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United States Patent |
5,754,266
|
Ohta
,   et al.
|
May 19, 1998
|
Liquid crystal display device with wide viewing angle characteristics
Abstract
A liquid crystal display device has a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode
which receives a video signal from the video signal line through the drain
electrode and a thin-film transistor, a gate electrode for turning the
thin-film transistor on, a counter electrode to which a counter voltage is
applied through a counter voltage signal line, and a storage capacitor
formed by superposing part of said pixel electrode on part of said counter
voltage signal line via an interlayer insulating film. In the liquid
display device are formed pixels where the light transmission factor of
the liquid crystal is changed by use of an electric field which is
established between the pixel electrode and the counter electrode and has
the component in parallel with the surface of the substrate, the
dielectric constant anisotropy .DELTA..epsilon., the effective thickness
deff of the liquid crystal layer, the width Wp of the pixel electrode in
the short-side direction, the width Wc of the counter electrode in the
short-side direction, and the gap L between the pixel electrode and the
counter electrode satisfy the following relationships,
.DELTA..epsilon.>0, 2.8 .mu.m.ltoreq.deff.ltoreq.4.5 .mu.m, and
1.2.times.deff.ltoreq.Wp.ltoreq.L/1.2,
1.2.times.deff.ltoreq.Wc.ltoreq.L/1.2, or .DELTA..epsilon.<0, 4.2
.mu.m.ltoreq.deff.ltoreq.8.0 .mu.m, and
1.2.times.deff.ltoreq.Wp.ltoreq.L/1.2,
1.2.times.deff.ltoreq.Wc.ltoreq.L/1.2.
When the scanning signal lines connected to the gate electrodes and the
counter voltage signal lines connected to the counter electrodes are
arranged in parallel in the direction of row of a plurality of pixels
arranged in the form of a matrix and when the video signal lines connected
to the drain electrodes are arranged in parallel in the direction of
column, the counter voltage signal line is used in common by the two
pixels adjacent to each other in the direction of column. Alternatively,
both ends of the counter voltage signal lines are connected to the common
bus line and are further connected to the counter electrode driver means.
Inventors:
|
Ohta; Masuyuki (Mobara, JP);
Yanagawa; Kazuhiko (Mobara, JP);
Ashizawa; Keiichiro (Mobara, JP);
Mishima; Yasuyuki (Mobara, JP);
Ogawa; Kazuhiro (Mobara, JP);
Ohe; Masahito (Mobara, JP);
Yanai; Masahiro (Mobara, JP);
Kondo; Katsumi (Hitachinaka, JP)
|
Assignee:
|
Hitachi, Ltd. (Tokyo, JP)
|
Appl. No.:
|
610340 |
Filed:
|
March 4, 1996 |
Foreign Application Priority Data
| Mar 17, 1995[JP] | 7-058874 |
| Apr 28, 1995[JP] | 7-105862 |
| Jul 27, 1995[JP] | 7-191341 |
Current U.S. Class: |
349/139; 349/110; 349/143 |
Intern'l Class: |
G02F 001/133.3; G02F 001/134.3 |
Field of Search: |
349/42,139,143,110
|
References Cited
U.S. Patent Documents
5412494 | May., 1995 | Ishiwata et al. | 349/110.
|
5568291 | Oct., 1996 | Murata et al. | 349/110.
|
5598285 | Jan., 1997 | Kondo et al. | 349/42.
|
5600464 | Feb., 1997 | Ohe et al. | 349/138.
|
Foreign Patent Documents |
6-202127 | Jul., 1994 | JP | 349/143.
|
6-214244 | Aug., 1994 | JP | 349/143.
|
Primary Examiner: Sikes; William L.
Assistant Examiner: Ton; Toan
Attorney, Agent or Firm: Antonelli, Terry, Stout & Kraus, LLP
Claims
We claim:
1. A liquid crystal display device having a plurality of pixels arranged in
the form of a matrix and means for applying voltage signals to change the
light transmission factor or light reflection factor of said pixels, said
liquid crystal display device comprising:
a liquid crystal layer made of twistable liquid crystal molecules;
a first substrate and a second substrate sandwiching said liquid crystal
layer therebetween, at least one of which is transparent;
at least one polarizing means; and
at least a pair of a pixel electrode and a counter electrode formed in each
of said pixels between said first substrate and said liquid crystal layer
in order to control the twisting amounts of liquid crystal molecules of
said liquid crystal layer by use of an electric field which is established
between said pixel electrode and said counter electrode and has a
component in parallel with said first substrate;
wherein the effective thickness deff of said liquid crystal layer, the
width Wp of said pixel electrode in a predetermined direction, the width
Wc of said counter electrode in predetermined direction, and the gap L
between said pixel electrode and said counter electrode satisfy the
following relationships,
1.2.times.deff; Wp.ltoreq.L/1.2, and 1.2.times.deff.ltoreq.Wc.ltoreq.L/1.2
2. A liquid crystal display device according to claim 1, wherein the
effective thickness deff of said liquid crystal layer further satisfies
the relationship of 2.8 .mu.m.ltoreq.deff.ltoreq.4.5 .mu.m.
3. A liquid crystal display device according to claim 1, wherein the
effective thickness deff of said liquid crystal layer further satisfies
the relationship of 4.2 .mu.m.ltoreq.deff.ltoreq.8.0 .mu.m.
4. A liquid crystal display device according to one of claims 1, 2 and 3,
wherein said liquid crystal layer has a dielectric constant anisotropy
.DELTA..epsilon..
5. A liquid crystal display device according to claim 4, wherein said
predetermined direction is a short-side direction.
6. A liquid crystal display device according to claim 5, wherein
.DELTA..epsilon..ltoreq.0.
7. A liquid crystal display device having a plurality of pixels arranged in
the form of a matrix and means for applying voltage signals to change the
light transmission factor or light reflection factor of said pixels, said
liquid crystal display device comprising:
a liquid crystal layer made of twistable liquid crystal molecules;
a first substrate and a second substrate sandwiching said liquid crystal
layer therebetween, at least one of which is transparent;
at least one polarizing means; and
at least a pair of a pixel electrode and a counter electrode formed in each
of said pixels between said first substrate and said liquid crystal layer
in order to control the twisting amounts of liquid crystal molecules of
said liquid crystal layer by use of an electric field which is established
between said pixel electrode and said counter electrode and has a
component in parallel with said first substrate;
wherein the dielectric constant anisotropy .DELTA..epsilon. of said liquid
crystal layer, the effective thickness deff of said liquid crystal layer,
the width Wp of said pixel electrode in the short-side direction, the
width Wc of said counter electrode in the short-side direction, and the
gap L between said pixel electrode and said counter electrode satisfy the
following relationships,
.DELTA..epsilon.<0, 4.2 .mu.m.ltoreq.deff.ltoreq.8.0 .mu.m,
1.2.times.deff.ltoreq.Wp.ltoreq.L/1.2, and
1.2.times.deff.ltoreq.Wc.ltoreq.L/1.2
8.
8. A liquid crystal display device having a plurality of pixels arranged in
the form of a matrix and means for applying voltage signals to change the
light transmission factor or light reflection factor of said pixels, said
liquid crystal display device comprising:
a liquid crystal layer made of twistable liquid crystal molecules;
a first substrate and a second substrate sandwiching said liquid crystal
layer therebetween, at least one of which is transparent;
at least one polarizing means;
at least a pair of a pixel electrode and a counter electrode formed in each
said pixels between said first substrate and said liquid crystal layer in
order in control the twisting amounts of liquid crystal molecules of said
liquid crystal layer by use of an electric field which is established
between said pixel electrode and said counter electrode and has a
component in parallel with said first substrate;
a black matrix formed between said second substrate and said liquid crystal
layer, wherein said black matrix is made of an insulating material; and
wherein the effective thickness deff of said liquid crystal layer, the
width Wp of said pixel electrode in a predetermined direction, the width
Wc of said counter electrode in the predetermined direction, and the gap L
between said pixel electrode and said counter electrode satisfying the
following relationship,
1. 2.times.deff.ltoreq.Wp.ltoreq.L/1.2, and
1.2.times.deff.ltoreq.Wc.ltoreq.L/1.2
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a liquid crystal display device and, more
particularly, to a liquid crystal display device with wide viewing angle
characteristics of the active matrix system using thin-film transistors.
2. Description of the Prior Art
Active matrix liquid crystal display devices using active elements as
represented by thin-film transistors (TFT) have now been widely used as
display terminals of OA equipment since they are light in weight and have
a high picture quality equivalent to that of cathode-ray tubes.
The display system of the liquid crystal display devices can be roughly
divided into two. One is a system in which liquid crystals are sandwiched
by two substrates having transparent electrodes and are driven by a
voltage applied to the transparent electrodes, and light incident upon the
liquid crystals and transmitted through the transparent electrodes is
modulated to achieve display. All of the products that are now available
are based upon this system. Another one is a system in which liquid
crystals are driven by an electric field which is nearly in parallel with
the surface of a substrate between two electrodes that are formed on the
same substrate, and light incident upon the liquid crystals through a gap
between the two electrodes is modulated to provide display. Though no
product which is based upon this system has yet been provided, it has a
feature of a very wide viewing angle and a promising art in connection
with active matrix liquid crystal display devices.
Features of the latter system have been disclosed in, for example, Japanese
Patent Laid-Open No. 505247/1993, Japanese Patent Publication No.
21907/1988 and Japanese Patent Laid-Open No. 160878/1994.
SUMMARY OF THE INVENTION
A first problem that is to be solved by the present invention will be
described below.
In a conventional liquid crystal display device of the latter system, an
electric field which is substantially in parallel with the surface of the
substrate is generated via thin-film electrodes having thicknesses of
about several thousand angstroms, making it difficult to effectively
generate the electric field in the liquid crystal layer compared with the
former system.
Therefore, an electric field stronger than that of the former system must
be generated between the electrodes, resulting in an increase in the
consumption of electric power and making it necessary to employ, as a
driver unit, an LSI having an increased breakdown voltage.
A second problem is that in the former system, a metal material having good
light-shielding property has been used as a black matrix (light-shielding
film) that covers the portions where undesired light passes through. When
this metal material is used for the latter system, however, the electric
field between the electrodes is absorbed by the black matrix, making it
difficult to generate an effective electric field between the electrodes.
A third problem is that in the former system, the electric field from a
video signal line is absorbed by a counter electrode that is formed on
nearly the whole surface of a substrate opposed to the substrate on which
the video signal line is formed, and the electric field formed by the
video signal line does not affect the electric field established between
the electrodes. In the latter system in which no electrode exists on the
substrate opposed to the substrate on which the video signal line is
formed, however, the electric field formed by the video signal line
affects the electric field established between the electrodes, giving rise
to the occurrence of crosstalk (particularly in the vertical direction of
the screen) in which video information of other rows affect the display
and, hence, appearance of striped image called vertical smear.
A fourth problem is that in the latter system in which the counter
electrode can be formed linearly, the resistance of the counter electrode
from the input end to the other end thereof becomes very larger than that
of when the counter electrode is formed in a planar shape in the former
system. Therefore, the counter voltage is not sufficiently fed to the
terminal pixels, and the counter voltage is distorted by the video signals
due to the capacitance at a portion where the counter voltage signal line
intersects the video signal line, resulting in the occurrence of crosstalk
(particularly, in the horizontal direction of the screen) and appearance
of striped image called lateral smear.
A fifth problem is that in the latter conventional system in which the
pixel electrode PX and the counter electrode CT are arranged on the same
substrate, the opening area that contributes to the display decreases by
the amount corresponding to the arrangement of the counter voltage signal
line CL compared with that of the former conventional system.
Moreover, an increase in the number of intersecting points of the wirings
arranged in the form of a matrix results in increased chances of
short-circuiting among the wirings and in an increase in the parasitic
capacitance among the signal lines, hindering smooth transfer of signals.
Besides, while the pixel electrode PX in the former system has a planar
shape, the pixel electrode PX of the latter system has a narrow strip
shape or a line shape, often causing pixels to become defective due to
disconnection of the line.
A sixth problem is that the latter conventional system may employ an AC
driving method to apply an AC voltage to the liquid crystal layer, e.g.,
an AC driving method which inverts a drive voltage applied to the liquid
crystal layer after every horizontal scanning interval. In this case, when
a pulse voltage is applied to the counter voltage signal line CL having a
resistance R and a capacitance C, the pulse voltage is distorted.
Hereinafter, the sixth problem will be described with reference to FIGS.
25 and 26.
FIG. 25 is a diagram of an equivalent circuit of a transmission passage for
transmitting a drive voltage applied to the counter voltage signal line CL
in a liquid crystal display device of the latter system, and FIG. 26 is a
diagram showing waveforms of a drive voltage applied to the counter
electrode CT at each of the points.
The transmission passage for transmitting a drive voltage applied to the
counter electrode CT includes chiefly resistors 50 of the counter voltage
signal line CL, a resistor 51 of a common bus line CB between a common
voltage driver unit 52 and the counter voltage signal line CL, and storage
capacitors 53 in the pixels. Therefore, when a liquid crystal layer is
driven by an AC drive voltage, the waveform of the drive voltage (pulse
voltage) fed to the counter electrode CT from the common voltage driver
unit 52 of a common voltage generator and driver unit 103 is distorted.
As will be understood from a counter voltage waveform 54 at point D, a
counter voltage waveform 55 at point E, a counter voltage waveform 56 at
point F and a counter voltage waveform 57 at point G shown in FIG. 26, the
distortion of waveform of the drive voltage fed to the counter electrode
CT increases with an increase in the distance, from point D, to point G.
