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United States Patent |
5,677,051
|
Ueda
,   et al.
|
October 14, 1997
|
Magnetic recording medium having a specified plasma polymerized hydrogen
containing carbon film and lubricant
Abstract
A magnetic recording medium possessing excellent electromagnetic
characteristics, corrosion resistance, durability, abrasion resistance and
lubricity, has an undercoat layer, a ferromagnetic metal layer, a
protective layer and a lubricating layer formed in this order on a
non-magnetic substrate, or has an undercoat layer, a ferromagnetic metal
layer, an intercepting layer, a protective layer and a lubricating layer
formed in this order on a non-magnetic substrate, wherein the protective
layer is a plasma-polymerized hydrogen-containing carbon film having a
refractive index of 1.90 or more and a contact angle of less than 80
degrees, the film thickness of the protective layer or the total film
thickness of the protective layer and the intercepting layer is 30 to 150
.ANG., the undercoat layer, as well as the intercepting layer, is a film
formed of silicon oxide represented by SiOx (x=1.8-1.95), and the
lubricating layer is formed of a compound selected from the group
consisting of polar perfluoropolyethers, non-polar perfluoropolyethers,
perfluorocarboxylic acids, phosphazens, perfluoroalkylates and
perfluoroacrylate compounds; and a method for producing the recording
medium.
Inventors:
|
Ueda; Kunihiro (Saku, JP);
Nakayama; Masatoshi (Sakura, JP);
Yazu; Kiyoshi (Hodonoharano-machi, JP);
Kobayashi; Koji (Miyota-machi, JP);
Kanazawa; Hiromichi (Saku, JP)
|
Assignee:
|
TDK Corporation (Tokyo, JP)
|
Appl. No.:
|
651902 |
Filed:
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May 21, 1996 |
Foreign Application Priority Data
| Nov 30, 1993[JP] | 5-299682 |
| Nov 30, 1993[JP] | 5-299683 |
Current U.S. Class: |
428/336; 427/122; 427/131; 427/249.7; 427/479; 427/488; 427/489; 427/577; 427/578; 427/585; 427/906; 428/408; 428/422; 428/446; 428/457; 428/835.2; 428/900 |
Intern'l Class: |
G11B 005/66 |
Field of Search: |
428/336,408,446,457,694 TZ,694 TC,900,422,694 TF
427/122,131,249,577,578,585
|
References Cited
U.S. Patent Documents
4693799 | Sep., 1987 | Yanagihara et al. | 204/165.
|
4892789 | Jan., 1990 | Nakayama et al. | 428/336.
|
4925733 | May., 1990 | Imataki et al. | 428/336.
|
5073785 | Dec., 1991 | Jansen et al. | 346/1.
|
5182132 | Jan., 1993 | Murai et al. | 427/577.
|
5232791 | Aug., 1993 | Kohler et al. | 428/694.
|
5266409 | Nov., 1993 | Schmidt et al. | 428/446.
|
5275850 | Jan., 1994 | Kitoh et al. | 427/577.
|
5320875 | Jun., 1994 | Hu et al. | 427/493.
|
5330852 | Jul., 1994 | Gerstenberg et al. | 428/694.
|
5352493 | Oct., 1994 | Dorfman et al. | 427/530.
|
5543203 | Aug., 1996 | Tani et al. | 428/156.
|
Foreign Patent Documents |
57-135443 | Aug., 1982 | JP.
| |
57-164432 | Oct., 1982 | JP.
| |
3-53691 | Aug., 1991 | JP.
| |
4-341918 | Nov., 1992 | JP.
| |
5-20663 | Jan., 1993 | JP.
| |
5-33456 | May., 1993 | JP.
| |
Other References
McGraw-Hill Encyclopedia of Science & Technology, 7th. edition,
McGraw-Hill, Inc., New York, 1992.
Van Nostrand's Scientific Encyclopedia, 8th. edition, Van Nostrand
Reinhold, New York, 1995.
Dictionary of Physics, edited by John Daintith, Barnes & Noble Books, 1981.
|
Primary Examiner: Resan; Stevan A.
Attorney, Agent or Firm: Yee; Stephen F. K.
Parent Case Text
CROSS REFERENCE TO RELATED APPLICATION
This application is a continuation-in-part of application Ser. No.
08/350,070, filed on Nov. 29, 1994 now abandoned.
Claims
What is claimed is:
1. A magnetic recording medium comprising a non-magnetic substrate, an
undercoat layer, a ferromagnetic metal layer, a protective layer and a
lubricating layer formed in this order on the substrate, wherein the
protective layer is a plasma-polymerized hydrogen-containing carbon film
having, as formed, a refractive index of 1.90 or more, a film thickness of
30 to 150 .ANG. and a contact angle with ion exchanged water of less than
80 degrees, the undercoat layer is a film formed of silicon oxide
represented by SiOx (x=1.8-1.95), and the lubricating layer is formed of a
compound selected from the group consisting of polar perfluoropolyethers,
non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds.
2. A magnetic recording medium comprising a non-magnetic substrate, an
undercoat layer, a ferromagnetic metal layer, an intercepting layer, a
protective layer and a lubricating layer formed in this order on the
substrate, wherein the protective layer is a plasma-polymerized
hydrogen-containing carbon film (DLC film) having, as formed, a refractive
index of 1.90 or more and a contact angle with ion exchanged water of less
than 80 degrees, the undercoat layer and the intercepting layer are films
formed of silicon oxide represented by SiOx (x=1.8-1.95), the total film
thickness of the protective layer and the intercepting layer is 30 to 150
.ANG., and the lubricating layer is formed of a compound selected from the
group consisting of polar perfluoropolyethers, non-polar
perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds.
3. The magnetic recording medium according to claim 1 or 2, wherein the
ferromagnetic metal layer is formed by vapor deposition.
4. A method for producing a magnetic recording medium according to claim 1
which comprises forming an undercoat layer of silicon oxide represented by
SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic
metal layer thereon in a vapor phase, then plasma polymerizing a
hydrocarbon gas and hydrogen at a frequency of 50 kHz to 450 kHz while
applying a negative bias to a base side to form a protective layer of a
hydrogen-containing carbon film having, as formed, a refractive index of
1.90 or more, a contact angle with ion exchanged water of less than 80
degrees and a film thickness of 30 to 150 .ANG., and finally forming a
lubricating layer of a compound selected from the group consisting of
polar perfluoropolyethers, non-polar perfluoropolyethers,
perfluorocarboxylic acids, phosphazens, perfluoroalkylates and
perfluoroacrylate compounds.
5. A method for producing a magnetic recording medium according to claim 2
which comprises forming an undercoat layer of silicon oxide represented by
SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic
metal layer thereon in a vapor phase, forming an intercepting layer of a
film formed of silicon oxide represented by SiOx (x=1.8-1.95) by plasma
polymerization, then plasma polymerizing a hydrocarbon gas and hydrogen at
a frequency of 50 kHz to 450 kHz while applying a negative bias to a base
side to form a protective layer of a hydrogen-containing carbon film
having, as formed, a refractive index of 1.90 or more and a contact angle
with ion exchanged water of less than 80 degrees, adjusting the total film
thickness of the protective layer and the intercepting layer to 30 to 150
.ANG., and finally forming a lubricating layer of a compound selected from
the group consisting of polar perfluoro-polyethers, non-polar
perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds.
