophenanthrene ring system DOAI : Oxygen double bonded to a ring carbon of the cyclopentanohydrophenanthrene ring system : Oxygen single bonded to a ring carbon of the cyclopentanohydrophenanthrene ring system : One benzene ring bonded directly to chalcogen)
Patent 6204259: Manganese complexes of nitrogen-containing macrocyclic ligands effective as catalysts for dismutating superoxide
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Heavy metal containing (including salts) : Oxygen single bonded to a ring carbon of the cyclopentanohydrophenanthrene ring system)
Patent 6204260: Non-peptidyl vasopressin V1a antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is four-membered and includes at least one ring nitrogen : Chalcogen double bonded directly to a ring carbon of the four-membered hetero ring which is adjacent to the ring nitrogen : Polycyclo ring system having the four-membered hetero ring as one of the cyclos : Bicyclo ring system having the four-membered hetero ring as one of the cyclos : The other cyclo of the bicyclo ring system is five-membered : Sulfur bonded directly to the five-membered cyclo of the bicyclo ring system (e.g., thienamycin, etc.) : The other cyclo of the bicyclo ring system is six-membered)
Patent 6204261: Inhibitors of interleukin-1.beta. Converting enzyme inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is seven-membered consisting of two nitrogens and five carbon atoms : Polycyclo ring system having the seven-membered hetero ring as one of the cyclos : Bicyclo ring system having the seven-membered hetero ring as one of the cyclos : Plural ring hetero atoms in the additional hetero ring)
Patent 6204262: 1,3-Benzodiazepin-2-ones and 1,3-Benzoxazepin-2-ones useful as HIV reverse transcriptase inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is seven-membered consisting of two nitrogens and five carbon atoms : Polycyclo ring system having the seven-membered hetero ring as one of the cyclos : Bicyclo ring system having the seven-membered hetero ring as one of the cyclos : Plural ring hetero atoms in the additional hetero ring)
Patent 6204263: Pyrazinone protease inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered and includes at least nitrogen and oxygen as ring hetero atoms (e.g., monocyclic 1,2- and 1,3-oxazines, etc.) : Morpholines (i.e., fully hydrogenated 1,4- oxazines) : Additional hetero ring attached directly or indirectly to the morpholine ring by nonionic bonding : Ring nitrogen in the additional hetero ring : Plural ring nitrogens in the additional hetero ring (e.g., imidazole, pyrazine, etc.) : Ring nitrogen in the bicyclo ring system)
Patent 6204264: Benzimidazole derivative, hair growth promoter and external composition for skin using the same
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered and includes at least nitrogen and oxygen as ring hetero atoms (e.g., monocyclic 1,2- and 1,3-oxazines, etc.) : Morpholines (i.e., fully hydrogenated 1,4- oxazines) : Additional hetero ring attached directly or indirectly to the morpholine ring by nonionic bonding : Ring nitrogen in the additional hetero ring : Plural ring nitrogens in the additional hetero ring (e.g., imidazole, pyrazine, etc.) : Ring nitrogen in the bicyclo ring system)
Patent 6204265: Substituted oximes and hydrazones as neurokinin antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered and includes at least nitrogen and oxygen as ring hetero atoms (e.g., monocyclic 1,2- and 1,3-oxazines, etc.) : Morpholines (i.e., fully hydrogenated 1,4- oxazines) : Additional hetero ring attached directly or indirectly to the morpholine ring by nonionic bonding : Ring nitrogen in the additional hetero ring : Plural ring nitrogens in the additional hetero ring (e.g., imidazole, pyrazine, etc.) : Ring nitrogen in the bicyclo ring system)
Patent 6204266: Pharmaceutical, cosmetic and/or food composition having anti-oxidant properties