As a result, the electric field between the pixel electrode PX and the
counter electrode CT in the pixels differs, irregular brightness
(irregular display) occurs along the counter voltage signal line CL, and
the display quality of the liquid crystal display panel is impaired.
This becomes a serious problem particularly when there is employed an AC
drive system which inverts the drive voltage applied to the liquid crystal
layer after every horizontal scanning interval.
When the counter voltage signal line CL is broken even at one place,
furthermore, it is impossible to drive the liquid crystals since the drive
voltage is no longer fed to the counter electrode CT of the pixels after
the broken portion, impairing the display quality of the liquid crystal
display panel.
According to the constitution of the prior art, furthermore, the thickness
differs by a thickness of the signal line depending upon the portions
where the video signal line DL and the scanning signal line GL are led out
and the portions where such signal lines are not led out. Therefore, the
gap becomes irregular in the whole panel impairing the display quality of
the liquid crystal display panel.
The object of the present invention is to provide a liquid crystal display
device of high picture quality that can be efficiently fabricated, that is
powered on a low voltage and consumes small amounts of electric power, and
has wide viewing characteristics as a result of solving the
above-mentioned problems inherent in the prior art.
Description of representatives of the invention disclosed in this
specification is as follows.
Means for solving the above-mentioned first to fourth problems will be
described below.
Means 1
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a pixel electrode and a counter electrode formed between one
of the substrates and the liquid crystal layer, in order to change the
light transmission factor or the light reflection factor of the liquid
crystals by use of an electric field which is established between the
pixel electrode and the counter electrode and has a component in parallel
with the one substrate, wherein the dielectric constant anisotropy
.DELTA..epsilon. and the effective thickness deff of the liquid crystal
layer, the width Wp of the pixel electrode in the lateral direction, the
width Wc of the counter electrode in the lateral direction, and the gap L
between the pixel electrode and the counter electrode satisfy the
following relationships,
.delta..epsilon.>0, 2.8 .mu.m<deff<4.5 pm,
1.2'deff<Wp<L/1.2, and 1.2.times.deff<Wc<L/1.2
Means 2
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a pixel electrode and a counter electrode formed between the
one of the substrates and the liquid crystal layer, in order to change the
light transmission factor or the light reflection factor of the liquid
crystals by use of an electric field which is established between the
pixel electrode and the counter electrode and has a component in parallel
with the one substrate, wherein the dielectric constant anisotropy
.DELTA..epsilon. and the effective thickness deff of the liquid crystal
layer, the width Wp of the pixel electrode in the lateral direction, the
width Wc of the counter electrode in the lateral direction, and the gap L
between the pixel electrode and the counter electrode satisfy the
following relationships,
.DELTA..epsilon.<0, 4.2 .mu.m<deff<8.0 .mu.m
1.2.times.deff<Wp<L/1.2, and 1.2.times.deff<Wc<L/1.2
Means 3
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a pixel electrode and a counter electrode formed between one
of the substrates and the liquid crystal layer, whereby pixels are formed
such that the light transmission factor or the light reflection factor of
the liquid crystals is changed by an electric field which is established
between the pixel electrode and the counter electrode and has a component
in parallel with the one substrate, and forming a black matrix surrounding
the pixels on a plane, wherein the black matrix is made of an insulating
material.
Means 4
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, and a counter electrode, that are
formed between one of the substrates and the liquid crystal layer, whereby
pixels are formed such that the light transmission factor or the light
reflection factor of the liquid crystals is changed by an electric field
which is established between the pixel electrode and the counter electrode
and has a component in parallel with the one substrate, wherein the
counter electrodes of adjacent pixels are positioned on both sides of the
video signal line, and the widths of the counter electrodes are not
smaller than one-half the width of the video signal line.
Means 5
In the means 4, the counter electrode is made of an anodizable metal, and a
self-anodized film of this metal covers the counter electrode.
Means 6
In the means 5, the counter electrode is made of aluminum.
Means 7
In the means 5, the counter electrode is formed simultaneously with the
gate signal line which is made of a metal layer having anodized surface.
Means 8
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, a gate signal line connected to a
gate electrode which turns the thin film transistor on, and a counter
electrode to which a counter voltage is applied via a counter voltage
signal line, which are formed between one of the substrates and the liquid
crystal layer, whereby pixels are formed such that the light transmission
factor of the liquid crystals is changed by an electric field which is
established between the pixel electrode and the counter electrode and has
a component in parallel with the surface of the one substrate, wherein the
gate signal line is made of a metal layer having anodized surface, and the
counter voltage signal line is made of the same material as that of the
gate signal line.
Means 9
In the means 8, the counter voltage signal line is made of aluminum.
Means 10
In the means 8, the counter voltage signal line and the gate signal line
are formed through the same step.
Means 11
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, a gate electrode for turning the
thin film transistor on, a counter electrode to which a counter voltage is
applied via a counter voltage signal line, and a storage capacitor formed
by superposing part of the pixel electrode on part of the counter voltage
signal line via an interlayer insulating film, which are formed between
one of the substrate and the liquid crystal layer, whereby pixels are
formed such that the light transmission factor of the liquid crystals is
changed by an electric field which is established between the pixel
electrode and the counter electrode and has a component in parallel with
the surface of the substrate, wherein the counter voltage signal line is
made of aluminum having anodized surface.
Means 12
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, a gate electrode for turning the
thin film transistor on, and a counter electrode to which a counter
voltage is applied via a counter voltage signal line, which are formed
between the one substrate and the liquid crystal layer, whereby pixels are
formed such that the light transmission factor of the liquid crystals is
changed by an electric field which is established between the pixel
electrode and the counter electrode and has a component in parallel with
the substrate, wherein a common bus line is provided to connect in common
the counter voltage signal lines of the plurality of pixels, and the
common bus line has a multilayer structure of two or more conductive
layers.
Means 13
In the means 12, the common bus line is made up of a conductive layer of
the same material as that of the gate electrode and a conductive layer of
the same material as that of the video signal line, and these conductive
layers are formed simultaneously with the formation of the gate electrode
and the video signal line.
In order to solve the above-mentioned fifth problem according to the
present invention, the counter voltage signal line and the drain electrode
are used in common by two pixels adjacent to each other in the direction
of column, and the storage capacitor is formed in a part of the counter
voltage signal line.
Means 14
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, a gate electrode for turning the
thin film transistor on, a counter electrode to which a counter voltage is
applied via a counter voltage signal line, and a storage capacitor formed
by superposing part of the pixel electrode on part of the counter voltage
signal line via an interlayer insulating film, which are formed between
the one of the substrates and the liquid crystal layer, whereby pixels are
formed such that the light transmission factor of the liquid crystals is
changed by an electric field which is established between the pixel
electrode and the counter electrode and has a component in parallel with
the substrate, wherein the scanning signal lines connected to the gate
electrodes and the counter voltage signal lines connected to the counter
electrodes are arranged in parallel in a first direction of the plurality
of pixels that are arranged in the form of a matrix, and the video signals
connected to the drain electrodes are arranged in parallel in a second
direction, and wherein the counter voltage signal line is used in common
by two pixels adjacent to each other in the second direction.
Means 15
In the means 14, the gate electrodes, scanning signal lines and thin-film
transistor elements of the two pixels adjacent to each other in the
direction of column are so arranged as to be opposed to each other, the
drain electrodes are used in common by the two pixels, and the wirings
from the drain electrodes to the video signal lines are arranged between
the opposing scanning signal lines.
Means 16
In the means 15, the thin-film transistors are formed along the scanning
signal line in such a way that the plurality of the thin-film transistors
are connected to the pixel electrodes in a pixel.
Means for solving the above-mentioned sixth problem will be described
below.
Means 17
A liquid crystal display device having a pair of substrates at least one of
which is transparent, a liquid crystal layer sandwiched by the pair of
substrates, a video signal line, a drain electrode, a pixel electrode to
which is applied a video signal from the video signal line via the drain
electrode and a thin film transistor, a gate signal line connected to a
gate electrode for turning the thin film transistor on, and a counter
electrode to which a counter voltage is applied via a counter voltage
signal line, which are formed between one of the substrates and the liquid
crystal layer, whereby pixels are formed such that the light transmission
factor of the liquid crystals is changed by an electric field which is
established between the pixel electrode and the counter electrode and has
a component in parallel with the substrate, wherein the ends on both sides
of the counter voltage signal line are connected to a common bus line and
are, further, connected to a common voltage generating and driving means.
Means 18
In the means 17, thickness adjustment patterns are provided on the
non-display area of one of the substrates, and the thickness adjustment
patterns are made of the same material and have the same thickness as that
of the common bus line.
Means 19
In the means 17 or 18, a thickness adjustment film made of the same
material and having the same thickness as that of the gate electrode is
provided over or under the common bus line in the non-intersecting areas
except the areas where the common bus line intersects the gate signal line
or the video signal line and except the areas where the common bus line is
connected to the counter voltage signal line.
Means 20
In the means 17 or 18, a thickness adjustment film made of the same
material and having the same thickness as that of the drain electrode is
provided over or under the common bus line in the non-intersecting areas
except the areas where the common bus line intersects the gate signal line
or the video signal line and except the areas where the common bus line is
connected to the counter voltage signal line.
According to the constitution of means 1, when a liquid crystal composition
having positive dielectric constant anisotropy is used, it is possible to
obtain a transmission characteristic little depending upon the wavelength
in the birefringence mode, i.e., to obtain good white display, and to
apply an electric field component to the liquid crystal layer in parallel
with the substrate, which is much stronger than the component of the
electric field in the direction perpendicular to the substrate. It is
therefore possible to utilize the most efficient transmission state
enabling the voltage between the pixel electrode and the counter electrode
to be efficiently converted into the component in the direction in
parallel with the substrate without raising the voltage for driving the
liquid crystal.
According to the constitution of means 2, when a liquid crystal composition
having negative dielectric constant anisotropy is used, it is possible to
obtain a transmission characteristic little depending upon the wavelength
in the birefringence mode, i.e., to obtain good white display, and to
apply an electric field component to the liquid crystal layer in parallel
with the substrate, which is much stronger than an electric field
component in the direction perpendicular to the substrate. It is therefore
possible to utilize the most efficient transmission state enabling the
voltage between the pixel electrode and the counter electrode to be
efficiently converted into the one in the direction in parallel with the
substrate without raising the voltage for driving the liquid crystal.
According to the constitution of means 3, it is possible to eliminate the
effect upon the electric field between the pixel electrode and the counter
electrode because the black matrix is constituted by an insulating
material. The black matrix cuts off the effect upon the electric field
between the pixel electrode and the counter electrode enabling the
distance to be decreased among the electrodes. It is therefore allowed to
increase the aperture ratio, and to effectively apply an electric field
component in parallel with the surface of the substrate to the liquid
crystal layer without raising the voltage for driving the liquid crystals.
According to the constitution of means 4, the lines of electric force from
the video signal line can be absorbed by the counter electrodes that are
located on both sides thereof, making it possible to prevent the
occurrence of so-called crosstalk. In this case, the lines of electric
force from the video signal line are equally divided by the counter
electrodes on both sides each by 50%; i.e., 100% of the lines of electric
force are absorbed in total.
According to the constitution of means 5, short-circuiting is prevented
from occurring even when the counter electrodes on both sides are brought
as close to each other as possible or even when they are arranged to
intersect with the video signal line. This makes it possible to increase
the aperture ratio.
According to the constitution of means 6, the counter electrodes have a
small resistance. Therefore, a nearly uniform and stable current flows
through the counter electrodes, and the counter voltage is sufficiently
transmitted even to the pixels at the terminals, making it possible to
further heighten the effect of means 4.
According to the constitution of means 7, it is possible to obtain the
effect of means 5 without increasing the number of steps of production.
According to the constitution of means 8, it is possible to decrease the
probability of short-circuiting at the areas where the counter voltage
signal line intersects the video signal line.
According to the constitution of means 9, the counter voltage signal line
has a small resistance and a nearly uniform and stable current flows
through each of the counter electrodes. Therefore, a counter voltage is
sufficiently transmitted to the pixels even at the terminals making it
possible to achieve uniform pixel display.
According to the constitution of means 10, the effect of means 7 is gained
without increasing the number of production steps.
According to the constitution of means 11, the electrode of the lower side
formed via an interlayer insulating film is made of aluminum having an
anodized surface, making it possible to form a storage capacitor little
permitting the occurrence of troubles that are caused by point defects due
to so-called whiskers.
According to the constitution of means 12, it is possible to decrease the
resistance without increasing the width of the common bus line and to
apply a sufficiently large voltage up to the ends of the counter
electrodes. This makes it possible to decrease crosstalk (particularly,
crosstalk in the horizontal direction of the screen) that is caused by
distortion of the counter voltage according to the video signals.
According to the constitution of means 13, it is possible to obtain the
effect of means 12 without increasing the number of steps of production.
According to the constitution of means 14, the gate signal lines GL
connected to the gate electrodes GT and the counter voltage signal lines
CL connected to the counter electrodes CT are arranged in parallel in the
direction of row of a plurality of pixels arranged in the form of a
matrix, the counter voltage signal line CL is used in common by the two
pixels adjacent to each other in the direction of column, and the video
signal lines DL connected to the drain electrodes SD2 are arranged in
parallel in the direction of column, in order to decrease the parasitic
capacitance among the wirings, to increase the production yield, to ensure
the openings in the pixels and to decrease the resistances of the counter
voltage signal lines CL.