6. The method according to claim 4 or 5, wherein the negative bias is a
pulse bias, the pulse duty factor (ON/OFF ratio) is 0.3 to 3, and the
frequency is 10 Hz to 500 Hz.
7. The method according to claim 4 or 5, wherein the formation of the
ferromagnetic metal layer in the vapor phase is by vapor deposition.
Description
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a magnetic recording medium and a method
for producing the same, and more particularly to a magnetic recording
medium in which a ferromagnetic metal layer serves as a magnetic layer,
the ferromagnetic metal layer having improved corrosion resistance,
durability, abrasion resistance and lubricity, and a method for its
production.
2. Background Art
Magnetic recording media in which ferromagnetic metal layers serve as
magnetic layers have excellent characteristics, such as high saturation
magnetic flux density and coercive force.
Previously, various magnetic recording media and methods for their
production have been proposed to improve the corrosion resistance,
durability, abrasion resistance and lubricity of the magnetic recording
media in which the ferromagnetic metal layers serve as the magnetic
layers.
For example, Japanese Patent Unexamined Publication No. 4-341918 discloses
a magnetic recording medium in which a ferromagnetic metal thin film
serves as a magnetic layer, the magnetic recording medium comprising a
non-magnetic resin substrate, an undercoat layer, a ferromagnetic metal
film and a topcoat layer, the undercoat layer and the topcoat layer each
containing C and H, and being plasma-polymerized films having a refractive
index of 1.8 or more. Japanese Patent Unexamined Publication No. 5-20663
discloses a magnetic recording medium in which the undercoat layer is a
plasma-polymerized film containing Si or Si and 0, and the topcoat layer
is a plasma-polymerized film containing C and H. Japanese Patent Examined
Publication No. 5-33456 discloses a magnetic recording medium comprising a
substrate, a magnetic layer formed on the substrate and a protective layer
formed on the magnetic layer, the protective layer comprising a hard
carbon layer and a fluorine-containing lubricating oil layer. Japanese
Patent Unexamined Publication No. 57-135443 discloses a magnetic recording
medium in which a vapor stream of a magnetic substance is obliquely
incident on a surface of a substrate to deposit a magnetic thin film, and
immediately thereafter an organic substance is plasma polymerized on the
deposited magnetic film to provide an overcoat thin-film layer. Japanese
Patent Unexamined Publication No. 57-164432 discloses a magnetic recording
medium in which an organic polymer layer is formed on an oblique
deposition type metal magnetic layer and a higher fatty acid or ester
layer is formed thereon, the organic polymer layer and the higher fatty
acid or ester layer each being formed by vacuum deposition, ion plating,
sputtering or plasma polymerization. Japanese Patent Examined Publication
No. 3-53691 discloses a magnetic recording medium in which a surface of a
magnetic layer is coated with a plasma-polymerized thin film having
siloxane bonds and a thickness of 5 to 1000 .ANG..
However, for the prior-an magnetic recording media described in Japanese
Patent Unexamined Publication Nos. 4-341918 and 5-20663, the protective
layers have insufficient adhesive property and corrosion resistance.
Further, the magnetic recording medium described in Japanese Patent
Examined Publication No. 5-33456 has the disadvantage of rusting because
of lack of an undercoat layer. The magnetic recording medium described in
Japanese Patent Unexamined Publication No. 57-135443 in which the organic
substance is plasma polymerized on the magnetic layer, and the magnetic
recording medium described in Japanese Patent Unexamined Publication No.
57-164432 in which the higher fatty acid or ester is plasma polymerized on
the magnetic layer are also not sufficient in corrosion resistance,
lubricity and abrasion resistance. Furthermore, the magnetic recording
medium described in Japanese Patent Examined Publication No. 3-53691
(Japanese Patent No. 1687307), in which the magnetic layer is coated with
the plasma-polymerized film having siloxane bonds, has no undercoat layer,
resulting in formation of rust, and is also poor in abrasion resistance.
Accordingly, a magnetic recording medium having a combination of corrosion
resistance, abrasion resistance, friction resistance, durability and
lubricity is desirable.
SUMMARY OF THE INVENTION
In order to solve the above-mentioned problem, the present inventors have
conducted intensive investigations, and as a result have discovered that
the problems can be solved (1) when a magnetic recording medium
structurally comprises an SiOx film, a magnetic layer, a protective layer
of a diamond like carbon (DLC) film, and further a lubricating layer, all
formed on a substrate, said DLC film forming the protective layer being a
plasma-polymerized hydrogen-containing carbon film having a specified
refractive index and contact angle and formed by applying a negative bias
to a base to adjust the frequency (audio frequency, or AF) on the
electrode side to a specified value, said lubricating layer being formed
of a specified fluorine compound, and (2) when a magnetic recording medium
structurally comprises an SiOx film, a magnetic layer, an SiOx film, a
protective layer (DLC film) and further a lubricating layer, all formed on
a substrate, said DLC film forming the protective layer being a
plasma-polymerized hydrogen-containing carbon film having a specified
refractive index and contact angle and formed by applying a negative bias
to a base to adjust the frequency (AF) on the electrode side to a
specified value, said lubricating layer being formed of a specified
fluorine compound, thus completing the present invention.