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : Polycyclo ring system having a 1,2- or 1,4-diazine as one of the cyclos : 1,4-diazine as one of the cyclos : The chalcogen is bonded directly to two carbon atoms)
Patent 6204267: Methods of modulating serine/thereonine protein kinase function with quinazoline-based compounds
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,4 diazines : Piperazines (i.e., fully hydrogenated 1,4-diazines) : Additional hetero ring attached directly or indirectly to the piperazine ring by nonionic bonding : The additional hetero ring is a 1,3 diazine ring : Polycyclo ring system having the additional 1,3-diazine ring as one of the cyclos : The polycyclo ring system is quinazoline (including hydrogenated) : Quinoxalines (including hydrogenated))
Patent 6204268: Selective factor Xa inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,4 diazines : Piperazines (i.e., fully hydrogenated 1,4-diazines) : Additional hetero ring attached directly or indirectly to the piperazine ring by nonionic bonding : The additional hetero ring is five-membered having ring nitrogen : The additional five-membered hetero ring also has chalcogen as a ring member : The five-membered nitrogen hetero ring has chalcogen as a ring member)
Patent 6204269: Fungicidal trifluoromethylalkylamino-triazolopyrimidines
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,3-diazines (e.g., pyrimidines, etc.) : Polycyclo ring system having 1,3-diazine as one of the cyclos : Bicyclo ring system having the 1,3-diazine as one of the cyclos : A ring nitrogen is shared by the two cyclos of the bicyclo ring system (e.g., pyrrolo [1,2-a]pyrimidine, imidazo[1,2-a]pyrimidine, etc.) : The shared ring nitrogen is bonded directly to a ring nitrogen of the second ring of the bicyclo ring system (e.g., pyrazolo[1,5-a]pyrimidine, etc.) : The second ring of the bicyclo ring system is a five-membered hetero ring including three ring nitrogens (e.g., triazolo[1,5-a]pyrimidine, etc.) : Quinolines (including hydrogenated))
Patent 6204270: Ophthalmic and mucosal preparations
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,3-diazines (e.g., pyrimidines, etc.) : Polycyclo ring system having 1,3-diazine as one of the cyclos : Bicyclo ring system having the 1,3-diazine as one of the cyclos : Exactly four ring nitrogens in the bicyclo ring system : Purine (including hydrogenated) : Chalcogen bonded directly to a ring carbon of the purine ring system : Chalcogen bonded directly to the 2-and 6- positions of the purine ring system (e.g., theophylline, etc.) : Chalcogen attached indirectly to the purine ring system by acyclic nonionic bonding : Having -C(=X)-, wherein X is chalcogen, bonded directly to carbon of the hetero ring of the quinoline ring system)
Patent 6204271: Analgesic composition and method for using same
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,3-diazines (e.g., pyrimidines, etc.) : Pyrimidines with chalcogen bonded directly to a ring carbon of said pyrimidine moiety : Tricyclo ring system having 1,3-diazine as one of the cyclos)
Patent 6204272: Use of aminothiazoles for treating wounds and skin
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of two nitrogens and four carbon atoms (e.g., pyridazines, etc.) : 1,3-diazines (e.g., pyrimidines, etc.) : Nitrogen bonded directly to the 1,3-diazine at 2-position by a single bond : Chalcogen bonded directly to pyrimidine at 2-position)
Patent 6204273: 16-substituted-4-aza-androstane 5-.alpha.-reductase isozyme 1 inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of one nitrogen and five carbon atoms : Polycyclo ring system having the six-membered hetero ring as one of the cyclos : Tetracyclo ring system having the six-membered hetero ring as one of the cyclos : Ring nitrogen in the pentacyclo ring system is shared by five-membered cyclo and six-membered cyclo (e.g., vincamine, etc.))