According to the constitution of means 15, the gate electrodes GT, gate
signal lines GL and thin-film transistor elements of two pixels adjacent
to each other in the direction of column in the constitution of means 14
are so arranged as to be opposed to each other, the drain electrode SD2 is
used in common by the two pixels, and the wiring from the drain electrode
SD2 to the video signal line DL is arranged between the opposing gate
signal lines GL, in order to decrease the parasitic capacitance among the
wirings, to increase the production yield, to ensure the openings in the
pixels and to decrease the resistances of the counter voltage signal lines
CL.
According to the constitution of means 16, the thin-film transistors are
formed along the gate signal line GL in such a way that the plurality of
thin-film transistors are connected to the pixel electrodes PX in one
pixel of the constitution of means 15, in order to decrease the parasitic
capacitances among the wirings, to increase the production yield, to
ensure the openings in the pixels and to decrease the resistances of the
counter voltage signal lines CL.
According to the constitution of means 17 to 20, both ends of the counter
voltage signal lines CL are connected to the common bus line CB which has
a resistance smaller than the resistances of the counter voltage signal
lines CL. It is therefore possible to decrease distortion in the waveform
of the drive voltage applied to the counter electrodes CT from the common
voltage driver unit 52, to uniformalize the electric field intensity
between the pixel electrode PX and the counter electrode CT in each pixel
in the panel, and to decrease irregularity in the brightness that occurs
along the counter voltage signal line CL.
Even in case the counter voltage signal line CL is broken at a portion, the
common voltage is supplied from both ends of the counter voltage signal
line CL to drive liquid crystal of the pixels. Unlike the prior art,
therefore, the liquid crystal of pixels after the broken portion can be
driven, and the quality of display is not impaired.
Furthermore, the area where the common bus line CB is arranged has the same
cross-sectional structure as that of an area where the common bus line CB
intersects the gate signal line GL or the video signal line DL, making it
possible to decrease irregularity in the film thickness at the edges of
the substrate where the common bus line CB is formed, to uniform the gap
length between two substrates, and to decrease gap irregularity of the
liquid crystal display device.
The foregoing and other objects, advantages, manner of operation and novel
features of the present invention will be understood from the following
detailed description when read in connection with the accompanying
drawings.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a diagram schematically illustrating a pixel for explaining the
basic operation of a liquid crystal display element of the present
invention;
FIG. 2 is a plan view of essential portions illustrating a pixel and
peripheries thereof in a liquid crystal display unit of an active
matrix-type color liquid crystal display device of an embodiment 1;
FIG. 3 is a diagram illustrating a pattern of a black matrix of embodiment
1;
FIG. 4 is a plan view of essential portions illustrating a pixel and
peripheries thereof in a liquid crystal display unit of an active
matrix-type color liquid crystal display device of embodiment 2;
FIG. 5 is a plan view of a plurality of pixels on a liquid crystal display
panel formed by arranging the pixels of embodiment 1;
FIG. 6 is a diagram of an electrically equivalent circuit of two pixels
adjacent to each other in the direction of column of embodiment 1;
FIG. 7 is a sectional view of a pixel cut along the line 3--3 in FIG. 2;
FIG. 8 is a sectional view of a thin-film transistor element TFT cut along
the line 4--4 in FIG. 2;
FIG. 9 is a sectional view of a storage capacitor Cstg cut along the line
5--5 in FIG. 2;
FIG. 10 is a plan view for explaining the constitution of the peripheries
of a matrix of the display panel;
FIG. 11 is a sectional view illustrating panel edge portions with gate
signal terminals on the left side but without external connection
terminals on the right side;
FIGS. 12A and 12B are a plan view and a sectional view illustrating the
area where a gate terminal GTM is connected to a gate wiring GL;
FIGS. 13A and 13B are a plan view and a sectional view illustrating the
area where a drain terminal DTM is connected to a video signal line DL;
FIGS. 14A and 14B are a plan view and a sectional view illustrating the
area where a common electrode terminal CTM, a common bus line CB and a
common voltage signal line CL are connected together;
FIG. 15 is a flow chart of a sectional view of a pixel and a gate terminal
illustrating the steps A to C of fabricating a substrate SUB1;
FIG. 16 is a flow chart of a sectional view of the pixel and the gate
terminal illustrating the steps D to F of fabricating the substrate SUB1;
FIG. 17 is a flow chart of a sectional view of the pixel and the gate
terminal, illustrating the steps G to H of fabricating the substrate SUB1;
FIG. 18 is a diagram illustrating the relationships among the direction in
which the electric field is applied, the direction of rubbing and the
transmission axis of a polarizer plate;
FIG. 19 is a diagram of a circuit illustrating a matrix unit and the
peripheries thereof of a active matrix-type color liquid crystal display
device of the present invention;
FIG. 20 is a diagram illustrating waveforms for driving the active
matrix-type color liquid crystal display device of the present invention;
FIG. 21 is a top view illustrating the state where the peripheral driver
units are mounted on a liquid crystal display panel;
FIG. 22 is a diagram illustrating, in cross section, the structure of a
tape carrier package TCP in which an integrated circuit chip CHI
constituting the driver unit is mounted on a flexible wiring substrate;
FIG. 23 is a sectional view illustrating essential portions in a state
where the tape carrier package TCP is connected to a terminal GTM for a
gate signal circuit in the liquid crystal display panel PNL;
FIG. 24 is an exploded perspective view illustrating a liquid crystal
display module;
FIG. 25 is a diagram illustrating an equivalent circuit of a passage for
transmitting a drive voltage to the counter electrodes CT in the liquid
crystal display device of FIG. 19;
FIG. 26 is a diagram of characteristics illustrating waveforms of the drive
voltage at each of the points shown in FIG. 25;
FIG. 27 is a block diagram schematically illustrating the constitution of
the liquid crystal display device of embodiment 3;
FIG. 28 is a diagram illustrating an equivalent circuit of a passage for
transmitting a drive voltage to the counter electrodes CT in the liquid
crystal display device of embodiment 3;
FIG. 29 is a diagram of characteristics illustrating waveforms of the drive
voltage at each of the points shown in FIG. 28;
FIGS. 30A to 30C are a plan view and sectional views illustrating the
connection of the counter voltage signal line CL and the common bus line
CB at point A on the matrix substrate of FIG. 27;
FIGS. 31A and 31B are a plan view and a sectional view illustrating the
connection of the counter voltage signal line CL and the common bus line
CB at point B on the matrix substrate of FIG. 27;
FIGS. 32A and 32B are a plan view and a sectional view illustrating the
intersection of the video signal line DL and the common bus line CB at
point C on the matrix substrate of FIG. 27;
FIGS. 33A to 33C are a plan view and sectional views illustrating another
example of connection of the counter voltage signal line CL and the common
bus line CB at point A on the matrix substrate of FIG. 27;
FIG. 34 is a plan view illustrating another arrangement of the common bus
line CB of embodiment 3;
FIG. 35 is a plan view illustrating a further arrangement of the common bus
line CB of embodiment 3;
FIGS. 36A to 36C are a plan view and sectional views illustrating the
connection of the counter voltage signal line CL and the common bus line
CB at a point corresponding to point A on the matrix substrate of FIG. 27
in the liquid crystal display device of embodiment 4;
FIGS. 37A and 37B are a plan view and a sectional view illustrating the
connection of the counter voltage signal line CL and the common bus line
CB at a point corresponding to point B on the matrix substrate of FIG. 27
in the liquid crystal display device of embodiment 4;
FIGS. 38A and 38B are a plan view and a sectional view illustrating the
intersection of the video signal line DL and the common bus line CB at a
point corresponding to point C of the matrix substrate of FIG. 27 in the
liquid crystal display device of embodiment 4; and
FIG. 39 is a plan view illustrating another arrangement of the common bus
line CB of embodiment 4.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Further objects and features of the present invention will become obvious
from the following description in conjunction with the drawings.
›Active matrix liquid crystal display device!
An embodiment in which the present invention is adapted to a color liquid
crystal display device of the active matrix system will be described
below. In the drawings, those portions having the same functions are
denoted by the same reference numerals and their description will not be
repeated.
First, prior to illustrating embodiments of the present invention, the
basic operation of the liquid crystal display element to which the present
invention is applied will be explained.
FIGS. 1A to 1D are schematic diagrams of a pixel for explaining the
operation of a liquid crystal display element to which the present
invention is applied, wherein FIG. 1A is a sectional view of when no
voltage is applied, FIG. 1B is a sectional view of when a voltage is
applied, FIG. 1C is a plan view of when no voltage is applied, and FIG. 1D
is a plan view of when a voltage is applied. In these drawings, SUB1 and
SUB2 denote transparent glass substrates (hereinafter often referred to
simply as substrates), CT denotes a counter electrode, GI denotes an
insulating film, DL denotes a video signal line, PX denotes a pixel
electrode, POL1 and POL2 denote polarizer plates, MAX1 denotes the
polarizing axis of the lower polarizer plate, MAX2 denotes the polarizing
axis of the upper polarizer plate, RDR denotes the initial orientation of
liquid crystal molecules, EDR denotes the direction of electric field, BM
denotes a black matrix, FIL denotes a color filter, OC denotes a
flattening film, ORI1 and ORI2 denote orientation films, and LC denotes
liquid crystals (rod-like liquid crystal molecules).
In the liquid crystal display element, the polarizer plate POL2,
light-shielding black matrix BM, color filter FIL, protective film OC and
orientation film ORI2 are formed on one substrate SUB2 of the two
transparent glass substrates SUB1 and SUB2. On the other substrate SUB1,
via the liquid crystals LC, are formed the polarizer plate POL1,
orientation film ORI1, drain electrode SD2, pixel electrode PX, counter
electrode CT, wirings and thin-film transistor. These drawings do not show
wirings and thin-film transistors.
Referring to FIGS. 1A and 1C, liquid crystals LC have been oriented in
advance by the orientation films ORI1 and ORI2 in the orientation RDR that
is substantially in parallel with the surface of the substrate SUB1. In
this state, the initial orientation RDR of the liquid crystals LC is
nearly in agreement with the polarizing axis MAX1 of the polarizing plate
POL1, the polarizing axis MAX1 and the polarizing axis MAX2 of the other
polarizing plate POL2 intersect at right angles, and the pixel is in a
non-display state.
Next, referring to FIGS. 1B and 1D, when a voltage is applied between the
counter electrode CT and the pixel electrode PX formed on the glass
substrate SUB1 in order to create an electric field (having a direction
EDR) substantially in parallel with the surface of the substrate SUB1, the
liquid crystal molecules LC are twisted on a plane substantially in
parallel with the surface of the substrate SUB1. Then, the pixel becomes a
display state. A large number of pixels are arranged to constitute a
display panel.
›Planar constitution of a matrix unit (pixel unit)!
FIG. 2 is a plan view illustrating a pixel and peripheries thereof in the
active matrix-type color liquid crystal display device of a first
embodiment of the present invention.
Referring to FIG. 2, each pixel is provided in a region (surrounded by four
signal lines) where the gate signal line (gate signal line or horizontal
signal line) GL, counter voltage signal line (counter electrode wiring) CL
and two adjacent video signal lines (drain signal lines or vertical signal
lines) DL intersect. Each pixel includes a thin-film transistor TFT, a
storage capacitor Cstg, a pixel electrode PX and a counter electrode CT.
The gate signal lines GL and the counter voltage signal lines CL extend in
the right-and-left direction in the drawing and are arranged in a plural
number in the up-and-down direction. The video signal lines DL extend in
the up-and-down direction and are arranged in a plural number in the
right-and-left direction. The pixel electrode PX is connected to the
thin-film transistor TFT, and the counter electrode CT is formed
integrally with the counter voltage signal line CL.
The two adjacent pixels along the video signal line DL have a planar
constitution such that they have the same size and pattern. The reason is
that the counter voltage signal line CL is used in common by the two
vertically adjacent pixels along the video signal line DL, the width of
the counter voltage signal line CL is increased and, hence, the resistance
of the counter voltage signal line CL is decreased. This makes it easy to
sufficiently feed a counter voltage to the counter electrodes CT of the
pixels arranged in the right-and-left direction from an external circuit.
The pixel electrode PX and the counter electrode CT are opposed to each
other, and the optical state of the liquid crystals LC is controlled by an
electric field between each pixel electrode PX and the counter electrode
CT, thereby to control the display. The pixel electrodes PX and the
counter electrodes CT are formed like comb teeth, and extend in a slender
form in the up-and-down direction.
When the pixel electrodes PX and the counter electrodes CT are arranged on
the surface of the same substrate, the liquid crystal display element of
this embodiment makes it possible to increase the area of the opening
portion of the pixel that transmits light and to increase the width of the
counter voltage signal line CL compared with the wiring constitution in
which the counter voltage signal line CL is not used in common by the two
pixels adjacent to each other in the direction of column.
As a result, the counter voltage signal line CL has a decreased resistance,
the common signals are smoothly propagated, the picture quality is
improved, and the common signal generator unit consumes a reduced amount
of electric power.
By commonly using the counter voltage signal line CL, furthermore, the
number of portions where the video signal line DL intersects the counter
voltage signal line CL is decreased by about 25% compared with that of the
conventional structure, and probability of short-circuiting between the
video signal line DL and the counter voltage signal line CL decreases.