The present invention provides: (1) a magnetic recording medium comprising
an undercoat layer, a ferromagnetic metal layer, a protective layer and a
lubricating layer, all formed on a non-magnetic substrate in this order,
wherein said protective layer is a plasma-polymerized hydrogen-containing
carbon film (DLC film) having a refractive index of 1.90 or more, a film
thickness of 30 to 150 .ANG. and a contact angle of less than 80 degrees,
said undercoat layer is a film formed of silicon oxide represented by SiOx
(x=1.8-1.95), and said lubricating layer is formed of a compound selected
from the group consisting of polar perfluoropolyethers, non-polar
perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds; (2) a magnetic
recording medium comprising an undercoat layer, a ferromagnetic metal
layer, an intercepting layer, a protective layer and a lubricating layer
formed on a non-magnetic substrate in this order, wherein said protective
layer is a plasma-polymerized hydrogen-containing carbon film (DLC film)
having a refractive index of 1.90 or more and a contact angle of less than
80 degrees, said undercoat layer and said intercepting layer are films
formed of silicon oxide represented by SiOx (x=1.8-1.95), the total film
thickness of said protective layer and said intercepting layer is 30 to
150 .ANG. and said lubricating layer is formed of a compound selected from
the group consisting of polar perfluoropolyethers, non-polar
perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds; (3) the magnetic
recording medium described in (1) or (2) above, wherein said ferromagnetic
metal layer is formed by vapor deposition; (4) a method for producing the
magnetic recording medium described in (1) above which comprises forming
an undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a
non-magnetic substrate, forming a ferromagnetic metal layer thereon in a
vapor phase, then plasma polymerizing a hydrocarbon gas and hydrogen at a
frequency of 50 kHz to 450 kHz while applying a negative bias to a base
side to form a protective layer of a hydrogen-containing carbon film
having a refractive index of 1.90 or more, a contact angle of less than 80
degrees and a film thickness of 30 to 150 .ANG. and finally forming a
lubricating layer of a compound selected from the group consisting of
polar perfluoropolyethers, non-polar perfluoropolyethers,
perfluorocarboxylic acids, phosphazens, perfluoroalkylates and
perfluoroacrylate compounds; (5) a method for producing the magnetic
recording medium described in (2) above which comprises forming an
undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a
non-magnetic substrate, forming a ferromagnetic metal layer thereon in a
vapor phase, forming an intercepting layer of a film formed of silicon
oxide represented by SiOx (x=1.8-1.95) by plasma polymerization, then
plasma polymerizing a hydrocarbon gas and hydrogen at a frequency of 50
kHz to 450 kHz while applying a negative bias to a base side to form a
protective layer of a hydrogen-containing carbon film having a refractive
index of 1.90 or more and a contact angle of less than 80 degrees,
adjusting the total film thickness of the protective layer and the
intercepting layer to 30 to 150 .ANG., and finally forming a lubricating
layer of a compound selected from the group consisting of polar
perfluoro-polyethers, non-polar perfluoropolyethers, perfluoro-carboxylic
acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds;
(6) the method described in (4) or (5) above, wherein the negative bias is
a pulse bias, the pulse duty factor (ON/OFF ratio) is 0.3 to 3, and the
frequency is 10 Hz to 500 Hz; and (7) the method described in (4) or (5)
above, wherein the formation of the ferromagnetic metal layer in the vapor
phase is by vapor deposition.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic side view showing an apparatus for producing a DLC
film used in the present invention. In the figure, the reference numeral 1
designates electrodes, the reference numeral 2 designates a rotating drum,
the reference numerals 3 and 4 designate guide rolls, respectively, the
reference numeral 5 designates a tape take-up roll, the reference numeral
6 designates a tape unwinding roll, and the reference numeral 7 designates
a power supply for a DC bias.
FIG. 2 is a schematic, to an enlarged scale, of a water droplet on a
surface, showing how the contact angle (.theta.) is determined.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
In the present invention, the plasma-polymerized hydrogen-containing carbon
film having a refractive index of 1.90 or more and a contact angle of less
than 80 degrees is used as the protective layer, said film being formed by
plasma polymerization by applying an audio frequency (AF) of 50 kHz to 450
kHz to the electrode side and a negative bias to the base side.
The plasma polymerization can be achieved by any known methods, for example
the method described in Japanese Patent Examined Publication No. 3-53691.
A vacuum chamber in which electrodes are arranged is evacuated to
10.sup.-6 Torr, and specific amounts of a raw material gas and hydrogen
gas are introduced thereinto by use of a mass flow controller. After
maintenance at a specified pressure, an electrical discharge is generated
with an AF power supply, and the speed of a running system of a tape is
controlled to give a required film thickness. In preparing the DLC film, a
DC bias is applied to an electrode on the base side. Then, the vacuum is
broken, and the resulting sample on which a polymerized film is formed is
taken out.
As the raw materials for the plasma-polymerized hydrogen-containing carbon
film forming the protective layer, various gases containing carbon and
hydrogen can be used. Usually, one or more of methane, ethane, propane,
butane, pentane, ethylene, propylene, butene, butadiene, acetylene,
methylacetylene, and other saturated and unsaturated hydrocarbons which
are gaseous at ordinary temperatures are used as carbon and hydrogen
sources because of their good operability.
When the hydrocarbon gas is plasma polymerized, an audio frequency of 50
kHz to 450 kHz is applied. An audio frequency of less than 50 kHz
approaches direct current (DC) in properties. Hence, discharges become
unstable as the films are overlapped on the periphery according to
long-term operation, which causes abnormal film quality. In addition,
great damage due to ions causes damaged properties of the tape. Further,
an audio frequency exceeding 450 kHz causes sluggish movement of ions,
resulting in soft film quality. The resulting film is therefore poor in
durability.
As to the negative bias, a negative potential is applied by DC. A pulse
bias is preferably used. As the bias, there also is radio frequency (RF)
bias. However, although the RF bias produces a negative potential, the
negative potential is partially reversed to a positive potential.
Accordingly, a completely negative potential is not necessarily obtained.
Experiments show that this case was little different in properties from
the case when no bias was applied.
Even when the DC bias is merely applied, the effect is manifested. However,
when the DC bias is further pulsed, the sufficient bias effect is obtained
even through an insulator for further improvement.
The pulse duty factor (ON/OFF ratio) is preferably 0.3 to 3. A pulse duty
factor of less than 0.3 causes unstable discharges, and a pulse duty
factor exceeding 3 results in no difference from the case when the DC is
applied as a continuous wave (CW). The pulse duty factor is further
desirably about 0.8 to 1.5.
Further, the frequency is preferably 10 Hz to 500 Hz. If the frequency is
less than 10 Hz, the bias applying effect is not obtained. If the
frequency exceeds 500 Hz, the film is not hardened because of its
high-frequency behavior.
The refractive index of the plasma-polymerized hydrogen-containing carbon
film in the present invention is 1.9 or more. A refractive index of less
than 1.9 results in a significant decrease in durability and also
deterioration of keeping characteristics. This is because the film
hardness is lowered and a decrease in film density allows water to easily
pass through the film. The reason for this is that the increased content
of hydrogen in the film makes it impossible to form a cross-linked
structure.
The plasma-polymerized hydrogen-containing carbon film of the magnetic
recording medium of (1) mentioned above of the present invention has a
film thickness of 30 to 150 .ANG.. If the film thickness is less than 30
.ANG., the effect is not manifested. If the film thickness exceeds 150
.ANG., the electromagnetic characteristics of the deposited tape itself is
affected because of the great spacing loss. Further, the contact angle
thereof is less than 80 degrees. If the contact angle shows a value of 80
degrees or more, the still characteristics (durability) is not improved
because of insufficient production of C.dbd.C on a surface of the film.
With respect to such a film having a refractive index of 1.90 or more and
a contact angle of less than 80 degrees, the methyl-methylene absorption
appearing at 2,900 cm.sup.-1 in Fourier transform infrared (FTIR)
spectroscopy is little observed.
The total film thickness of the plasma-polymerized hydrogen-containing
carbon film and the intercepting layer of the magnetic recording medium of
(2) mentioned above of the present invention is 30 to 150 .ANG.. If the
film thickness is less than 30 .ANG., the effect is not manifested. If the
film thickness exceeds 150 .ANG., the electromagnetic characteristics of
the deposited tape itself are affected because of the great spacing loss.
Further, the contact angle thereof is less than 80 degrees. If the contact
angle shows a value of 80 degrees or more, the still characteristics are
not improved because of insufficient production of C.dbd.C on a surface of
the film. With respect to such a film having a refractive index of 1.90 or
more and a contact angle of less than 80 degrees, the methyl-methylene
absorption appearing at 2,900 cm.sup.-1 in FTIR is little observed.