Patent 6204274: Indolyl derivatives as serotonergic agents
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of one nitrogen and five carbon atoms : Piperidines : Additional ring containing : The additional ring is one of the cyclos in a polycyclo ring system : Hetero ring in the polycyclo ring system : Plural hetero atoms in the polycyclo ring system : Plural ring nitrogens in the polycyclo ring system : Piperidinyl or tetrahydropyridyl)
Patent 6204275: PDE IV inhibiting compounds, compositions and methods of treatment
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of one nitrogen and five carbon atoms : Plural six-membered hetero rings consisting of one nitrogen and five carbon atoms : Additional ring containing)
Patent 6204276: Dicarboxylic germanium complex and its therapeutic use
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Hetero ring is six-membered consisting of one nitrogen and five carbon atoms : C=O bonded directly to the six-membered hetero ring : Plural acyclic nitrogens bonded directly to the same carbon or bonded directly to each other)
Patent 6204277: Propionic acid derivatives and applications thereof
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,3-oxazoles (including hydrogenated) : Polycyclo ring system having the thiazole ring as one of the cyclos)
Patent 6204278: Anilide compounds, including use thereof in ACAT inhibitition
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,3-oxazoles (including hydrogenated) : Polycyclo ring system having the oxazole ring as one of the cyclos : C=X bonded directly to the nitrogen which is bonded directly to the thiazole ring (X is chalcogen))
Patent 6204279: Peptidomimetic efflux pump inhibitors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,3-oxazoles (including hydrogenated) : Polycyclo ring system having the oxazole ring as one of the cyclos : C=X bonded directly to the nitrogen which is bonded directly to the thiazole ring (X is chalcogen))
Patent 6204280: Adhesion receptor antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,3-oxazoles (including hydrogenated) : Chalcogen bonded directly to ring carbon of the oxazole ring : C=X bonded directly to the nitrogen which is bonded directly to the thiazole ring (X is chalcogen))
Patent 6204281: Method of treatment and pharmaceutical composition
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : Tetrazoles (including hydrogenated) : Chalcogen or nitrogen bonded directly to ring carbon of the oxazole ring)
Patent 6204282: Benzimidazole compounds that are vitronectin receptor antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,3-diazoles : Polycyclo ring system having the diazole ring as one of the cyclos : Benzo fused at 4,5-positions of the diazole ring : Benzene ring bonded directly to the diazole ring by nonionic bonding)
Patent 6204283: Parasitic mite control on beneficial insects
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : 1,2-diazoles : Pyrazoles : Polycyclo ring system having the diazole ring as one of the cyclos)
Patent 6204284: Use of 1-(substitutedphenyl)-3-azabicyclo[3.1.0]hexanes for the treatment of chemical dependencies
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : The five-membered hetero ring consists of one nitrogen and four carbons : Polycyclo ring system having the five-membered hetero ring as one of the cyclos : Bicyclo ring system having the five-membered hetero ring as one of the cyclos : At imidazole ring carbon)
Patent 6204285: Methods and compositions for treating urinary incontinence using enantiomerically enriched (R,R)-glycopyrrolate
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : The five-membered hetero ring consists of one nitrogen and four carbons : Chalcogen bonded directly to the five-membered hetero ring by nonionic bonding : Bicyclo ring system having the five-membered hetero ring as one of the cyclos)
Patent 6204286: Estrogen agonists/antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Five-membered hetero ring containing at least one nitrogen ring atom (e.g., 1,2,3-triazoles, etc.) : The five-membered hetero ring consists of one nitrogen and four carbons : Chalcogen bonded indirectly to the five-membered hetero ring by acyclic nonionic bonding : Plural chalcogens bonded directly to the five-membered hetero ring by nonionic bonding)
Patent 6204287: Cyclopentane heptan(ene)oic acid, 2-heteroarylalkenyl derivatives as therapeutic agents
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Sulfur containing hetero ring : The hetero ring is five-membered : Tricyclo ring system having the hetero ring as one of the cyclos)
Patent 6204288: 1,2-dithiolane derivatives
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Sulfur containing hetero ring : The hetero ring is five-membered : Plural hetero atoms in the hetero ring : Only two ring sulfurs in the hetero ring : Chalcogen bonded directly to ring carbon of the five-membered hetero ring (e.g., adrenochrome, etc.))
Patent 6204289: Cembranoid inhibitors of nicotinic acetylcholine receptors
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Oxygen containing hetero ring : The hetero ring is six-membered : C=O bonded directly to the hetero ring (X is chalcogen))