FIG. 6 is a diagram of an electric equivalent circuit of two pixels
adjacent to each other in the direction of column, constituting the liquid
crystal display element of a lateral electric field system of the
embodiment.
In FIG. 6, reference numeral 24 denotes a wiring from the video signal line
DL to the drain electrode SD2, 31 denotes the interline capacitance
between the counter voltage signal line CL and the video signal line DL,
32 denotes the interline capacitance between the gate signal line GL and
the video signal line DL, and 33 denotes the interline capacitance between
the gate electrode GT and the pixel electrode PX.
The constitution of embodiment 1, as shown in the drawings, makes it
possible to decrease the parasitic capacitance 31 between the video signal
line DL and the counter voltage signal line CL, and to smoothly propagate
liquid crystal drive signals to the drain electrodes SD2 and to the
counter electrodes CT through the active filter wiring.
According to this embodiment as described above, it is possible to improve
the picture quality and to decrease the consumption of electric power by
the signal generator unit.
As shown in FIG. 2, furthermore, the gate electrodes GT, gate signal lines
GL and thin-film transistors TFT are devided by the two pixels adjacent to
each other in the direction of column, the drain electrode SD2 is used in
common, and the wiring 24 from the commonly used drain electrode SD2 to
the video signal line DL is provided between the opposing gate signal
lines GL. The constitution of this embodiment makes it possible to
decrease the area where the drain electrode SD2 intersects the gate signal
line GL and to decrease the probability of short-circuiting between the
drain electrode SD2 and the gate signal line GL.
Referring to the equivalent circuit of FIG. 6, the parasitic capacitance
(interline capacitance) 32 decreases between the drain electrode SD2 and
the gate signal line GL, signals can be smoothly propagated to the gate
electrodes GT, the picture quality is improved, and a decreased amount of
electric power is consumed by the signal generator unit.
The constitution of this embodiment in which the counter voltage signal
line CL is used in common and the drain electrode SD2 is used in common by
the two pixels adjacent to each other in the direction of column, can be
further applied to a conventional liquid crystal display panel of vertical
electric field system.
The position of the thin-film transistor TFT can be moved on the gate
signal line GL without increasing the area of intersection of the drain
electrode SD2 and the gate electrode GT.
Here, the pixel electrode PX in the liquid crystal display element
according to the present invention is of a narrow linear form, which may
cause the pixel to become defective when it is broken.
FIG. 4 is a plan view illustrating the structure of a pixel constituting a
liquid crystal display element of a second embodiment according to the
present invention. As shown in FIG. 2, the thin-film transistors TFT are
so provided that the plurality of thin-film transistors TFT are connected
to the number of the pixel electrodes PX while utilizing the features of
the first embodiment, the drain electrode SD2 is used in common, and the
wiring from the drain electrode SD2 to the video signal line DL is formed
between the opposing gate signal lines GL. Hence the display of pixel is
in an almost normal state even in case one of the pixel electrodes PX is
broken at a portion.
When any one of the thin-film transistors becomes defective, furthermore,
the pixel electrode PX connected to the defective thin-film transistor is
cut by using a laser correction means or the like, and the image is
displayed using other normal thin-film transistors.
According to the second embodiment as described above, it is possible to
obtain an active matrix-type liquid crystal display element having a high
picture quality and fabricated efficiently.
FIG. 5 is a plan view illustrating a plurality of pixels in a liquid
crystal display panel of in-plane electric field system formed by
arranging the pixels of the first embodiment. In FIG. 5, the counter
voltage signal line CL is used in common by the two pixels adjacent to
each other in the direction of column indicated by arrow P.
The number O of counter electrodes CT (number of comb teeth) in a pixel is
so selected as to always maintain the relationship O=P+1 with respect to
the number P of pixel electrodes PX (number of comb teeth) (O=3, P=2 in
this embodiment). The reason is that the counter electrode CT and the
pixel electrode PX are alternately arranged and the counter electrodes CT
are provided on both sides of the video signal line DL on a plane. This
makes it possible to shield the lines of electric force from the video
signal line DL with the counter electrodes CT, so that the electric field
between the counter electrode CT and the pixel electrode PX is not
affected by the electric field generated by the video signal line DL. The
counter electrode CT is fed with a potential at all times from an external
unit, i.e., from a counter voltage signal line CL that will be described
later, and takes a stable potential. Therefore, the potential of the
counter electrode CT changes very little even when it is laid close to the
video signal line DL. This further causes the pixel electrode Px to be
located geometrically away from the video signal line DL. Therefore, the
parasitic capacitance between the pixel electrode PX and the video signal
line DL, greatly decreases, making it possible to suppress fluctuation in
the pixel electrode potential Vs caused by the video signal voltage.
Therefore, crosstalk (image defect called vertical smear) that occurs in
the up-and-down direction is suppressed.
The pixel electrode PX and the counter electrode CT have widths Wp and Wc
which are 6 .mu.m, respectively, and are very larger than a maximum
predetermined thickness of 4.5 .mu.m of a liquid crystal layer that will
be described later. By taking variation during the production into
consideration, it is desired that a margin of not smaller than 20% is
maintained. Desirably, therefore, these electrodes should have widths of
much larger than 5.4 .mu.m. Therefore, the electric field component which
is applied to the liquid crystal layer and is in parallel with the surface
of the substrate becomes larger than the electric field component in the
direction perpendicular to the surface of the substrate, making it
possible to lower the voltage for driving liquid crystals.
It is further desirable that the maximum widths Wp and Wc of the pixel
electrode PX and the counter electrode CT are smaller than the gap L
between the pixel electrode PX and the counter electrode CT. The reason is
that when the gap between the electrodes is too small, the lines of
electric force are greatly curved whereby the area increases where the
electric field component perpendicular to the surface of the substrate
becomes greater than the electric field component in parallel with the
surface of the substrate, making it difficult to efficiently apply the
electric field component in parallel with the surface of the substrate to
the liquid crystal layer. Therefore, when the margin is 20%, the gap L
between the pixel electrode PX and the counter electrode CT must be
greater than 7.2 .mu.m.
The embodiments 1 and 2 have a resolution of 640.times.480 dots, a diagonal
of 10.4 inches, and a pixel pitch of 110 .mu.m. By dividing the pixels by
four, the gap L becomes greater than 7.2 .mu.m. That is, by dividing the
pixels by not more than eight, a gap L>7.2 .mu.m is satisfied. When the
pixels are divided by 10 or a larger number, however, the gap L becomes
smaller than 7 .mu.m, which does not satisfy the required condition.
Furthermore, the video signal line DL has a width of 8 .mu.m so that it
will not be broken, which is slightly larger than that of the pixel
electrode PX and the counter electrode CT. In order to prevent
short-circuiting, a gap of 1 .mu.m is formed between the video signal line
DL and the counter electrode CT. Here, the video signal line DL has a
width which is not larger than twice the width of the counter electrodes
CT that are located on both sides thereof. Or, when the width of the video
signal line DL is determined based on the production yield, the width of
the counter electrodes CT located on both sides of the video signal line
DL is determined to be not smaller than one-half the width of the video
signal line DL. The reason is that the lines of electric force generated
from the video signal line DL is absorbed by the counter electrodes CT on
both sides thereof. To absorb the lines of electric force generated from
the signal line having a given width, the lines that absorb the lines of
electric force must have a width which is not smaller than the width of
the line generating the lines of electric force.
Therefore, the lines of electric force generated from half (4 .mu.m each)
the width of the video signal line DL need to be absorbed by the counter
electrodes CT on both sides thereof, respectively. For this purpose, the
counter electrodes CT located on both sides of the video signal line DL
has a width of not smaller than one-half thereof. This makes it possible
to prevent crosstalk (particularly, crosstalk in the up-and-down
(vertical) direction) caused by video signals.
The gate signal line GL has a width that satisfies a resistance capable of
applying a sufficient gate voltage to the gate electrodes GT of pixels at
the terminals (on the side opposite to the gate electrode terminals GTM
that will be described later). Furthermore, the counter voltage signal
line CL has a width, i.e., has a resistance capable of applying a
sufficient counter voltage to the counter electrodes CT of pixels at the
terminals (on the side opposite to the common bus line CB that will be
described later).
On the other hand, the gap between the pixel electrode PX and the counter
electrode CT is changed according to the liquid crystal material that is
used. The reason is that the electric field intensity for accomplishing a
maximum transmission factor differs with the liquid crystal material.
Therefore, the gap between the electrodes is determined depending upon the
liquid crystal material, such that a maximum transmission factor is
obtained within a range of maximum amplitude of a signal voltage that is
determined depending upon the breakdown voltage of the video signal driver
unit (driver of the signal side) that is used. The gap between the
electrodes becomes 16 .mu.m when a liquid crystal material described later
will be used.
›Cross-sectional constitution of the matrix unit (pixel unit)!
FIG. 7 is a sectional view cut along the line 3--3 in FIG. 2, FIG. 8 is a
sectional view of a thin-film transistor element TFT cut along the line
4--4 in FIG. 2, and FIG. 9 is a sectional view of a storage capacitor Cstg
cut along the line 5--5 in FIG. 2. As shown in FIGS. 7 to 9, on the side
of the lower transparent glass substrate SUB1 are formed a thin-film
transistor TFT, a storage capacitor Cstg and a group of electrodes, and on
the side of the upper transparent glass substrate SUB2 are formed a color
filter FIL and a black matrix pattern BM for blocking light, with respect
to a liquid crystal layer LC.
Furthermore, orientation films ORI1 and ORI2 for controlling the initial
orientation of liquid crystals are provided on the inside surfaces (liquid
crystal LC side) of the transparent glass substrates SUB1 and SUB2, and
polarizer plates are provided with their polarizing axes intersecting at
right angles (cross-nicol arrangement) on the outside surfaces of the
transparent glass substrates SUB1 and SUB2.
›TFT substrate!
Constitution of the lower transparent glass substrate SUB1 (TFT substrate)
will now be described in detail.
›Thin-film transistor TFT!
The thin-film transistor TFT so operates that the channel resistance
decreases between the source and the drain when a positive bias is applied
to the gate electrode GT thereof, and that the channel resistance
increases when a zero bias is applied thereto.
Referring to FIG. 8, the thin-film transistor TFT includes the gate
electrode GT, a gate insulating film GI, an i-type semiconductor layer AS
made of i-type amorphous silicon (a-Si)(without doped with intrinsic
conductivity-type-determining impurities), a pair of source electrode SD1
and drain electrode SD2. The source and drain are usually determined by
the bias polarity therebetween. In the circuit of the liquid crystal
display device, the polarity is inverted during the operation. It should
therefore be noted that the source and drain are interchanged during the
operation. In the following description, however, either of them is
fixedly expressed as a source and the other as a drain only for
convenience of description.
›Gate electrode GT!
The gate electrode GT is continuous to the gate signal line GL, and is
formed by part of the region of the gate signal line GL. The gate
electrode GT is a portion which extends over the active region of the
thin-film transistor TFT, and is so formed as to completely cover the
i-type semiconductor layer AS (as viewed from below). Therefore, in
addition to its role, the gate electrode GT works to shield the i-type
semiconductor layer AS from external light or backlight. In this
embodiment, the gate electrode GT is composed of a single conductive film
g1. As the conductive film gl, there can be used an aluminum film formed
by, for example, sputtering and an anodically oxidized film AOF of
aluminum is formed thereon.
›Scanning (gate) signal line GL!
The scanning (gate) signal line GL is constituted by a conductive film gl.
The conductive film g1 forming the scanning signal line GL is formed
through the same step as that of forming the conductive film g1 of the
gate electrode GT and as a unitary structure. Through the scanning signal
line GL, the gate voltage Vg is fed to the gate electrode GT from an
external circuit. On the scanning signal line GL is formed an anodically
oxidized film AOF of aluminum, too. A portion that intersects the video
signal line DL is formed narrow to decrease the probability of
short-circuiting relative to the video signal line, and is branched into
two so that it can be separated by laser trimming in case it has
short-circuited.
›Counter electrode CT!
The counter electrode CT is constituted by the conductive film g1 of the
same layer as the gate electrode GT and the scanning signal line GL. On
the counter electrode CT is formed an anodically oxidized film AOF of
aluminum, too. The counter electrode CT is completely covered with the
anodically oxidized film AOF and prevents short-circuit even when it is
laid as close to the video signal line as possible. Moreover, they can be
so arranged as to intersect. A counter voltage Vcom is applied to the
counter electrode CT. In this embodiment, the counter voltage Vcom is set
to a potential which is lower than an intermediate potential between a
drive voltage Vdmin of a minimum level applied to the video signal line DL
and a drive voltage Vdmax of a maximum level by a field-through voltage
.DELTA.vs that generates when the thin-film transistor element TFT is
turned off. When it is necessary to nearly halve the power source voltage
of the integrated circuit used in the video signal driver unit, an AC
voltage should be applied.
›Counter voltage signal line CL!
The counter voltage signal line CL is constituted by a conductive film gl.
The conductive film g1 forming the counter voltage signal line CL is
formed through the same step as that of forming the conductive film g1 of
the gate electrode GT, scanning signal line GL and counter electrode CT,
and as a unitary structure. Through the counter voltage signal line CL,
the counter voltage Vcom is fed to the counter electrode CT from an
external circuit. On the counter voltage signal line CL is formed an
anodically oxidized film AOF of aluminum, too. A portion that intersects
the video signal line DL is formed narrow to decrease the probability of
short-circuiting relative to the video signal line like the case of the
scanning signal line GL, and is branched into two so that it can be
separated by laser trimming in case it has short-circuited.