The undercoat layer of the magnetic recording medium of (1) mentioned above
is a film formed of silicon oxide represented by SiOx (X=1.8-1.95). In
silicon oxide wherein x is less than 1.8, carbon is left in the film, so
that the density is not increased. Hence, the water-intercepting property
is not manifested. Silicon oxide wherein x exceeds 1.95 is also
insufficient in water-intercepting property to function properly as a
water-intercepting layer. By the use of electron spectroscopy for chemical
analysis (ESCA), it has been determined that the film formed of silicon
oxide wherein x is less than 1.8 contains 15 atomic % of unreacted carbon
atoms based on all atoms, whereas the film formed of silicon oxide wherein
x is 1.8 or more contains less than 1 atomic % of unreacted carbon atoms
because the reaction proceeds sufficiently. It becomes clear that the
carbon content has a significant effect on water-intercepting property.
The undercoat layer and the intercepting layer of the magnetic recording
medium of (2) mentioned above are films formed of silicon oxide
represented by SiOx (x=1.8-1.95). In silicon oxide wherein x is less than
1.8, carbon is left in the film, so that the density is not increased.
Hence, the water-intercepting property is not manifested. Silicon oxide
wherein x exceeds 1.95 is also insufficient in water-intercepting property
to function properly as a water-intercepting layer. By the use of electron
spectroscopy for chemical analysis (ESCA), it has been determined that the
film formed of silicon oxide wherein x is less than 1.8 contains 15 atomic
% of unreacted carbon atoms based on all atoms, whereas the film formed of
silicon oxide wherein x is 1.8 or more contains less than 1 atomic % of
unreacted carbon atoms because the reaction proceeds sufficiently. It
becomes clear that the carbon content has a significant effect on
water-intercepting property.
The film formed of silicon oxide represented by SiOx (x=1.8-1.95) is
prepared by evacuating a vacuum chamber to 10.sup.-6 Torr, then
introducing specific amounts of a raw material gas and oxygen gas
thereinto by use of a mass flow controller, and generating plasma with an
AF power supply. In the case of the DLC film, a DC bias is applied. For
the SiOx film, however, such bias is not particularly necessary though it
may be applied, with the proviso that the introducing flow ratio of the
raw material silane series gas to the oxygen gas (Si/O.sub.2) is required
to be 1/3. If the oxygen flow rate is less than this ratio, the film
formed of silicon oxide wherein x is 1.8 or more can not be obtained.
The silane series gases used as the raw materials include silane,
trimethylsilane, tetramethylsilane, trimethoxysilane, tetramethoxysilane
and tetraethoxysilane. From the viewpoint of handling, the materials which
are liquid under the standard conditions of 0.degree. C. and 1 atm. are
easily handled. As to the boiling point, the materials having a boiling
point of about 100.degree. C. are easily handled. The liquid raw materials
may be supplied through a mass flow controller by use of a commercial
liquid feeder.
The lubricating layer is formed by applying a solution of a compound
selected from the group consisting of polar perfluoropolyethers, non-polar
perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds in a solvent. Usually,
there is no particular restriction on coating methods, as long as they are
methods used for coating of the magnetic recording media, such as gravure
coating, reverse coating and die nozzle coating. The concentration of the
lubricant based on the solvent is adjusted to within 1 to 0.1% by weight.
Examples of the polar perfluoropolyethers include Crylocks (E. I. Du Pont),
Z-DOL, AM2001 (Monte Dison) and SA1, SY3 (Daikin Kogyo Co.). Examples of
the non-polar perfluoro-polyethers include S20 (Daikin Kogyo Co.),
examples of the perfluorocarboxylic acids include n-C.sub.m F.sub.l COOH
(m=7-10,l=14-21), examples of the perfluoroalkylates include FA108
(Kyoeisha Yushikagaku Kogyo Co.), and examples of the perfluoro-acrylate
compounds include n-C.sub.m F.sub.l COOC.sub.p F.sub.q (p=7-10,q=14-21, m
and l are as defined above).
As the solvents, flon solvents such as L-90, and tributylamine solvents
such as EFL-150 (Daikin Kogyo Co.) are used.
Compounds other than these lubricants, for example, saturated carboxylic
acids such as stearic acid and myristic acid and silicone oil, do not give
the effect. Fluorine lubricants having low surface energy are preferred
for the magnetic metal layers.
As the non-magnetic substrates, various usual films are used, as long as
they resist heat on vapor deposition of the ferromagnetic metal thin
films. Examples of such films include films of polyesters, polyimides,
aramides, polysulfones, polyether ether ketone (PEEK). Films of
polyethylene terephthalate (PET) and polyethylene naphthalate (PEN) are
used.
Metals such as Fe, Co and Ni and various alloys thereof are used in the
ferromagnetic metal layers. Co or alloys mainly composed of Co are
preferred. The alloys mainly composed of Co include Co--Ni, Co--Fe,
Co--Cr, Co--Ni--Cr, Co--Pt--Cr, Co--Cu, Co--Sm and Co--P. The Co--Ni
alloys are preferably used, and alloys containing about 80% or more of Co
and less than 20% of Ni in molar ratio are particularly preferred. These
ferromagnetic metal thin layers are formed by metal thin layer forming
methods such as vacuum deposition, ion plating and sputtering. Deposition
is preferably used, and oblique deposition is particularly preferred.
Oxidative gases such as oxygen may be introduced during formation of the
films. The thickness of the magnetic layer is 500 to 3000 .ANG., and
preferably 1500 to 2000 .ANG..
In the magnetic recording medium having the ferromagnetic metal layer
serving as the magnetic layer, (i) the undercoat layer on the
ferromagnetic metal layer is the film formed of silicon oxide represented
by SiOx (x=1.8-1.95), and the protective layer is the plasma-polymerized
hydrogen-containing carbon film having a refractive index of 1.90 or more,
a film thickness of 30 to 150 .ANG. and a contact angle of less than 80
degrees, which is prepared by plasma polymerization while applying an
audio frequency of 50 kHz to 450 kHz to the electrode side and a negative
bias to the base side; or (ii) the undercoat layer and the intercepting
layer on the ferromagnetic metal layer are the films formed of silicon
oxide represented by SiOx (x=1.8-1.95), the protective layer is the
plasma-polymerized hydrogen-containing carbon film having a refractive
index of 1.90 or more and a contact angle of less than 80 degrees, which
is prepared by plasma polymerization while applying an audio frequency of
50 kHz to 450 kHz to the electrode side and a negative bias to the base
side, and the total thickness of the protective layer and the intercepting
layer is 30 to 150 .ANG.; and the lubricating layer is formed of a
compound selected from the group consisting of polar perfluoropolyethers,
non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens,
perfluoroalkylates and perfluoroacrylate compounds; whereby the excellent
characteristics of the magnetic recording medium having the ferromagnetic
metal layer serving as the magnetic layer are maintained, and the
corrosion resistance, durability, abrasion resistance and lubricity
thereof are improved.
