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United States Patent | 6,227,585 |
Govzman ,   et al. | May 8, 2001 |
Substrate handling apparatus and methods are described. In one aspect, the substrate handling apparatus includes a clamping member having an extended condition wherein substrate movement relative to the transfer arm is substantially restricted and a retracted condition wherein substrate movement relative to the transfer arm is substantially free. The substrate handling apparatus further includes a sense mechanism (e.g., a vacuum sensor) constructed to determine whether a substrate is properly positioned on the support arm and to trigger the mode of operation of the clamping member between extended and retracted conditions. The sense mechanism also provides information relating to the operating condition of the clamping member.
Inventors: | Govzman; Boris (Sunnyvale, CA); Volodarsky; Konstantin (San Francisco, CA); Volfovski; Leon (Mountain View, CA) |
Assignee: | Applied Materials, Inc. (Santa Clara, CA) |
Appl. No.: | 206087 |
Filed: | December 4, 1998 |
Intern'l Class: | B25J 015/06; B25J 019/02 |
Field of Search: | 294/1.1,34,64.1-64.3,103.1,119.1,907 414/941,752.1 901/40,46 |
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