›Insulating film GI!
The insulating film GI is used as a gate insulating film for imparting an
electric field to the gate electrode GT and to the semiconductor layer AS
in the thin-film transistor TFT. The gate insulating film GI is formed on
the gate electrode GT and on the scanning signal line GL. As the gate
insulating film GI, a silicon nitride film formed by, for example, plasma
CVD having a thickness of 1200 to 2700 .ANG. (about 2400 .ANG. in this
embodiment) is used. The gate insulating film GI is so formed as to
surround the whole matrix unit AR, and the periphery is removed so that
external connection terminals DTM, GTM are exposed. The insulating film GI
contributes to electrically insulating the scanning signal line GL,
counter voltage signal line CL and video signal line DL.
›i-Type semiconductor layer AS!
The i-type semiconductor layer AS is made of amorphous silicon and has a
thickness of from 200 to 2200 .ANG. (about 2000 .ANG. in this-embodiment).
A layer d0 is an N(+)-type amorphous silicon semiconductor layer doped
with phosphorus (P) for ohmic contact, and is left only on a portion where
the i-type semiconductor layer AS exists thereunder and conductive layers
d1 (d2) exist thereover.
The i-type semiconductor layer AS is also provided at the portions
(cross-over portion) where the scanning signal line GL, the counter
voltage signal line CL and the video signal line DL intersect. The i-type
semiconductor layer AS at the intersecting portion decreases the
probability of short-circuiting at the portions where the scanning signal
line GL, the counter voltage signal line CL and the video signal line DL
intersect.
›Source electrode SD1, drain electrode SD2!
The source electrode SD1 and the drain electrode SD2 are, respectively,
composed of the conductive film d1 that is in contact with the N(+)-type
semiconductor layer d0 and the conductive film d2 formed thereon.
The conductive film d1 is composed of a chromium (Cr) film formed by
sputtering and has a thickness of 500 to 1000 .ANG. (about 600 .ANG. in
this embodiment). The Cr film is so formed as to have a thickness of not
larger than about 2000 .ANG., since stress is produced as its thickness
increases. The Cr film is used in order to improve the adhesiveness to the
N(+)-type semiconductor layer d0 and to prevent aluminum conductive film
d2 from diffusing into the N(+)-type semiconductor layer d0 (i.e., used as
a so-called barrier layer). As the conductive film d1, there may be used a
film of a high-melting metal (Mo, Ti, Ta or W) and a film of a
high-melting metal silicide (MOSi.sub.2, TiSi.sub.2, TaSi.sub.2 or
WSi.sub.2) in addition to Cr film.
The conductive film d2 having a thickness of 3000 to 5000 .ANG. (about 4000
.ANG. in this embodiment) is formed by Al sputtering. The Al film causes
less stress than Cr film and can, hence, be so formed as to have a large
thickness, in order to decrease the resistances of the source electrode
SD1, drain electrode SD2 and video signal line DL, and to reliably extend
over the steps caused by the gate electrode GT and the i-type
semiconductor layer AS (to improve step coverage).
After the conductive films d1 and d2 are patterned using the same mask
pattern, the N(+)-type semiconductor layer d0 is removed by using the same
mask or by using the conductive films d1 and d2 as masks. That is, the
N(+)-type semiconductor layer d0 remaining on the i-type semiconductor
layer AS is removed in a self-alignment manner except the portions of the
conductive films d1 and d2. In this case, the N(+)-type semiconductor
layer d0 is removed by etching and, hence, the surface of the i-type
semiconductor layer AS is etched to some extent, which, however, can be
controlled by changing the etching time.
›Video signal line DL!
The video signal line DL is constituted by the first conductive film dl and
the second conductive film d2 of the same layers as the source electrode
SD1 and the drain electrode SD2. Moreover, the video signal line DL is
formed integrally with the drain electrode SD2.
›Pixel electrode PX!
The pixel electrode PX is constituted by the first conductive film d1 and
the second conductive film d2 of the same layers as the source electrode
SD1 and the drain electrode SD2. Moreover, the pixel electrode PX is
formed integrally with the source electrode SD1.
›Storage capacitor Cstg!
The pixel electrode PX is so formed as to be superposed on the counter
voltage signal line CL at an end on the side opposite to the end that is
connected to the thin-film transistor TFT. As will be obvious from FIG. 9,
this superposition constitutes a storage capacitor (capacitance element)
Cstg having the pixel electrode PX as one electrode PL2 and having the
counter voltage signal line CL as the other electrode PL1. The dielectric
film of this storage capacitor Cstg is composed of the insulating film GT
that is used as the gate insulating film of the thin-film transistor TFT
and the anodically oxidized film AOF.
As shown in FIG. 2, the storage capacitor Cstg is formed, when viewed from
above, on an expanded portion of the conductive film g1 of the counter
voltage signal line CL.
In this case, the electrode located under the insulative film GI of the
storage capacitor Cstg is made of aluminum having anodized surface.
Therefore, the storage capacitor hardly causes defect (short-circuiting to
the electrode of the upper side) that is caused by so-called whiskers of
aluminum.
›Protective film PSV1!
A protective film PSV1 is provided on the thin-film transistor TFT. The
protective film PSV1 is formed chiefly for protecting the thin-film
transistor TFT from moisture and the like and must have a high
transparency and a good resistance against humidity. The protective film
PSV1 is composed of, for example, a silicon oxide film or a silicon
nitride film formed by a plasma CVD device, and has a thickness of about 1
.mu.m.
The protective film PSV1 is so formed as to surround the whole matrix unit
AR, and its periphery is removed so that the external connection terminals
DTM and GTM are exposed. As for the thicknesses of the protective film
PSV1 and the gate insulative film GI, the former film is formed so as to
have a large thickness in consideration of the effect of protection and
the latter film is formed so as to have a small thickness in consideration
of the mutual conductance gm to the transistor. Therefore, the protective
film PSV1 that exhibits a high protection effect is formed in a size
larger than the gate insulative film GI in order to protect even the
peripheral portions as wide as possible.
›Color filter substrate!
Referring to FIGS. 2 and 7 again, the constitution of the upper transparent
glass substrate SUB2 (color filter substrate) will now be described in
detail.
›Light-shielding film BM!
On the upper transparent glass substrate SUB2 is formed a light-shielding
BM (so-called black matrix), so that undesired light transmitted through
the gaps (gaps other than the gap between the pixel electrode PX and the
counter electrode CT) does not go to the side of the display surface to
deteriorate the contrast and the like. The light-shielding film BM also
serves to prevent external light or backlight from falling on the i-type
semiconductor layer AS. That is, the i-type semiconductor layer AS of the
thin-film transistor TFT is sandwiched by the light-shielding film BM and
the gate electrode GT of a large size located on the upper and lower
sides, and so does not receive natural light or backlight from the
external side.
A polygonal contour line of the light-shielding film BM shown in FIG. 2
represents an opening inside which no light-shielding film BM is formed.
This is only an example of the contour line. The pattern may be the one
shown in FIG. 3 when it is desirable to form a large opening portion. In
the region A of FIG. 3, the direction of the electric field is disordered
and the display of this portion corresponds to the video data in the pixel
in such a 1-to-1 manner that the display is black when this portion is
black, and is white when this portion is white. Therefore, this portion
can be utilized as part of the display.
Furthermore, the boundary in the up-and-down direction of the drawing is
determined by the precision of registration of the upper and lower
substrates. When the precision registration is better than the width of
the counter electrodes CT located on both sides of the video signal line
DL, the opening portion can be widened by setting the boundary line within
the width of the counter electrode.
The light-shielding film BM has light-shielding property against light, and
is composed of a highly insulating film so as not to affect the electric
field between the pixel electrode PX and the counter electrode CT. This
enables the electric field component in parallel with the surface of the
substrate to be effectively applied to the liquid crystal layer, and makes
it possible to lower the voltage for driving liquid crystals. The
light-shielding film BM is made of a material obtained by mixing a black
pigment into a resist material, and has a thickness of about 1.2 .mu.m. As
another embodiment, there can be used a material obtained by mixing
palladium and electroless-plated nickel into the resist material.
In this case, the gap can be increased to some extent between the pixel
electrode PX and the counter electrode CT, making it possible to increase
the aperture ratio.
The light-shielding film BM is formed like a lattice surrounding the
pixels. The lattice partitions the effective display area of each pixel.
Therefore, the contour of each pixel is clearly shown by the
light-shielding film BM. That is, the light-shielding film BM has the two
functions, i.e., a black matrix and shielding against light that falls on
the i-type semiconductor layer AS.
The light-shielding film BM is formed like a frame even on the peripheral
portions, and has a pattern that is continuous to the pattern of the
matrix unit that has a plurality of dot-like openings. The light-shielding
film BM on the peripheral portions outwardly extends over the sealing
portion SL to prevent the leakage of light such as light reflected by a
device on which the display is mounted, such as a personal computer, from
entering the matrix unit. The light-shielding film BM is short of the
edges of the substrate SUB2 by about 0.3 to 1.0 mm, and does not extend to
the cut regions of the substrate SUB2.
›Color filter FIL!
The color filter FIL forms stripes of a repetition of red, green and blue
lines at positions facing the pixels. The color filter FIL is so formed as
to be superposed on the edge portions of the light-shielding film BM.
The color filter FIL is formed as described below. First, a dyeable member
such as acrylic resin is formed on the surface of the upper transparent
glass substrate SUB2, and is then removed by photolithographic technology,
leaving it on the red filter-forming regions. Then, the dyeable member is
dyed with a red dye and is fixed to form a red filter R. Next, a green
filter G and a blue filter B are formed successively through the same
steps.
›Overcoat film OC!
The overcoat film OC is provided to prevent the dye of the color filter FIL
from leaking to the liquid crystals LC and to flatten the steps produced
by the color filter FIL and light-shielding film BM. The overcoat film OC
is formed by using a transparent resin material such as acrylic resin,
epoxy resin or the like resins.
›Liquid crystal layer and polarizer plate!
The liquid crystal layer, orientation film and polarizer plate will be
described below.
›Liquid crystal layer!
As the liquid crystal materials LC, there are used nematic liquid crystals
having a positive dielectric constant anisotropy .DELTA..epsilon. of 13.2
and a refractive index anisotropy .DELTA.n of 0.081 (589 nm at 20.degree.
C.), and nematic liquid crystals having a negative dielectric constant
anisotropy .DELTA..epsilon. of -7.3 and a refractive index anisotropy
.DELTA.n of 0.053 (589 nm at 20.degree.). The liquid crystal layer has a
thickness (gap) of not smaller than 2.8 .mu.m but not larger than 4.5
.mu.m when it has a positive dielectric constant anisotropy
.DELTA..epsilon..
In this case, there is obtained a transmission factor that does not almost
change with the wavelengths within a range of visible light when the
retardation .DELTA.n.multidot.d is not smaller than 0.25 .mu.m but is not
larger than 0.32 .mu.m, and most of the liquid crystals having a positive
dielectric constant anisotropy .DELTA..epsilon. have a birefringence
anisotropy An which is not smaller than 0.07 but is not larger than 0.09.
On the other hand, the liquid crystal layer has a thickness (gap) which is
not smaller than 4.2 .mu.m but is not larger than 8.0 .mu.m when it has a
negative dielectric constant anisotropy .DELTA..epsilon.. The reason is
that it is necessary to determine the retardation .DELTA.n.multidot.d
within a range of not smaller than 0.25 .mu.m but not larger than 0.32
.mu.m, like the case of the liquid crystals having a positive dielectric
constant anisotropy .DELTA..epsilon.. In this case, most of the liquid
crystals having a negative dielectric constant anisotropy .DELTA..epsilon.
have a birefringence anisotropy .DELTA.n of not smaller than 0.04 but not
larger than 0.06.
A combination of the orientation films and the polarizer plates that will
be described later makes it possible to obtain a maximum transmission
factor when the liquid crystal molecules are turned by about 45.degree.
toward the direction of the electric field EDR from the rubbing direction
RDR.
The thickness (gap) of the liquid crystal layer is controlled by using
polymer beads.
There is no particular limitation on the liquid crystal material LC so long
as it is a nematic liquid crystal material. The drive voltage can be
decreased with an increase in the value of the dielectric constant
anisotropy .DELTA..epsilon.. The thickness (gap) of the liquid crystal
layer can be increased with a decrease in the refractive index anisotropy
.DELTA.n, in order to shorten the time to pour the liquid crystals and to
decrease variation in the gap.
›Orientation film!
The orientation film ORI is made of a polyimide. The upper and lower
substrates have rubbing directions RDR which are in parallel with each
other and form an angle of 75.degree. with respect to the direction of the
applied electric field EDR. FIG. 18 illustrates their relationships.
The angle formed by the rubbing direction RDR and the direction of the
applied electric field EDR may be larger than 45.degree. but is smaller
than 90.degree. when the liquid crystal material has a positive dielectric
constant anisotropy .DELTA..epsilon., and may be larger than 0.degree. but
smaller than 45.degree. when the liquid crystal material has a negative
dielectric constant anisotropy .DELTA..epsilon..
›Polarizer plate!
FIG. 18 illustrates the relationships of the direction of the applied
electric field, rubbing direction and transmission axes of the polarizer
plates.
The polarizer plates POL that are used are G1220DU manufactured by Nitto
Denko Co. The transmission axis MAX1 of the lower polarizer plate POL1 is
appproximately parallel with the rubbing direction RDR, and intersect the
transmission axis MAX2 of the upper polarizer plate POL2 at approximate
right angles. FIG. 18 illustrates their relationships.