Patent 6204290: Tocotrienols and tocotrienol-like compounds and methods for their use
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Heterocyclic carbon compounds containing a hetero ring having chalcogen (i.e., O,S,Se or Te) or nitrogen as the only ring hetero atoms DOAI : Oxygen containing hetero ring : The hetero ring is six-membered : Polycyclo ring system having the hetero ring as one of the cyclos : Bicyclo ring system having the hetero ring as one of the cyclos (e.g., chromones, etc.) : Chalcogen bonded directly to ring carbon of the hetero ring)
Patent 6204291: Process for promoting weight loss in overweight dogs
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Radical -XH acid, or anhydride, acid halide or salt thereof (X is chalcogen) DOAI : Inner quaternary ammonium salt (e.g., betaine, etc.) : Benzene ring in acid moiety)
Patent 6204292: Bicyclic metabotropic glutamate receptor ligands
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Radical -XH acid, or anhydride, acid halide or salt thereof (X is chalcogen) DOAI : Carboxylic acid, percarboxylic acid, or salt thereof (e.g., peracetic acid, etc.) : Nitrogen other than as nitro or nitroso nonionically bonded : Carbon to carbon unsaturation)
Patent 6204293: Inhibitors of protein isoprenyl transferases
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Radical -XH acid, or anhydride, acid halide or salt thereof (X is chalcogen) DOAI : Carboxylic acid, percarboxylic acid, or salt thereof (e.g., peracetic acid, etc.) : Benzene ring nonionically bonded : Carboxy or salt thereof only attached indirectly to the benzene ring : Polycarboxylic acid)
Patent 6204294: IL-8 receptor antagonists
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Nitrogen containing other than solely as a nitrogen in an inorganic ion of an addition salt, a nitro or a nitroso DOAI : Cyanamides (i.e., compounds containing cyano bonded directly to amino nitrogen) : Q is acyclic and benzene ring in a substituent E)
Patent 6204295: Antioxidant compounds
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Nitrogen containing other than solely as a nitrogen in an inorganic ion of an addition salt, a nitro or a nitroso DOAI : Benzene ring containing : Amino nitrogen attached to aryl ring or aryl ring system by an acyclic carbon or acyclic chain : Ether oxygen is part of the chain : A ring or polycyclo ring system in a substituent E is attached indirectly to the carboxamide nitrogen or to an amino nitrogen in substituent E by acyclic nonionic bonding)
Patent 6204296: Patient oxygenation using stabilized fluorocarbon emulsions
(DRUG, BIO-AFFECTING AND BODY TREATING COMPOSITIONS : DESIGNATED ORGANIC ACTIVE INGREDIENT CONTAINING (DOAI) : Halogenated hydrocarbon DOAI : Two or more halogenated hydrocarbons : Polycyclo ring system)
Patent 6204297: Nonionic gemini surfactants
(COLLOID SYSTEMS AND WETTING AGENTS; SUBCOMBINATIONS THEREOF; PROCESSES OF : CONTINUOUS LIQUID OR SUPERCRITICAL PHASE: COLLOID SYSTEMS; COMPOSITIONS AN AGENT FOR MAKING OR STABILIZING COLLOID SYSTEMS; PROCESSES OF MAKING OR STABILIZING COLLOID SYSTEMS; PROCESSES OF PREPARING THE COMPOSITIONS (E.G., MICELLE; THICKENING AGENT; PROTECTIVE COLLOID AGENT; COMPOSITION CONTAINING AN EMULSIFYING AGENT WITH NO DISPERSANT DISCLOSED; ORGANIC LIQUID EMULSIFIED IN ANHYDROUS HF) : Aqueous continuous liquid phase and discontinuous phase primarily organic liquid (e.g., organosilicon* oil- or mineral-oil*-in-water, o/w emulsion) : The agent contains organic compound containing oxygen : The compound contains repeating -(OCnH2n)- (i.e., repeating unsubstituted oxyalkylene) : The carboxylic acid ester group containing compound contains repeating -(OCnH2n)- (i.e., repeating unsubstituted oxyalkylene))
Patent 6204298: Processes for the rapid preparation of foam materials from high internal phase emulsions at high temperatures and pressures
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : CELLULAR PRODUCTS OR PROCESSES OF PREPARING A CELLULAR PRODUCT, E.G., FOAMS, PORES, CHANNELS, ETC. : Process of preparing a cellular product by removal of material from a solid polymer-containing matrix without expanding the matrix; composition which is nonexpandible and is designed to form a cellular product by said process; or process of preparing said composition : Removing a liquid to form a cellular product : Treating polymer derived from vinyl chloride monomer)
Patent 6204299: Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : CELLULAR PRODUCTS OR PROCESSES OF PREPARING A CELLULAR PRODUCT, E.G., FOAMS, PORES, CHANNELS, ETC. : Cellular product formation prior to or during solid polymer formation in the presence of a stated ingredient other than water : Ingredient contains a -C-X-C- group wherein X is a chalcogen atom and none of the C atoms bonded to the chalcogen are double-bonded to an additional chalcogen atom : Organic silicon compound contains an ether group)
Patent 6204300: Low resilience urethane foam
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : CELLULAR PRODUCTS OR PROCESSES OF PREPARING A CELLULAR PRODUCT, E.G., FOAMS, PORES, CHANNELS, ETC. : Cellular product derived from a -N=C=X containing reactant wherein X is a chalcogen atom : With -XH reactant wherein X is a chalcogen atom : -XH reactant contains a C-X-C group : With non -C=X containing reactant)