As used herein, the term "contact angle" has the same meaning as commonly
used and understood in the art. Definitions can be found, for example, in
McGraw-Hill Encyclopedia of Science & Technology, 7th. edition,
McGraw-Hill, Inc., New York, 1992, Van Nostrand's Scientific Encyclopedia,
8th. edition, Van Nostrand Reinhold, New York, 1995, and the Dictionary of
Physics, edited by John Daintith, Barnes & Noble Books, 1981.
In the wetting or nonwetting of solids by liquids, the usual criterion is
the contact angle between the solid and the liquid, as measured through
the liquid. When a liquid wets the surface well, i.e., good adhesion, the
contact angle is an acute angle, between 0 to 90.degree., and when the
liquid does not wet the surface well, i.e., low adhesion, the contact
angle is an obtuse angle, greater than 90.degree.. Since an object of the
present invention is to provide a magnetic recording medium having
improved corrosion resistance by preventing, with a protective layer, the
penetration to the magnetic layer of corrosion-causing liquid, the
"wetting" of the surface of the protective layer as indicated by the
contact angle being less than 80.degree., is a useful gauge of the
adhesiveness of the protective layer as formed for the overlying
lubricating layer which is applied thereto, and the adhesiveness of the
protective layer to the underlying magnetic layer, or to the intermediate
layer in the alternate embodiment. Thus, with a contact angle less than
80.degree., the protective layer as formed adheres well to the underlying
magnetic film layer or intermediate layer, and provides good adhesiveness
for the overlying lubricating layer.
The value of the contact angle depends on the various conditions for
forming the protective layer on the magnetic recording tape by plasma
polymerization of hydrocarbon gas and hydrogen gas. These conditions
include plasma frequency, the use of pulse bias or continuous wave (CW),
pulse duty factor and the voltage of the minus bias. In order to obtain a
smaller value of contact angle (less than 80.degree.), the following
conditions are selected: (1) lower plasma frequency; (2) employment of a
pulse bias rather than CW; (3) pulse duty factor between 0.3 and 3; and
(4) a larger minus bias value number.
The apparatus used for measuring the contact angle is a contact angle
meter, available commercially from Kyowa Kaimen Kagaku Co., Japan. In use,
a sample of magnetic recording tape is place on a vertically-adjustable
sample stand, with the protective layer of the tape facing upwardly.
Ion-exchanged water is dropped from an injector of the apparatus to make a
droplet approximately 2 mm in diameter. The water droplet is formed on the
tape sample by raising and lowering the sample stand as necessary.
FIG. 2 shows how the contact angle is determined. A water droplet D has
been formed on a solid surface S, such as the surface of a protective
layer of DLC film. The contact angle theta (.theta.) is measured with
respect to a tangent line at the interface between the water droplet, the
surface of the solid, and the surrounding atmosphere, and is determined as
follows:
.theta.=2(.theta..sub.1)
.theta.=-2 tan.sup.1 (h/b)
where b=1/2 the base B of the water droplet
h=height of the water droplet
The pulse duty factor is the ratio of the time the pulse electric power is
applied (ON) to the time the power is not applied (OFF). Generally, when
pulse electric power is used, power is applied at a constant interval.
A discharge gives various species. Since a discharge by pulse is
intermittent, plasma growth is limited. As a result, plasma is a group of
species which have small distribution, is formed under pulse conditions. A
film which is made from such plasma is homogeneous. Control of the pulse
duty factor between 0.3 and 3 makes the contact angle less than
80.degree..
The film thickness and refractive index are measured by ellipsometry, a
common technique for determining the properties of a material from the
characteristics of polarized light reflected from its surface. When the
electromagnetic waves comprising the light are reflected from the surface
of the material, the amplitude of the reflected wave depends upon the
properties of the material, the angle of incidence and the polarization of
the wave. Further information on ellipsometry, and the procedures and
apparatuses involved, can be found in most technical reference
publications, such as McGraw-Hill Encyclopedia of Science & Technology and
Van Nostrand's Scientific Encyclopedia, both cited above.
The composition of the SiOx film can be determined by electron spectroscopy
for chemical analysis, or ESCA, also a known analytic technique. Electron
spectroscopy is the study of the energy spectra of photoelectron or Auger
electrons emitted from a substance upon bombardment by electromagnetic
radiation, electrons, or ions, and is commonly used to investigate atomic,
molecular or solid-state structure, and in chemical analysis. ESCA, also
sometimes known as x-ray photoelectron spectroscopy, is a form of electron
spectroscopy in which a sample is irradiated with a beam of monochromatic
x-rays and the energies of the resulting photoelectrons are measured.
Additional details on ESCA, and its use to determining chemical
composition, can be found in most technical reference publications, such
as the McGraw-Hill Encyclopedia of Science & Technology, cited above,
Volume 6.
The present invention is described further with reference to the following
examples. The characteristics of the magnetic recording tapes were
measured as follows:
(1) Still Durability
A signal at 7 MHz was recorded under conditions of 40.degree. C. and 20%
relative humidity (RH), and the time required until its output reached -5
dB was measured.
(2) Corrosion Resistance
Each sample was kept under conditions of 60.degree. C. and 90% RH for 1
week, and the reduction rate in saturation magnetic flux density was
measured.
(3) Initial Friction
The friction coefficient at the first pass was measured with a
commercially-available 180-degree pin friction tester.
(4) Durable Friction
The friction coefficient at the 500th pass was measured with a 180-degree
pin friction tester.
(5) Surface Observation
The surface condition of each sample after 200 passes was observed under an
optical microscope to examine the extent of surface scratching. No scratch
is indicated by .largecircle., 1 to 5 scratches by .DELTA., and 6
scratches or more by X.
(6) Electromagnetic Characteristics
When the output at 7 MHz in Comparative Example 1 given below was taken as
0 dB, a difference in output between the sample in Comparative Example 1
and each sample of less than 2 dB is indicated by .largecircle., and a
difference of 2 dB or more by X.
A. Magnetic Recording Media of (1)
EXAMPLES 1 TO 20 AND COMPARATIVE EXAMPLES 1 TO 29
The inside of a chamber was evacuated to 10.sup.-6 Torr, and then
tetramethoxysilane as a raw material and oxygen were introduced thereinto
at a ratio of 1:3, followed by adjustment of the pressure to 10.sup.-2
Torr. Then, an audio frequency of 100 kHz was applied to an electrode to
generate plasma discharges and to plasma polymerize SiOx having each of
the various compositions shown in Tables 1-1 to 1-5, thereby forming an
undercoat layer on a polyethylene terephthalate film substrate having a
thickness of 7 .mu.m. The x value in the SiOx film was changed by varying
the ratio of oxygen introduced together with the silane series organic
compound.
Subsequently, an alloy containing 80% by weight of Co and 20% by weight of
Ni was deposited under an oxygen atmosphere to form a ferromagnetic metal
layer (with a film thickness of 1,500 .ANG.). A protective layer was
formed thereon by plasma polymerization using methane as a hydrocarbon
source by use of a DLC film producing apparatus such as shown in FIG. 1.
Namely, the inside of a chamber was evacuated to 10.sup.-6 Torr, and then
methane as a raw material and hydrogen were introduced thereinto at a
ratio of 1:1, followed by adjustment of the pressure to 10.sup.-2 Torr.