There are thus obtained normally-closed characteristics such that the
transmission factor increases with an increase in the voltage (between the
pixel electrode PX and the counter electrode CT) applied to the pixels.
›Constitution of the peripheries of the matrix!
FIG. 10 is a plan view illustrating essential portions of the peripheries
of the matrix (AR) of a display panel PNL that includes the upper and
lower glass substrates SUB1 and SUB2. FIG. 11 is a sectional view
illustrating on the left side the external connection terminal GTM to be
connected to the scanning circuit and its vicinity, and illustrating on
the right side the sealing portion where there is no external connection
terminal and its vicinity.
When the panel that is to be produced is of a small size, a plurality of
devices are fabricated on a sheet of glass, and are divided in order to
improve the throughput. When the panel is of a large size, a glass plate
of standard size for common use of the production facility is worked and
divided into a size that may meet the type. In either case, the glass is
cut after having been processed through predetermined steps. FIGS. 10 and
11 illustrate the latter example, and illustrate the upper and lower
substrates SUB1 and SUB2 after they have been cut, wherein LN represents
edges of the two substrates before being cut. In the finished state in
either case, the upper substrate SUB2 is smaller than the lower substrate
SUB1, so that the portions where there exist external connection terminal
groups Tg, Td and terminal CTM (upper side and left side in the drawings)
are exposed. The terminal groups Tg, Td are named for pluralities of
terminals GTM for connection to the scanning circuit, terminals DTM for
connection to the video signal circuit, and lead-out wirings thereof in
units of tape carrier package TCP (6, 7) on which the integrated circuit
chip CHI is mounted. The lead-out wirings from the matrix unit of each
group to the external connection terminal unit are slanted toward both
sides. The reason is that the terminals DTM, GTM of the display panel PNL
are in agreement with the pitch of arrangement of the packages TCP and the
pitch of connection terminals in the packages TCP. The counter electrode
terminal CTM is for applying a counter voltage to the counter electrode CT
from the external circuit. The counter electrode signal lines CL of the
matrix unit are led out to the opposite side (right side of the drawing)
of the terminal GTM for the scanning circuit, and the counter voltage
signal lines are collected together through the common bus line CB and are
connected to the counter electrode terminals CTM.
Between the transparent glass substrates SUB1 and SUB2 is formed a sealing
pattern SL except a liquid crystal filling port INJ in order to pour the
liquid crystals LC. The sealing material is, for example, an epoxy resin.
The orientation films ORIL and ORI2 are formed on the inside of the sealing
pattern SL. The polarizer plates POL1 and POL2 are formed on the outer
surfaces of the lower transparent glass substrate SUB1 and the upper
transparent glass substrate SUB2. The liquid crystals LC are sealed in the
regions partitioned by the sealing pattern SL between the lower
orientation film ORI1 and the upper orientation film ORI2 that determine
the orientation of the liquid crystal molecules. The lower orientation
film ORI1 is formed on the protective film PSV1 on the side of the lower
transparent glass substrate SUB1.
In the liquid crystal display device, various layers are stacked separately
on the lower transparent glass substrate SUB1 and on the upper transparent
glass substrate SUB2, the sealing pattern SL is formed on the substrate
SUB2, the lower transparent glass substrate SUB1 and the upper transparent
glass substrate SUB2 are superposed one upon the other, the liquid
crystals LC are poured through the opening INJ formed in the sealing
member SL, and the filling port INJ is sealed with an epoxy resin or the
like resin. The upper and lower substrates are then cut to obtain the
liquid crystal display device.
›Gate terminal unit!
FIGS. 12A and 12B are views illustrating the connection structure from the
scanning signal lines GL of the display matrix to the external connection
terminals GTM thereof, wherein FIG. 12A is a plan view and FIG. 12B is a
sectional view cut along the line B--B in FIG. 12A. A slant wiring is
represented by a straight line only for convenience of illustration.
Symbol AO denotes the boundary line of the direct photoresist drawing or,
in other words, a photoresist pattern of selective anodic oxidation.
Therefore, the photoresist is removed after the anodic oxidation and the
pattern AO that is shown does not remain in the finished product. As shown
in the sectional view, however, the oxide film AOF is selectively formed
on the gate wiring GL, and its trace remains. In the plan view, the left
side with respect to the boundary line AO of photoresist is covered with a
resist so as not to undergo anodic oxidation, and the right side is not
covered with the resist and undergoes the anodic oxidation. The anodically
oxidized Al layer g1 has an oxide Al.sub.2 O.sub.3 film AOF formed on the
surface thereof, and the conductive portion of the lower side thereof has
a decreased volume. The anodic oxidation is carried out by determining a
suitable period of time and a voltage so that the conductive portion may
remain.
In the drawing, the aluminum layer g1 is hatched for easy comprehension but
the region that is not anodically oxidized is patterned like comb teeth.
The reason is that whiskers develop on the surface when the aluminum layer
has a large width. Therefore, each line pattern is formed narrow, and a
plurality of line patterns are bundled in parallel to minimize the
probability of breakage and the decrease of electric conductivity while
preventing the development of whiskers.
The gate terminal GTM comprises the aluminum layer g1 and a transparent
conductive layer g2 that protects the surface thereof and improves the
reliability of connection to the TCP (tape carrier package). The
transparent conductive film g2 is a film (indium-tin-oxide ITO: Nesa film)
formed by sputtering and has a thickness of 1000 to 2000 .ANG. (about 1400
.ANG. in this embodiment). The conductive layers d1 and d2 formed on the
aluminum layer g1 and on the side surfaces thereof, connect a chromium
layer d1 to both the aluminum layer and the transparent conductive layer
g2 in order to compensate poor connection between the aluminum layer and
the transparent conductive layer g2 and to decrease the connection
resistance. The conductive layer d2 remains since it is formed using the
same mask as the one for forming the conductive layer d1.
In the plan view, the gate insulative film GI is formed on the right side
of the boundary line, the protective film PSV1 is formed on the right side
of the boundary line, and the terminal unit GTM located at the left end is
exposed so that it can be in ohmic contact with an external circuit. The
drawing illustrates only a pair of gate line GL and gate terminal. In
practice, however, pairs are arranged on the upper and lower sides as
shown in FIGS. 12A and 12B, constituting a terminal group Tg (FIG. 10). In
the production process, the left end of the gate terminal extends beyond
the region for cutting the substrates and is short-circuited by the wiring
SHg (not shown). In the production process, this short-circuiting line SHg
serves to feed electric power during the anodic oxidation and to prevent
the electrostatic breakdown at the time of rubbing the orientation film
ORI1.
›Drain terminal DTM!
FIGS. 13A and 13B are views illustrating the connection of the video signal
line DL to the external connection terminal DTM, wherein FIG. 13A is a
plan view and FIG. 13B is a sectional view cut along the line B--B in FIG.
13A. These drawings correspond to the upper portion of FIG. 19. Since the
directions of the drawings are changed for convenience, the direction of
left end corresponds to the upper end of the substrate SUB1.
Symbol TSTd denotes a check terminal to which no external circuit is
connected but which is broadened to be wider than the wiring so that it
can be touched by a probe needle or the like. Similarly, the drain
terminal DTM is broadened to be wider than the wiring so that it can be
connected to an external circuit. The drain terminals DTM for connection
to external circuit are arranged in the up-and-down direction, constitute
a terminal group Td (subscript is omitted) as shown in FIG. 10, extend
beyond the cutting line of the substrate SUB1, and are all short-circuited
by a wiring SHd (not shown) to prevent the electrostatic breakdown during
the production process. The check terminal TSTd is formed on every other
video signal lines DL as shown in FIGS. 13A and 13B.
The drain connection terminal DTM is formed by a single transparent
conductive layer g2 and is connected to the video signal line DL at a
portion where the gate insulative film GI is removed. The semiconductor
layer AS formed on the end of the gate insulative film GI serves to etch
the edge of the gate insulative film GI in a tapered form. On the terminal
DTM, the protective film PSV has been removed as a matter of course so
that connection to the external circuit can be made.
The lead-out wiring from the matrix unit to the drain terminal DTM has
layers d1, d2 of the same level as that of the video signal line DL, that
are constituted in the protective film PSV and are connected to the
transparent conductive film g2 in the protective film PSV. The reason is
that it is necessary to protect the aluminum layer d2 that easily undergo
electrolytic corrosion, as much as possible using the protective film PSV
and the sealing pattern SL.
›Counter electrode terminal CTM!
FIGS. 14A and 14B are views illustrating the connection from the counter
electrode signal line CL to the external connection terminal CTM, wherein
FIG. 14A is a plan view and FIG. 14B is a sectional view cut along the
line B--B of FIG. 14A. These drawings correspond to the left upper portion
of FIG. 19.
The counter voltage signal lines CL are collected together by the common
bus line CB and are led out to the counter electrode terminals CTM. The
common bus line CB has a structure in which the conductive layer d1 and
the conductive layer d2 are formed on the conductive layer g1. The reason
is that the resistance of the common bus line CB is decreased so that the
counter voltage is sufficiently fed to the counter voltage signal lines CL
from the external circuit.
Accordingly, the counter voltage is sufficiently transmitted even to the
terminal pixels, making it possible to reduce the occurrence of crosstalk
(particularly, crosstalk in the right-and-left direction on the screen)
caused by distortion of the voltage of the counter electrodes CT in
response to the video signals fed to the video signal lines DL. This
structure has a feature that the resistance of the common bus line is
decreased without additionally providing conductive layers. The conductive
layer g1 of the common bus line CB is not anodized so that it can be
electrically connected to the conductive layer d1 and to the conductive
layer d2. Besides, the conductive layer g1 is exposed through the gate
insulative film GI.
The counter electrode terminal CTM has a structure in which the transparent
conductive layer g2 is formed on the conductive layer g1. The surface is
protected by the transparent conductive layer g2, and the conductive layer
g1 is covered with the transparent conductive layer g2 having a good
durability in order to prevent electrolytic corrosion.
In the above-mentioned embodiment, the conductive layer dl and the
conductive layer d2 are formed on the common bus line CB. The invention,
however, is in no way limited to these conductive layers only. Even in
this case, it is possible to decrease the resistance of the common bus
line CB.
›Method of fabrication!
A method of fabricating the substrate SUB1 of the above-mentioned liquid
crystal display device will now be described with reference to FIGS. 15 to
17. In these drawings, characters at the center represent abbreviations of
the names of the steps, wherein the left side represents the portion of
the thin-film transistor shown in FIG. 8, and the right side illustrates
the flow of process near the gate terminal shown in cross sections of
FIGS. 12A and 12B. Except steps B and D, steps A to I are divided
according to the photographic treatment. The sectional view of each step
represents a stage after the photographic treatment is finished and the
photoresist is removed. The photographic treatment in this embodiment
means a series of operations from the application of the photoresist to
the developing thereof through selective exposure by using a mask. The
treatment will now be described for each of the sectionalized steps.
Step A, FIG. 15
A conductive film g1 made of Al1'Pd, Al--Si, Al--Ta, Al--Ti--Ta or the like
having a thickness of 3000 .ANG. is formed by sputtering on the lower
transparent glass substrate SUB1 made of the AN635 glass (trade name).
After the photographic treatment, the conductive film g1 is selectively
etched by using a mixed acid solution of phosphoric acid, nitric acid and
glacial acetic acid. There are thus formed gate electrodes GT, scanning
signal lines GL, counter electrodes CT, counter voltage signal lines CL,
electrodes PL1, gate terminals GTM, a first conductive layer of common bus
line CB, a first conductive layer of counter electrode terminals CTM, an
anodically oxidized bus line SHg (not shown) for connecting the gate
terminals GTM, and anodically oxidized pads (not shown) connected to the
anodically oxidized bus line SHg.
Step B, FIG. 15
After the anodically oxidized mask AO is formed by direct drawing, the
substrate SUB1 is dipped in an anodically oxidizing solution which is
obtained by diluting a solution containing 3% of tartaric acid of which
the pH value is adjusted with ammonia to 6.25.+-.0.05, with an ethylene
glycol solution into 1:9, and the anodizing current density is adjusted to
0.5 mA/cm.sup.2 (constant-current anodization). The anodic oxidation is
carried out until an anodizing voltage of 125 V is reached, which is
necessary for obtaining an Al.sub.2 O.sub.3 film having a predetermined
thickness. Desirably, this state is then held for several tens of minutes
(constant-voltage anodization). This is important in view of forming a
uniform Al.sub.2 O.sub.3 film. Thus, the conductive film g1 is anodically
oxidized, and anodically oxidized film AOF having a thickness of 1800
.ANG. is formed on the gate electrodes GT, scanning signal lines GL,
counter electrodes CT, counter voltage signal lines CL and electrodes PL1.
Step C, FIG. 15
The transparent conductive film g2 of the ITO film having a thickness of
1400 .ANG. is formed by sputtering. After the photographic treatment, the
transparent conductive film g2 is etched with a mixed acid solution of
hydrochloric acid and nitric acid as an etching solution, in order to form
the uppermost layer of the gate terminal GTM, and second conductive layers
of the drain terminal DTM and the counter electrode terminal CTM.
Step D, FIG. 16
Ammonia gas, silane gas and nitrogen gas are introduced into a plasma CVD
apparatus to form a silicon nitride film having a thickness of 2200 .ANG..