Patent 6204301: Fluoroplastic composites and a process for producing the same
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY : Processes of forming or modifying a solid polymer by wave energy wherein a temperature less than 0 degree C (32 degree F) or greater than 250 degree C (482 degree F) is employed; or compositions therefore :)
Patent 6204302: Photosensitizers for free radical polymerization initiation resins and method of making the same
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY : Compositions to be polymerized or modified by wave energy wherein said composition contains at least one specified rate-affecting material; or processes of preparing or treating a solid polymer utilizing wave energy in the presence of at least one specified rate-affecting material; e.g., nitrogen containing photosensitizer, oxygen containing photoinitiator, etc. wave energy in order to prepare a cellular product : Contains two or more rate-affecting materials, at least one of which is specified : At least two specified rate-affecting materials containing keto group not part of a ring; or contains a nonspecified photoinitiator or photosensitizer and specified ketone containing material wherein the keto group is not part of a ring :)
Patent 6204303: Screen printable curable conductive material composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY : Processes of preparing or treating a solid polymer by wave energy in the presence of a designated nonreactant material (DNRM); or compositions therefore : Specified rate-affecting material contains only carbon and hydrogen)
Patent 6204304: Vinyl ether-based optical fiber coatings
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY : Processes involving carbohydrate as reactant or as solid polymer; or compositions therefore : Oxygen containing DNRM)
Patent 6204305: Method for producing a diffusion barrier and polymeric article having a diffusion barrier
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : COMPOSITIONS TO BE POLYMERIZED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR COMPOSITIONS TO BE MODIFIED BY WAVE ENERGY WHEREIN SAID COMPOSITION CONTAINS A RATE-AFFECTING MATERIAL; OR PROCESSES OF PREPARING OR TREATING A SOLID POLYMER UTILIZING WAVE ENERGY : Processes of treating a blend of two or more solid polymers or reacting one solid polymer with another solid polymer; or compositions therefore : At least one solid polymer derived from ethylenic monomers has at least two ethylenic groups)
Patent 6204306: Functionalized photoinitiators, derivatives and macromers therefrom and their use
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Nonmedicated composition specifically intended for contact with living animal tissue or process of preparing; other than apparel : Contact lens making composition :)
Patent 6204307: Ink composition capable of realizing image possessing excellent rubbing/scratch resistance
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Printing ink composition for glass or ceramic substrate or process of preparing : For wheeled vehicle)
Patent 6204308: Organic compounds
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Process of forming a composition of a solid polymer or solid polymer forming system by admixing a product in the form of a surface coated, impregnated, encapsulated, or surface modified fiber, sheet, particle, or web, with a material; or composition which is the result of said admixing : For wheeled vehicle)
Patent 6204309: Fluorescent cyanoacrylate adhesive
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Utilizing direct application of magnetic, electrical, or wave energy : Two or more solid synthetic polymers having defined physical dimension or surface area)
Patent 6204310: Dispersion process
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Utilizing plural interconnected distinct forming or treating zones or locations other than nominal screw extruder, e.g., zones interconnected in parallel or having varying flow velocity, etc. : With step of spraying or centrifuging)
Patent 6204311: Polymerizable composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF : Process of forming a composition containing a nonreactive material (NRM) and a polymer containing more than one 1,2-epoxy group, or a preformed polymer derived from or admixed with a reactant containing more than one 1,2-epoxy group, or with a polymer derived from an epihalohydrin and a polyhydric phenol or polyol; or composition or product thereof : With step of spraying or centrifuging)
Patent 6204312: Process for manufacturing organic and inorganic compositions, moulded flat or extruded to give complex formation, dimensional stability, added
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : Cellular material derived from plant or animal source DNRM other than: cotton, farinaceous meals or flours, blood, diatomaceous earth, chalk, or other fossilized matter : Wood or wood cellulose fiber or flour : Hair removed from pelt, e.g., wool, etc.)