Then, electromagnetic waves were applied to electrodes at high frequency
to generate plasma discharges. At the same time, a DC bias was applied
with the connections as shown in FIG. 1.
The protective layer was further coated by gravure coating with a solution
prepared by dissolving each of the various lubricants shown in Tables 1-6
to 1-10 in a solvent, EFL-150 (Daikin Kogyo Co.), in a concentration of
0.3% by weight. The film thickness was about 40 .ANG.. As the DC bias on
the base side, one having a pulse generation mechanism was used.
S20 (Daikin Kogyo Co.) was used as a non-polar perfluoro-polyether (PFPE),
KF-851 (Shinetsu Kagaku kogyo Co.) as silicone oil, SAl (Daikin Kogyo Co.)
as a polar PFPE, n-C.sub.10 F.sub.20 COOH as a perfluorocarboxylic acid
(PFA), phosphazene (Idemitsu Sekiyu Kagaku Co.) as a phosphazene, FA108
(Kyoeisha Yushikagaku Kogyo Co.) as a perfluoroacrylate, and n-C.sub.10
F.sub.20 COOC.sub.10 F.sub.20 as a perfluoroalkylate to form a lubricating
layer.
The composition and the film thickness of the SiOx undercoat layers, the
plasma frequency and the bias on film formation of the plasma-polymerized
hydrogen-containing carbon film protective layers, and the film thickness,
the refractive index and the contact angle of the resulting protective
layers are shown in Tables 1-1 to 1-5. When the pulse bias is used, the
pulse is 50 Hz. Further, for the resulting magnetic recording tapes, the
materials of the lubricating layers, the still time, the corrosion
resistance, the initial friction, the durable friction, the results of
surface observation and the electromagnetic characteristics are shown in
Tables 1-6 to 1-10.
The film thickness and the refractive index were measured by ellipsometry.
The composition of SiOx was measured by ESCA. The contact angle was
measured by a droplet dropping system using a contact angle meter (Kyowa
Kaimen Kagaku Co.). For comparison, protective layers were formed using RF
(radio frequency: 13.56 MHz) and 1 MHz.
TABLE 1
__________________________________________________________________________
Protective Film (DLC Film) Undercoat layer (SiOx)
Plasma Film Film
Frequency Thickness
Refractive
Contact
Thickness
Value
(kHz)
Bias
Bias V
(.ANG.)
Index
Angle
(.ANG.)
of x
__________________________________________________________________________
Example 1
400 CW -200
100 1.95 77 200 1.9
Example 2
200 CW -200
100 1.97 77 200 1.9
Example 3
100 CW -200
100 1.98 76 200 1.9
Example 4
50 CW -200
100 2.0 75 200 1.9
Example 5
400 pulse
-200
100 1.97 75 200 1.9
Example 6
200 pulse
-200
100 1.98 75 200 1.9
Example 7
100 Pulse
-200
100 2.0 74 200 1.9
Example 8
50 pulse
-200
100 2.1 73 200 1.9
Example 9
400 CW -200
30 1.95 77 200 1.9
Example 10
400 CW -200
50 1.95 77 200 1.9
Example 11
400 CW -200
150 1.95 77 200 1.9
Example 12
400 CW -200
100 1.95 77 300 1.9
Example 13
400 CW -200
100 1.95 77 200 1.8
Example 14
400 CW -200
100 1.95 77 200 1.95
Example 15
400 CW -200
100 1.95 77 200 1.9
Exdmple 16
400 CW -200
100 1.95 77 200 1.9
Example 17
400 CW -200
100 1.95 77 200 1.9
Example 18
400 pulse
-200
100 1.97 75 200 1.9
Example 19
400 pulse
-200
100 1.97 75 200 1.9
Example 20
400 pulse
-200
100 1.97 75 200 1.9
Comparative
-- -- -- -- -- -- -- --
Example 1
Comparative
13.56
CW -200
100 1.7 85 200 1.9
Example 2
Comparative
1 CW -200
100 1.8 82 200 1.9
Example 3
Comparative
500 CW -200
100 1.8 81 200 1.9
Example 4
Comparative
20 CW -200
100 1.95 80 200 1.9
Example 5
Comparative
400 -- 0 100 1.85 83 200 1.9
Example 6
Comparative
200 -- 0 100 1.86 82 200 1.9
Example 7
Comparative
100 -- 0 100 1.87 81 200 1.9
Example 8
Comparative
50 -- 0 100 1.88 80 200 1.9
Example 9
Comparative
400 CW -200
20 1.95 77 200 1.9
Example 10
Comparative
400 CW -200
200 1.95 77 200 1.9
Example 11
Comparative
400 CW -200
100 1.95 77 50 1.9
Example 12
Comparative
400 CW -200
100 1.95 77 100 1.9
Example 13
Comparative
400 CW -200
100 1.95 77 200 1.5
Example 14
Comparative
400 CW -200
100 1.95 77 200 1.7
Example 15
Comparative
400 CW -200
100 1.95 77 200 2.0
Example 16
Comparative
400 pulse
-200
100 1.97 75 200 1.9
Example 17
Comparative
Example 18
400 pulse
-200
100 1.97 75 200 1.9
Comparative
-- -- -- -- -- -- -- --
Example 19
Comparative
400 CW -200
100 1.95 77 200 1.9
Example 20
Comparative
200 CW -200
100 1.95 77 200 1.9
Example 21
Comparative
100 CW -200
100 1.95 77 200 1.9
Example 22
Comparative
50 CW -200
100 1.95 77 200 1.9
Example 23
Comparative
400 pulse
-200
100 1.97 75 200 1.9
Example 24
Comparative
200 pulse
-200
100 1.98 75 200 1.9
Example 25
Comparative
100 pulse
-200
100 2.0 74 200 1.9
Example 26
Comparative
50 pulse
-200
100 2.1 73 200 1.9
Example 27
Comparative
400 CW -200
100 1.95 97 --
Example 28
Comparative
-- -- -- -- -- -- 200 1.9
Example 29
__________________________________________________________________________
Durable Electro-
Corrosion
Initial
Friction
Surface
magnetic
Liquid Lubricant
Still
Resistance
Friction
500 passes
Obser-
Charac-
Name of Material
(min)
(%) (.mu.)
(.mu.) vation
teristics
__________________________________________________________________________
Example 1
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 2
polar PFPE
90 3 0.2 0.33 .smallcircle.
.smallcircle.
Example 3
polar PFPE
90 3 0.2 0.32 .smallcircle.
.smallcircle.
Example 4
polar PFPE
90 3 0.2 0.3 .smallcircle.
.smallcircle.
Example 5
polar PFPE
>120
2 0.15
0.28 .smallcircle.
.smallcircle.
Example 6
polar PFPE
>120
2 0.15
0.27 .smallcircle.
.smallcircle.
Example 7
polar PFPE
>120
2 0.15
0,26 .smallcircle.
.smallcircle.
Example 8
polar PFPE
>120
2 0.15
0.25 .smallcircle.
.smallcircle.