Then, silane gas and hydrogen gas are introduced into the plasma CVD
apparatus to form an i-type amorphous silicon film having a thickness of
2000 .ANG.. Thereafter, hydrogen gas and phosphine gas are introduced into
the plasma CVD apparatus to form an N(+)-type amorphous silicon film
having a thickness of 300 .ANG..
Step E, FIG. 16
After the photographic treatment, the N(+)-type amorphous silicon film and
i-type amorphous silicon film are selectively etched by using SF.sub.6 and
CCl.sub.4 as dry etching gases, in order to form islands of the i-type
semiconductor layer AS.
Step F, FIG. 16
After the photographic treatment, the silicon nitride film is selectively
etched by using SF.sub.6 as a dry etching gas.
Step G, FIG. 17
The conductive film dl made of chromium and having a thickness of 600 .ANG.
is formed by sputtering, and the conductive film d2 made of Al--Pd,
Al--Si, Al--Ta, Al--Ti--Ta or the like having a thickness of 4000 .ANG. is
formed by sputtering. After the photographic treatment, the conductive
film d2 is etched using the same solution as the one used in step A and
the conductive film d1 is etched using a ceric ammonium nitrate solution,
in order to form video signal lines DL, source electrodes SD1, drain
electrodes SD2, pixel electrodes PX, electrodes PL2, second and third
conductive layers of common bus line CB, and bus line SHd (not shown) for
short-circuiting the drain terminals DTM. Next, CCl.sub.4 and SF.sub.6
gases are introduced into the dry etching device in order to etch the
N(+)-type amorphous silicon film and, hence, to selectively remove the
N(+)-type semiconductor layer d0 between the source and the drain.
Step H, FIG. 17
Ammonia gas, silane gas and nitrogen gas are introduced into the plasma CVD
apparatus to provide a silicon nitride film having a thickness of 1 .mu.m.
After the photographic treatment, the silicon nitride film is selectively
etched by a photoengraving technology by using SF.sub.6 as a dry etching
gas, in order to form the protective film PSV.
›Equivalent circuit of the whole display device!
FIG. 19 is a diagram of connection of an equivalent circuit of the display
matrix unit and of the peripheral circuits thereof. This circuit diagram
is so drawn as to correspond to the practical geometrical arrangement,
wherein AR denotes a matrix array in which a plurality of pixels are
arranged in a two-dimensional configuration.
In the drawing, symbol X represents video signal lines DL, and subscripts
G, B and R are added to green, blue and red pixels, respectively. Symbol Y
denotes scanning signal lines GL, and subscripts 1, 2, 3, ------, end are
added in the order of scanning timings.
The scanning signal lines Y (subscript is omitted) are connected to a
vertical scanning circuit V, and the video signal lines X (subscript is
omitted) are connected to a video signal driver unit H.
SUP denotes a circuit inclusive of a power-source circuit for producing a
plurality of voltages that are produced by dividing the voltage of a
voltage source and stabilized, and a circuit for converting the
information for CRT (cathode-ray tube) from a host (higher order
arithmetic unit) into information for TFT liquid crystal display device.
›Driving method!
FIG. 20 illustrates waveforms for driving the liquid crystal display device
of the present invention. The counter voltage has an AC rectangular
waveform and has two values, i.e., Vch and Vcl. In synchronism therewith,
the non-selection voltage of the scanning signals Vg(i-1) and Vg(i) is
changed into two values, i.e., Vg1h and Vg11 for every scanning period.
The amplitude of the counter voltage is set to be equal to the amplitude
of the non-selection voltage. The video signal voltage has a value which
is the remainder obtained by subtracting one-half the amplitude of the
counter voltage from a voltage that is to be applied to the liquid crystal
layer.
The counter voltage may be a DC voltage. By employing an AC voltage,
however, it is possible to lower the maximum amplitude of the video signal
voltage and, hence, to employ a video signal driver unit (signal side
driver) having a decreased breakdown voltage.
›operation of storage capacitor Cstg!
The storage capacitor Cstg is provided in order to store video data written
into a pixel (after the thin-film transistor TFT is turned off) for a
extended period of time. According to the system in which the electric
field is applied in parallel with the surface of the substrate employed by
the present invention unlike the system in which the electric field is
applied vertically to the surface of the substrate, there exists almost no
capacitance (so-called liquid crystal capacitance) that is created by the
pixel electrode and the counter electrode. Namely, the liquid crystal
capacitance is incapable of storing video data in the pixel. In the system
in which the electric field is applied in parallel with the surface of the
substrate, therefore, the storage capacitor Cstg is an essential
constituent element.
When the thin-film transistor TFT undergoes the switching operation,
furthermore, the storage capacitor Cstg serves to lower the effect of a
change .DELTA.Vg in the gate potential upon the pixel electrode potential
Vs. This is expressed by the following formula,
.DELTA.Vs={Cgs/(Cgs+Cstg+Cpix)}.times..DELTA.Vg
where Cgs is the parasitic capacitance formed between the gate electrode GT
and the source electrode SD1 of the thin-film transistor, Cpix is the
capacitance formed between the pixel electrode PX and the counter
electrode CT, and .DELTA.Vs is the change in the pixel electrode potential
caused by .DELTA.vg, i.e., is the feedthrough voltage. This change
.DELTA.vs is a cause of the DC component applied to the liquid crystal LC,
but can be decreased with an increase in the storage capacity Cstg. A
decrease in the DC component applied to the liquid crystals LC leads to a
long life of the liquid crystals LC and reduces the so-called printing
image in which the preceding picture remains when the picture on the
liquid crystal display screen is changed.
As described earlier, since the size of the gate electrode GT is increased
so as to completely cover the i-type semiconductor layer AS, the area
where the gate electrode GT and the source electrode SD1 overlap one upon
the other is accordingly increased and, hence, the parasitic capacitance
Cgs is increased, giving an adverse effect that the pixel electrode
potential Vs is easily affected by the gate (scanning) signal Vg. However,
the provision of the storage capacitor Cstg eliminates this demerit.
›Method of connecting counter voltage signal lines CL to common bus line CB
!
FIG. 27 is a block diagram schematically illustrating the constitution of
the liquid crystal display device of a third embodiment according to the
present invention.
The liquid crystal display device of this embodiment is composed of a
matrix substrate SUB1 in which the pixels 120 are arranged in the form of
a matrix, a counter substrate SUB2, a timing controller 100, a drain
driver unit 102, a gate driver unit 104, a common voltage generator and
driver unit 103, and liquid crystals (not shown) sealed between the matrix
substrate SUB1 and the counter substrate SUB2.
On the matrix substrate SUB1 are arranged the video signal lines DL for
feeding a drive voltage necessary for driving the pixels 120 and the
scanning signal lines GL. The video signal lines DL and the scanning
signal lines GL are perpendicular to each other and surround the pixels
120, the video signal lines DL being connected to the drain driver unit
102 and the scanning signal lines GL being connected to the gate driver
unit 104.
The counter voltage signal lines CL connected to the counter electrodes CT
in the pixels 120 are arranged in parallel with the scanning signal lines
GL. The counter voltage signal lines CL are further connected at their
both ends to the common voltage generator and driver unit 103 via the
common bus line CB.
The gate driver unit 104 and the drain driver unit 102 are connected to the
timing controller 100. The timing controller 100 receives video signals
and timing signals from the external host 101, and the drain driver unit
102 generates a drive voltage corresponding to the video signal and feeds
it to the video signal lines DL in response to a timing signal.
The gate driver unit 104 receives timing signals fed from the timing
controller 100, generates a gate drive voltage corresponding to the video
signal, and feeds it to the scanning signal lines GL in response to a
timing signal.
As a result, the drain voltage corresponding to the video signal is
successively applied to the pixels 120 in the matrix substrate SUB1.
In this embodiment, the counter voltage signal lines CL are connected at
their both ends to the common bus line CB. Here, the common bus line CB is
formed on the non-display region of the matrix substrate and is allowed to
have an increased width. Therefore, the resistance of the common bus line
CB can be set to be smaller than the resistance of the counter voltage
signal lines CL.
FIG. 28 is a diagram illustrating an equivalent circuit of a passage for
transmitting the drive voltage applied to the counter electrodes CT in the
liquid crystal display device of this embodiment, and FIG. 29 is a diagram
showing waveforms of the drive voltage at the respective points of FIG.
28.
Since the resistance 59 of the common bus line CB is smaller than the
resistance 58 of the counter voltage signal lines CL, the waveforms of the
drive voltage fed from the common voltage driver unit 60 to the points D,
E, F and G in FIG. 28 become a counter voltage 62 at point D, a counter
voltage 63 at point E, a counter voltage 64 at point F and a counter
voltage 65 at point G, respectively, as shown in FIG. 29.
As will be understood from FIG. 29, this embodiment makes it possible to
reduce distortion in the waveform of the drive voltage fed to the counter
electrodes CT from the common voltage driver unit 60 of the common voltage
generator driver unit 103.
Therefore, the intensity of the electric field between the pixel electrode
PX and the counter electrode CT becomes nearly uniform in the pixels 120,
making it possible to decrease variation in the brightness along the
counter voltage signal lines CL.
Even when the counter voltage signal line CL is broken at a portion, the
drive voltage is supplied to the counter electrode CT from both ends of
the counter voltage signal line CL, preventing the display quality from
being impaired, unlike the prior art, when the drive voltage is no longer
supplied to the counter electrode CT of the pixels 120 after the broken
portion and when the liquid crystals are no longer driven.
FIG. 30A is a plan view illustrating the connection of the counter voltage
signal line CL and the common bus line CB at point A on the matrix
substrate of FIG. 27. FIG. 30B is a sectional view cut along the line
I--I' in FIG. 30A, and FIG. 30C is a sectional view cut along the line
H--H' in FIG. 30A.
At point A shown in FIG. 27, the scanning signal line GL and the counter
voltage signal line CL are formed on the matrix substrate by using
aluminum layer gl and are anodically oxidized so as to form aluminum oxide
AOF on the signal lines. By using a resist in this case, it is intended
not to form aluminum oxide AOF at the ends of the counter voltage signal
lines CL. Next, a gate oxide film GI is formed. At this moment, a contact
hole CHL is formed in the ends of the counter voltage signal lines CL.
Then, by using a chromium layer dl and an aluminum layer d2, the video
signal line DL and the common bus line CB are formed simultaneously. The
common bus line CB is formed even on the ends of the counter voltage
signal lines CL, and the common bus line CB and the counter voltage signal
lines CL are electrically connected together through contact holes CHL at
the ends of the counter voltage signal lines CL. Finally, the protective
film PSV is formed followed by a surface treatment.
FIGS. 31A is a plan view illustrating the connection of the counter voltage
signal lines CL and the common bus line CB at point B on the matrix
substrate of FIG. 27, and FIG. 31B is a sectional view cut along the line
J-J' of FIG. 31A.
The scanning signal lines GL, counter voltage signal lines CL and common
bus line CB are simultaneously formed on the matrix substrate by using
aluminum g1, and are anodically oxidized to form aluminum oxide AOF on the
signal lines. Furthermore, a gate oxide film GI is formed thereon. By
using a resist in this case, it is intended not to form aluminum oxide AOF
and gate oxide film GI at the ends of the counter voltage signal lines CL
and on the common bus line CB. Next, the video signal lines DL are formed
by using two layers, i.e., chromium layer d1 and aluminum layer d2. At the
same time, the chromium layer dl and the aluminum layer d2 are formed even
on the common bus line CB. Thus, the common bus line CB is constituted by
the aluminum layer g1, chromium layer dl and aluminum layer d2 and
possesses a small resistance. Finally, the protective film PSV is formed
followed by a surface treatment.
FIG. 32A is a plan view illustrating the intersection of the video signal
lines DL and the common bus line CB at point C on the matrix substrate 8
of FIG. 27, and FIG. 32B is a sectional view cut along the line K--K' in
FIG. 32A. The scanning signal lines GL and the counter voltage signal
lines CL are formed on the matrix substrate by using aluminum layer g1,
and are anodically oxidized to form aluminum oxide AOF on the signal
lines.
Then, the gate oxide film GI is formed, and the video signal lines DL are
formed by using two layers, i.e., chromium layer d1 and aluminum layer d2.
Finally, the protective film PSV is formed followed by a surface
treatment.
In FIGS. 30A to 30C, the connection portions (contact holes CHL) between
the counter voltage signal lines CL and the common bus line CB are formed
in the regions between the common bus line CB and the video signal lines
DL. Not limited only thereto, however, the contact holes CHL may be formed
in the regions on the side opposite to the video signal lines DL with
respect to the common bus line CB as shown in FIGS. 33A to 33C.
FIGS. 33A is a plan view of another example of connection of the counter
voltage signal lines CL and the common bus line CB at point A on the
matrix substrate of FIG. 27, FIG. 33B is a sectional view cut along the
line Q-Q' in FIG. 33A, and FIG. 33C is a sectional view cut along the line
R-R' in FIG. 33A.
At point A shown in FIG. 27, the scanning signal lines GL and the counter
voltage signal lines CL are formed on the matrix substrate using the
aluminum layer g1, and are anodically oxidized to form aluminum oxide AOF
on the signal lines. By using a resist in this case, it is intended not to
form the aluminum oxide AOF at the ends of the counter voltage signal
lines CL. Next, the gate oxide film GI is formed. At this moment, contact
holes CHL are formed in the ends of the counter voltage signal lines CL.
Next, the video signal lines DL and the common bus line CB are
simultaneously formed by using two layers, i.e., chromium layer d1 and
aluminum layer d2.