Patent 6204313: Flame retardant polymer blends, and method for making
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Organic DNRM : Nitrogen atom as part of a hetero ring DNRM : Six-membered nitrogen ring, e.g., pyridine, etc. : Six-membered nitrogen ring having two or more ring nitrogen atoms : Two or more nitrogen rings)
Patent 6204314: Film retardant polyamide resin composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Organic DNRM : Nitrogen atom as part of a hetero ring DNRM : Six-membered nitrogen ring, e.g., pyridine, etc. : Six-membered nitrogen ring having two or more ring nitrogen atoms : Three oxygen atoms are directly bonded to three nuclear carbon atoms of the nitrogen ring, e.g., (iso) cyanurate, etc. :)
Patent 6204315: Non-flammable, thermoplastic molded materials based on polyphenylene ethers
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Organic DNRM : Phosphorus organic compound DNRM : Two or more phosphorus atoms directly or indirectly bonded together by only covalent bonds : Phosphorus bonded directly to only two chalcogen atoms and having at least one P-C linkage, e.g., phosphinate, phosphonite, etc. : Aryl group)
Patent 6204316: Binder system method for particular material
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Organic DNRM : Organo nitrogen compound other than unsubstituted ammonium salt as sole nitrogen atom DNRM : N-(C=O)-O-, e.g., urethane, carbamate, etc. : At least one solid polymer derived from ethylenic reactants only)
Patent 6204317: Method for producing polymeric fibers with improved anti-static properties and fibers and fabrics produced thereby
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Organic DNRM : Organo nitrogen compound other than unsubstituted ammonium salt as sole nitrogen atom DNRM : N-C=X group wherein X is a chalcogen : C-OH group : Two or more N-C=X groups or two or more C-OH groups : Aryl-OH)
Patent 6204318: Insulated wire comprising a flame-retardant polyolefinic resin composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon : Inorganic compound devoid of a silicon atom DNRM : A single type of metal atom and only oxygen atoms DNRM, e.g., metal oxide, etc. : Group IIB metal atom (i.e., Zn or Cd) : Solid polymer derived from unsaturated hydrocarbon monomer)
Patent 6204319: Aqueous coating compositions
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : Mixing with carbon, e.g., graphite, etc., having numerical limitations, other than amount, e.g., included herein are particle size, surface area, etc., or composition or product thereof, DNRM : Inorganic silicon-containing material having specified dimensions)
Patent 6204320: Liquid isoprene-butadiene rubber
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : Containing two or more solid polymers; solid polymer or SICP and a SICP, SPFI, or an ethylenic reactant or product thereof : At least one solid polymer derived from ethylenic reactants only : Solid polymer derived from ethylenic monomers only admixed with ethylenic monomer : Ethylenic monomer contains at least two ethylenic groups : Two or more polymers derived from reactant containing two or more ethylenic groups)
Patent 6204321: Sealant and adhesive with damping properties
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : Polymer derived from ethylenic reactants only : From hydrocarbon monomer : Conjugated diene hydrocarbon monomer : Interpolymerized with diverse carboxylic acid ester or with carboxylic acid reactant)
Patent 6204322: Silica-filled elastomer composition which can be used for tires
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : Polymer derived from ethylenic reactants only : From hydrocarbon monomer : Conjugated diene hydrocarbon monomer : Adding nonreactive material to chemically modified solid polymer : Two or more polymers derived from reactant containing two or more ethylenic groups)
Patent 6204323: Aqueous two-component polyurethane coating compositions
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof : From -N=C=X reactant or blocked N=C=X reactant (X is chalcogen) : With reactant containing at least one C-OH, (C=O)-OH or -C-O-C- group : Water DNRM : High density polymer)
Patent 6204324: Method for producing aqueous solution of polymer having phosphorylcholine groups
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : Preparation of intentional or desired composition by formation of solid polymer or SICP in the presence of water as a designated nonreactant material (DNRM), or products thereof : Solid polymer derived from ethylenic monomers only : Monomer-containing element other than C, H, O, N, S, Hal, or Group IA metal atom : Calcium, e.g., calcium carbonate, etc.)