Example 9
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 10
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 11
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 12
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 13
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 14
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 15
non-polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 16
PFA 90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 17
phosphazene
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 18
non-polar PFPE
>120
2 0.15
0.28 .smallcircle.
.smallcircle.
Example 19
PFA >120
2 0.15
0.28 .smallcircle.
.smallcircle.
Example 20
phosphazene
>120
2 0.15
0.28 .smallcircle.
.smallcircle.
Comparative
polar PFPE
0.5 25 0.3 0.65 x .smallcircle.
Example 1
Comparative
polar PFPE
1 15 0.5 0.85 x .smallcircle.
Example 2
Comparative
polar PFPE
5 10 0.35
0.8 x .smallcircle.
Example 3
Comparative
polar PFPE
5 10 0.32
0.65 x .smallcircle.
Example 4
Comparative
polar PFPE
5 10 0.3 0.5 .DELTA.
.smallcircle.
Example 5
Comparative
polar PFPE
2 15 0.25
0.8 x .smallcircle.
Example 6
Comparative
polar PFPE
5 15 0.25
0.75 x .smallcircle.
Example 7
Comparative
polar PFPE
15 10 0.25
0.6 .smallcircle.
Example 8
Comparative
polar PFPE
15 10 0.25
0.5 .DELTA.
.smallcircle.
Example 9
Comparative
polar PFPE
5 10 0.2 0.65 x .smallcircle.
Example 10
Comparative
polar PFPE
90 3 0.2 0.34 .smallcircle.
x
Example 11
Comparative
polar PFPE
90 10 0.2 0.65 x .smallcircle.
Example 12
Comparative
polar PFPE
90 10 0.2 0.65 x .smallcircle.
Example 13
Comparative
polar PFPE
10 15 0.2 0.65 x .smallcircle.
Example 14
Comparative
polar PFPE
10 10 0.2 0.65 x .smallcircle.
Example 15
Comparative
polar PFPE
5 15 0.2 0.3 x .smallcircle.
Example 16
Comparative
fatty acid
2 2 0.35
100 passes
x .smallcircle.
Example 17
Comparative
silicone oil
2 2 0.4 100 passes
x .smallcircle.
Example 18
Comparative
-- 0.5 25 0.5 unmeasurable
x .smallcircle.
Example 19
Comparative
-- 30 3 0.3 0.65 x .smallcircle.
Example 20
Comparative
-- 30 3 0.3 0.65 x .smallcircle.
Example 21
Comparative
-- 30 3 0.3 0.6 5 x .smallcircle.
Example 22
Comparative
-- 30 3 0.3 0.65 x .smallcircle.
Example 23
Comparative
-- 30 3 0.3 0.65 x .smallcircle.
Example 24
Comparative
-- 30 3 0.3 0.65 x .smallcircle.
Example 25
Comparative
-- 30 3 0.3 0.5 .DELTA.
.smallcircle.
Example 26
Comparative
-- 30 3 0.3 0.5 .DELTA.
.smallcircle.
Example 27
Comparative
polar PFPE
30 15 0.25
0.34 .smallcircle.
.smallcircle.
Example 28
Comparative
polar PFPE
0.5 15 0.25
0.65 x .smallcircle.
Example 29
__________________________________________________________________________
EXAMPLES 21 TO 42
SiOx (x=1.900) was plasma polymerized using a mixture of tetramethoxysilane
and oxygen at a discharge frequency of 400 kHz to form an undercoat layer
on a polyethylene terephthalate film substrate having a thickness of 7
.mu.m, and an alloy containing 80% by weight of Co and 20% by weight of Ni
was deposited thereon under an oxygen atmosphere to form a ferromagnetic
metal layer (with a film thickness of 1,500 .ANG.). Each of the various
hydrocarbons shown in Tables 2-1 and 2-2 was plasma polymerized to form a
protective layer. Further, using a polar perfluoropolyether (PFPE) as a
liquid lubricant, a lubricating layer was formed.
The film thickness of the SiOx undercoat layers, the kinds of hydrocarbons,
the plasma frequency and the bias on film formation, and the film
thickness, the refractive index and the contact angle of the resulting
protective layers are shown in Tables 2-1 and 2-2. Further, for the
resulting magnetic recording tapes, the still time, the corrosion
resistance, the initial friction, the durable friction, the results of
surface observation and the electromagnetic characteristics are shown in
Tables 2-3 and 2-4.
The film thickness, the refractive index, the composition of SiOx and the
contact angle were measured in the same manner as with Examples 1 to 20.
TABLE 2
__________________________________________________________________________
Undercoat layer
Protective Film (DLC Film) (SiOx)
Plasma Film Film
Frequency Thickness
Raw Mate-
Refract-
Contact
Thickness
Value
(kHz)
Bias
Bias V
(.ANG.)
rial Gas
ive Index
Angle
(.ANG.)
of x
__________________________________________________________________________
Example 21
400 CW -200
100 methane/H2
1.95 77 200 1.9
Example 22
400 pulse
-200
100 methane/H2
1.97 75 200 1.9
Example 23
400 CW -200
100 ethane
1.95 77 200 1.9
Example 24
400 CW -200
100 ethane/H2
1.95 77 200 1.9
Example 25
400 pulse
-200
100 ethane
1.97 75 200 1.9
Example 26
400 pulse
-200
100 ethane/H2
1.97 75 200 1.9
Example 27
400 CW -200
100 propane
1.95 77 200 1.9
Example 28
400 CW -200
100 propane/H2
1.95 77 200 1.9
Example 29
400 pulse
-200
100 propane
1.97 75 200 1.9
Example 30
400 pulse
-200
100 propane/H2
1.97 75 200 1.9
Example 31
400 CW -200
100 butane
1.95 77 200 1.9
Example 32
400 CW -200
100 butane/H2
1.95 77 200 1.9
Example 33
400 pulse
-200
100 butane
1.97 75 200 1.9
Example 34
400 pulse
-200
100 butane/H2
1.97 75 200 1.9
Example 35
400 CW -200
100 ethylene
1.97 76 200 1.9
Example 36
400 CW -200
100 ethylene/H2
1.97 76 200 1.9
Example 37
400 pulse
-200
100 ethylene
2.0 74 200 1.9
Example 38
400 pulse
-200
100 ethylene/H2
2.0 74 200 1.9
Example 39
400 CW -200
100 acetylene
1.97 76 200 1.9
Example 40
400 CW -200
100 acetylene/H2
1.97 76 200 1.9
Example 41
400 pulse
-200
100 acetylene
2.0 74 200 1.9
Example 42
400 pulse
-200
100 acetylene/H2
2.0 74 200 1.9
__________________________________________________________________________
Durable Electro-
Corrosion
Initial
Friction
Surface
magnetic
Liquid Lubricant
Still
Resistance
Friction
500 passes
Obser-
Charac-
Name of Material
(min)
(%) (.mu.)
(.mu.)
vation
teristics
__________________________________________________________________________
Example 21
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 22
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 23
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 24
polar PFPE
90 3 0.2 0.34 .smallcircle.
.smallcircle.
Example 25
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 26
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 27
polar PFPE
90 3 0.21
0.34 .smallcircle.