The common bus line CB is formed even on the ends of the counter voltage
signal lines CL, and the common bus line CB and the counter voltage signal
lines CL are electrically connected together through the contact holes CHL
formed in the ends of the counter voltage signal lines CL. Finally, the
protective film PSV is formed followed by a surface treatment.
In the embodiment shown in FIGS. 33A to 33C, the aluminum oxide AOF is
formed on the portions where the counter voltage signal lines CL intersect
the common bus line CB.
In general, furthermore, the aluminum oxide AOF is formed even on the
scanning signal lines GL and, hence, it is necessary to form a contact
hole CHL even in the portions where the scanning signal lines GL are
connected to the gate driver unit 104.
By using a resist, furthermore, it is intended not to form the aluminum
oxide AOF on the portions where the contact holes CHL are to be formed.
In the embodiment shown in FIGS. 30A to 30C, in this case, it is necessary
to precisely form the resist for forming contact holes CHL through which
the counter voltage signal lines CL and the common bus line CB are
connected together.
In the embodiment of FIG. 33, however, a resist is formed on the periphery
on the matrix substrate on the side opposite to the video signal lines DL
with respect to the common bus line CB, in order to form contact holes CHL
for connecting the counter voltage signal lines CL to the common bus line
CB and contact holes CHL for connecting the scanning signal lines GL to
the gate driver unit 104. Besides, when the resist is directly drawn, the
precision can be made loose.
As described above, the common bus line CB is formed along the edge of the
panel using the same materials and through the same production steps as
those of the scanning signal lines GL and the video signal lines DL. The
common bus line CB is further connected to both ends of the counter
voltage signal lines CL.
FIGS. 34 and 35 are diagrams illustrating further arrangements of the
common bus line CB of the embodiment.
The common bus line CB need not be extended along all of the edges of the
panel that is shown in FIG. 27. As shown in FIG. 34, the common bus line
CB may be extended avoiding the region where the video signal lines DL are
connected to the drain driver unit 102.
This makes it possible to decrease parasitic capacitance produced at
portions where the video signal lines DL intersect the common bus line CB.
As shown in FIG. 35, furthermore, the common bus line CB may be divided
into a plurality of common bus lines CBA, CBB which are extended from the
panel and are connected together in the driver unit provided in the
periphery. This makes it possible to decrease the length of the common bus
line CB inside the panel.
›Thickness adjustment film AD!
A liquid crystal display device of a fourth embodiment which uses a
thickness adjustment film AD as a constituent element will be described
below.
FIG. 36A is a plan view of a portion where the counter voltage signal line
CL at a point corresponding to point A on the matrix substrate of FIG. 27
is connected to the common bus line CB in the liquid crystal display
device of embodiment 3. FIG. 36B is a sectional view cut along the line
M-M' in FIG. 36A, and FIG. 36C is a sectional view cut along the line N-N'
in FIG. 36A.
At a point corresponding to point A of FIG. 27, as shown in FIG. 36A, the
scanning signal lines GL and the counter voltage signal lines CL are
formed on the matrix substrate using the aluminum layer gl and, at the
same time, a thickness adjustment film AD is formed. The thickness
adjustment film AD is formed in the form of islands at least among the
scanning signal lines GL, but are not electrically connected to the
scanning signal lines GL. Then, by using the same material as that of the
video signal lines DL, the common bus line CB is formed to pass at least
over the thickness adjustment film AD.
FIGS. 37A is a plan view illustrating the connection of the counter voltage
signal lines CL and the common bus line CB at a point corresponding to
point B on the matrix substrate of FIG. 27 in the liquid crystal display
device of embodiment 4. FIG. 37B is a sectional view cut along the line
O-O' in FIG. 37A. At a point corresponding to point B of FIG. 27, as shown
in FIG. 37A, the scanning signal lines GL, counter voltage signal lines CL
and common bus line CB are simultaneously formed on the matrix substrate
by using the aluminum layer g1 and, then, the video signal lines DL and
thickness adjustment film AD are formed via the gate oxide film AOF. The
thickness adjustment film AD is formed on the common bus line CB.
FIGS. 38A is a plan view illustrating the intersection of the video signal
line DL and the common bus line CB at a point corresponding to point C of
the matrix substrate of FIG. 27 in the liquid crystal display device of
embodiment 4. FIG. 38B is a sectional view cut along the line P-P' in FIG.
38A. At a point corresponding to point C of FIG. 27, as shown in FIG. 38A,
the scanning signal lines GL and counter voltage signal lines CL are
formed on the matrix substrate by using the aluminum layer g1, and the
video signal lines DL and thickness adjustment film AD are formed on the
gate oxide film GI.
The thickness adjustment film AD is formed in the form of islands at least
among the video signal lines DL but are not electrically connected to the
video signal lines DL. The thickness adjustment film AD is also formed on
the common bus line CB. With the thickness adjustment film AD inserted,
the portion where the common bus line CB is formed possesses the same
sectional structure and the same thickness. This makes it possible to
uniformalize the thickness of the common bus line CB formed along the edge
of the substrate, to decrease variation in the thickness of the edges of
the substrate, to maintain constant the gap length between the two
substrates and, hence, to decrease variation in the gap length of the
liquid crystal display device.
FIG. 39 is a diagram illustrating another arrangement of the common bus of
embodiment 4.
In forming the common bus line CB along the edges of the panel, dummy
signal lines DMY may be formed using the same material and maintaining the
same thickness as those of the common bus line CB in the regions where no
common bus line CB is arranged, as shown in FIG. 39, in order to decrease
variation in the thickness along the edges of the panel.
›Display panel PNL and drive circuit substrate PCB1!
FIG. 21 is a top view illustrating a state where a video signal (drain)
driver unit H and a vertical scanning (gate driver) unit V are connected
to the display panel PNL shown in FIG. 10.
Symbol CHI denotes driver IC chips (the lower five are driver IC chips on
the side of the vertical scanning circuit, and the left ten are driver IC
chips on the side of the video signal driver circuit) for driving the
display panel PNL. Symbol TCP denotes tape carrier packages in which
driver IC chips are mounted by a tape-automated-bonding method (TAB), and
PCB1 denotes a driver circuit substrate on which TCPs and capacitors are
mounted, which is divided into two for the video signal driver unit and
the scanning signal driver unit. Symbol FGP denotes a frame ground pad to
which are soldered spring-like pieces formed by cutting a shielding case
SHD, and FC denotes a flat cable for electrically connecting the lower
driver circuit substrate PCB1 and the left driver circuit substrate PCB1
together. The flat cable FC has, as shown, a plurality of lead wires
(phosphor-bronze wires plated with tin) that are supported and sandwiched
by a polyethylene layer and a polyvinyl alcohol layer of a striped shape.
›Structure for connecting TCP!
FIG. 22 is a diagram illustrating, in cross section, the structure of a
tape carrier package TCP in which an integrated circuit chip CHI is
mounted on a flexible wiring substrate to constitute the scanning signal
driver unit V and the video signal driver unit H, and FIG. 23 is a
sectional view illustrating essential portions in a state where the tape
carrier package TCP is connected to a terminal GTM for a signal circuit in
the liquid crystal display panel PNL.
In the drawing, symbol TTB denotes an input terminal/wiring unit of the
integrated circuit CHI, and TTM denotes an output terminal/wiring unit of
the integrated circuit CHI, which are made of, for example, copper. To
their ends (usually called inner leads) on the inside are connected
bonding pads PAD of the integrated circuit CHI by a so-called facedown
bonding method. The ends (usually called outer leads) on the outer sides
of the terminals TTB and TTM correspond to the inputs and outputs of the
semiconductor integrated circuit chip CHI, and are connected by soldering
to a CRT/TFT converter circuit/power source circuit SUP, and are further
connected by anisotropic conductive film ACF to the liquid crystal display
panel PNL. The package TCP is connected to the panel in a manner that the
ends thereof covers the protective film PSV through which are exposed the
connection terminals GTM on the side of the panel PNL. Therefore, the
external connection terminals GTM(DTM) are covered by either the
protective film PVS1 or the package TCP, and are strong against
electrolytic corrosion.
Symbol BF1 denotes a base film made of polyimide or the like, and SRS
denotes a solder resist film for masking so that the solder may not be
applied to undesired portions during the soldering. The gap between the
upper and lower glass substrates on the outer side of the sealing pattern
SL is protected, after washing, by an epoxy resin EPX and the like. The
gap between the package TCP and the upper substrate SUB2 is filled with a
silicone resin SIL to provide multiple protection.
›Driver unit substrate PCB2!
On the driver unit substrate PCB2 are mounted electronic parts such as ICs,
capacitors and resistors. On the driver unit substrate PCB2 are mounted a
circuit SUP inclusive of a power source circuit for producing a plurality
of stable voltages by dividing a voltage from a voltage source and a
circuit that converts the data for CRT (cathode-ray tube) from the host
(higher arithmetic unit) into the data for the TFT liquid crystal display
device. Symbol CJ denotes a connector connection unit, to which is
connected a connector that is connected to an external unit but that is
not shown.
The driver unit substrate PCB1 is connected to the driver unit board PCB2
through the flat cable FC.
›Whole constitution of the liquid crystal display module!
FIG. 24 is an exploded perspective view illustrating the constituent parts
of the liquid crystal display module MDL.
Symbol SHD denotes a frame-like shielding case (metal frame) made of a
metal plate, LCW denotes a display window thereof, PNL denotes the liquid
crystal display panel, SPB denotes a light diffusion plate, LCB denotes a
light conductor, RM denotes a reflector plate, BL denotes a backlight
fluorescent tube, and LCA denotes a backlight case, which are stacked
vertically as shown to assemble a module MDL.
The whole module MDL is secured by pawls and hooks provided in the
shielding case SHD.
The backlight case LCA contains the backlight fluorescent tube BL, light
diffusion plate SPB, light conductor LCB and reflector plate RM. Light
emitted from the backlight fluorescent tube BL disposed on one side of the
light conductor LCB is rendered backlight which is uniform on the display
surface through the light conductor LCB, reflector plate RM and light
diffusion plate SPB, and is emitted to the side of the liquid crystal
display panel PNL.
To the backlight fluorescent tube BL is connected an inverter circuit
substrate PCB3 which is a power source for the backlight fluorescent tube
BL.
As will be obvious from the foregoing description, the following
representative effects are obtained from the liquid crystal display device
of the present invention.
(1) Rise in the drive voltage is suppressed, and so-called crosstalk
(smear) decreases. There is therefore provided a liquid crystal display
device which offers a wide angle of view like that of cathode-ray tubes,
operates on a low voltage, consumes a decreased amount of electric power,
and maintains a good picture quality.
(2) The width of wiring is broadened without decreasing the opening areas
of the pixels that contribute to the display, the resistance of the wiring
is decreased to improve the picture quality, and the driver unit consumes
a decreased amount of electric power.
Besides, the number of places or the areas where the wirings intersect is
decreased, the probability of short-circuiting among the wirings is
decreased, and the parasitic capacitances are decreased among the wirings,
making it possible to improve the quality of picture and to decrease the
consumption of electric power by the driver unit.
By utilizing the effect of using the drain electrode. SD2 in common,
furthermore, it is possible to increase the number of thin-film
transistors in a pixel without increasing the areas where the wirings
intersect. By providing a plurality of thin-film transistors for a
plurality of pixel electrodes PX, furthermore, it is possible to obtain
normal display even when a pixel electrode PX is disconnected at a
portion. Even when one of the thin-film transistors is defective, normal
display is obtained by cutting out the defective thin-film transistor.
(3) Both ends of the counter voltage signal lines CL are connected to the
common bus line CB, and the resistance of the common bus line CB is set to
be smaller than the resistance of the counter voltage signal lines CL. It
is therefore made possible to decrease distortion in the waveform of the
voltage for driving the counter electrodes CT fed from the common voltage
driver unit 52, to nearly uniformalize the electric field intensity
between the pixel electrode and the counter electrode CT in the pixels in
the panel, and to decrease variation in the brightness that occurs along
the counter voltage signal lines CL. With both ends of the counter voltage
signal lines CL connected to the common bus line CB, furthermore, the
common voltage can be supplied to both ends of the counter voltage signal
lines CL and liquid crystals in the pixels can be driven even in case any
counter voltage signal line CL is broken disconnected at a portion. Unlike
the prior art, therefore, it does not happen that liquid crystals in the
pixels after the disconnected portion are not driven, and the quality of
display is not impaired.
(4) The region where the common bus line CB is arranged has a
cross-sectional structure which is the same as the cross-sectional
structure of the portions where the common bus line CB intersects the
scanning signal lines GL or the video signal lines DL. It is therefore
made possible to decrease variation in the thickness of the edges of the
substrate where the common bus line CB is formed and, hence, to make
constant the gap length between the two pieces of substrates to decrease
variation in the gap of the liquid crystal display device.
Though the present invention has been concretely described above by way of
embodiments, it should be noted that the invention is in no way limited to
the above embodiments only but can be modified in a variety of ways
without departing from the spirit and scope of the invention. In the
above-mentioned embodiments, for instance, amorphous silicon thin-film
transistors TFT are used as active elements. It is, however, also
allowable to use polysilicon thin-film transistors, MOS transistors on a
silicon wafer, or two-terminal elements such as MIM
(metal-intrinsic-metal) diodes. The invention can be further adapted even
to a liquid crystal display device of the reflection type constituted by a
pair of substrates at least one of which is transparent, a reflection
means and a polarizing means.
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