Patent 6204325: Compact, transparent polyisocyanate polyaddition products
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : : N=C=X containing reactant forming a solid polymer or SICP in the presence of a nonreactant material (X is chalcogen) : With two or more alcohol hydroxyl compounds : Ethylenically unsaturated reactant)
Patent 6204326: PNA combinatorial libraries and improved methods of synthesis
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : Containing chemically combined protein or biologically active polypeptide : Solid polymer treated by stepwise reaction with naturally occurring alpha or beta amino acid or a material which contains a residue of said amino acid, e.g., a functionally protected amino acid, etc. : Unsaturated reactant contains nitrogen heterocycle)
Patent 6204327: Vinyl chloride resin composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Mixing of solid graft or graft-type copolymer derived from ethylenic reactants only with other solid polymer derived from ethylenic reactants only; or treating said mixture with chemical treating agent; or processes of forming or reacting; or the resultant product of any of the above operations : Contains two or more graft or graft-type copolymers or a graft or a graft type copolymer and at least one block or block-type copolymer : With solid polymer derived from at least one phenolic reactant wherein at least one of the reactants forming the solid polymer is saturated; or with SPFI wherein at least one of the necessary ingredients is a phenolic reactant or with a reaction product thereof; or with phenolic-containing SICP)
Patent 6204328: Polyolefin resin composition
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Mixing of solid block or block-type copolymer with other solid polymer; mixing of said polymer mixture with a chemical treating agent; mixing of a block or block-type copolymer with SICP or with SPFI; or processes of forming or reacting; or the resultant product of any of the above operations : Mixture contains two or more solid block or block-type copolymers : Solid polymer other than graft or graft-type derived from nonaromatic plural ethylenically unsaturated reactant)
Patent 6204329: Polysiloxane-polybutylene copolymers
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : With saturated Si-C or Si-H reactant or polymer thereof; or with solid copolymer derived from at least one Si-C or Si-H reactant wherein at least one of the reactants forming the solid copolymer is saturated; or with SPFI wherein at least one of the necessary ingredients contains a Si-C or Si-H bond or with a reaction product thereof; or with a SICP containing a Si-H or Si-C bond : Solid polymer from ethylenic reactants only is derived from unsaturated hydrocarbon : Solid block or block-type copolymer derived from reactant containing plural unsaturation)
Patent 6204330: Polymer mixture for slush molding
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : At least one reactant which forms additional polymer contains a carboxylic acid or derivative)
Patent 6204331: Multi-layer golf ball utilizing silicone materials
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : Solid polymer derived from reactant containing a carboxylic acid group : Nitrogen reactant contains a carboxylic acid amide group)
Patent 6204332: Water-dilutable coating composition of polyhydroxyl condensation or addition resin, amino resin and blocked acid catalyst
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : Solid polymer derived from reactant containing a carboxylic acid group : Nitrogen reactant contains a carboxylic acid amide group)
Patent 6204333: Solid golf ball
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : Solid polymer derived from reactant containing a carboxylic acid group : Nitrogen reactant contains a carboxylic acid amide group)
Patent 6204334: Blocky chlorinated polyolefins, process for making and use as impact modifier compatibilizer for PVC or CPVC
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : Solid polymer derived from vinyl(idene) chloride : At least two polymers derived from reactants containing two or more ethylenic groups and devoid of an aryl ring)
Patent 6204335: Compositions of linear ultra low density polyethylene and propylene polymers and films therefrom
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer mixture of two or more solid polymers derived from ethylenically unsaturated reactants only; or mixtures of said polymer mixture with a chemical treating agent; or products or processes of preparing any of the above mixtures : Solid polymer derived from ethylene or propylene : At least two polymers derived from reactants containing two or more ethylenic groups and devoid of an aryl ring)
Patent 6204336: High-rigidity ethylene/propylene block copolymer and process for the production thereof
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Polymer derived from ethylenic reactants only mixed with ethylenic reactant : Contacting a solid polymer derived from ethylenic reactants only with an ethylenic reactant in the presence of a specified material : At least two polymers derived from reactants containing two or more ethylenic groups and devoid of an aryl ring)
Patent 6204337: Solid-phase synthesis of codeine from morphine
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Chemically after treated solid polymers derived from ethylenically unsaturated monomers only : Polymer derived from monomer containing at least two ethylenic groups or diene rubber : Monomer contains non-conjugated diene group or at least one fused or bridged ring or at least one cycloaliphatic structure : Divinyl benzene : Halogen containing chemical treating agent)
Patent 6204338: Polymer bromination process
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Chemically after treated solid polymers derived from ethylenically unsaturated monomers only : Polymer derived from monomer containing at least two ethylenic groups or diene rubber : Interpolymer with aliphatic hydrocarbon monomer (includes additional diene monomer) : Sulfur containing chemical treating agent)
Patent 6204339: Elastomeric composition comprising a blocked mercaptosilane coupling agent and a deblocking agent
(SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES : : MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS : At least one solid polymer derived from ethylenic reactants only : Chemical treating agent contains a sulfur atom : Mercaptan or mercaptide : Heterocyclic ring contains sulfur and nitrogen atoms)
|