.smallcircle.
Example 28
polar PFPE
90 3 0.2i
0.34 .smallcircle.
.smallcircle.
Example 29
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 30
polar PFPE
>120 2 0.15
0.28 .smallcircle.
Example 31
polar PFPE
90 3 0.22
0.35 .smallcircle.
.smallcircle.
Example 32
polar PFPE
90 3 0.22
0.34 .smallcircle.
.smallcircle.
Example 33
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 34
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 35
polar PFPE
100 2 0.18
0.3 .smallcircle.
.smallcircle.
Example 36
polar PFPE
100 2 0.19
0.3 .smallcircle.
.smallcircle.
Example 37
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 38
polar PFPE
>120 2 0.15
0.28 .smallcircle.
.smallcircle.
Example 39
polar PFPE
100 3 0.16
0.3 .smallcircle.
.smallcircle.
Example 40
polar PFPE
100 3 0.16
0.3 .smallcircle.
.smallcircle.
Example 41
polar PFPE
>120 2 0.14
0.25 .smallcircle.
.smallcircle.
Example 42
polar PFPE
>120 2 0.14
0.25 .smallcircle.
.smallcircle.
__________________________________________________________________________
EXAMPLE 43 TO 57 AND COMPARATIVE EXAMPLES 30 TO 36
Magnetic recording media were produced in the same manner as with the
above-mentioned Examples, with the exception that CW and a pulse bias were
used as the negative bias, and the pulse frequency Hz, the flow ratio of
CH.sub.4 /H and the pulse ratio ON/OFF were variously changed. The pulse
ratio was changed by setting the ON/OFF time with a setting switch
attached to a power supply.
Results are shown in the following Tables 3-1 to 3-4.
TABLE 3
__________________________________________________________________________
Plasma Flow Pulse
Pulse
Film
Frequency Ratio
Ratio
Frequency
Thickness
Refract-
Contact
(kHz)
Bias
Bias V
(CH.sub.4 /H.sub.2)
(ON/OFF)
Hz (.ANG.)
ive Index
Angle
__________________________________________________________________________
Example 43
400 CW -200
1/3 -- -- 100 1.95 77
Example 44
400 CW -200
1/2 -- -- 100 1.95 77
Example 45
400 CW -200
2/1 -- -- 100 1.95 77
Example 46
400 CW -200
3/1 -- -- 100 1.95 77
Example 47
400 pulse
-200
1/1 1/3 50 100 1.95 79
Example 48
400 pulse
-200
1/1 1/2 50 100 1.95 77
Example 49
400 pulse
-200
1/1 2/1 50 100 1.95 77
Example 50
400 pulse
-200
1/1 3/1 50 100 1.95 77
Example 51
400 pulse
-200
1/1 1/1 10 100 1.95 79
Example 52
400 pulse
-200
1/1 1/1 20 100 1.95 77
Example 53
400 pulse
-200
1/1 1/1 100 100 1.95 77
Example 54
400 pulse
-200
1/1 1/1 200 100 1.95 77
Example 55
400 pulse
-200
1/1 1/1 300 100 1.95 77
Example 56
400 pulse
-200
1/1 1/1 400 100 1.95 77
Example 57
400 pulse
-200
1/1 1/1 500 100 1.95 77
Comparative
400 CW -200
1/4 -- -- 100 1.88 80
Example 30
Comparative
400 CW -200
4/1 -- -- 100 1.9 80
Example 31
Compardtive
400 pulse
-200
1/1 4/1 50 100 1.88 77
Example 32
Comparative
400 pulse
-200
1/1 1/4 50 100 1.85 82
Example 33
Comparative
400 pulse
-200
1/1 1/1 5 100 1.88 80
Example 34
Comparative
400 pulse
-200
1/1 1/1 600 100 1.8 81
Example 35
Comparative
400 pulse
-200
1/1 1/1 1000 100 1.8 81
Example 36
__________________________________________________________________________
Durable
Corrosion
Initial
Friction
Still
Resistance
Friction
500 passes
Surface
Electromagnetic
(min)
(%) (.mu.)
(.mu.) Observation
Characteristics
__________________________________________________________________________
Example 43
90 3 0.25
0.34 .smallcircle.
Example 44
90 3 0.25
0.34 .smallcircle.
.smallcircle.
Example 45
90 3 0.25
0.34 .smallcircle.
.smallcircle.
Example 46
90 3 0.25
0.34 .smallcircle.
.smallcircle.
Example 47
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 48
120 2 0.2 0.34 .smallcircle.
.smallcircle.
Example 49
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 50
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 51
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 52
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 53
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 54
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 55
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 56
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Example 57
120 2 0.2 0.35 .smallcircle.
.smallcircle.
Comparative
10 5 0.3 0.7 x x
Example 30
Comparative
10 10 0.3 0.5 .DELTA.
x
Example 31
Comparative
30 10 0.25
0.55 x x
Example 32
Comparative
5 10 0.3 0.7 x x
Example 33
Comparative
10 5 0.3 0.9 x x
Example 34
Comparative
5 10 0.32
0.6 x x
Example 35
Comparative
5 10 0.32
0.6 x x
Example 36
__________________________________________________________________________
B. Magnetic Recording Media of (2)
EXAMPLES 58 TO 85 AND COMPARATIVE EXAMPLES 37 TO 65
The inside of a chamber was evacuated to 10.sup.-6 Torr, and then
tetramethoxysilane as a raw material and oxygen were introduced thereinto
at a ratio of 1:3, followed by adjustment of the pressure to 10.sup.-2
Torr. Then, an audio frequency of 100 kHz was applied to an electrode to
generate plasma discharges and to plasma polymerize SiOx having each of
the various compositions shown in Tables 4-1 to 4-6, thereby forming an
undercoat layer on a polyethylene terephthalate film substrate having a
thickness of 7 .mu.m. Subsequently, an alloy containing 80% by weight of
Co and 20% by weight of Ni was deposited under an oxygen atmosphere to
form a ferromagnetic metal layer (with a film thickness of 1,500 .ANG.),
and SiOx having each of the various compositions shown in Tables 4-1 to
4-6 was plasma polymerized thereon in a manner similar to that described
above to form a intercepting layer. The x value in the SiOx film was
changed by varying the ratio of oxygen introduced together with the silane
series organic compound.
Then, a protective layer was formed thereon by plasma polymerization using
methane as a hydrocarbon source by use of a DLC film producing apparatus
such as shown in FIG. 1. Namely, the inside of a chamber was evacuated to
10.sup.-6 Torr, and then methane as a raw material and hydrogen were
introduced thereinto at a ratio of 1:1, followed by adjustment of the
pressure to 10.sup.-2 Torr. Thereafter, electromagnetic waves were applied
to electrodes at high frequency to generate plasma discharges. At the same
time, a DC bias was applied connecting as shown in FIG. 1. As the DC bias
on the base side, one having a pulse generation mechanism was used.
The protective layer was further coated by gravure coating with a solution
prepared by dissolving each of the various lubricants shown in Tables 7 to
12 in a solvent, EFL-150 (Daikin Kogyo Co.), in a concentration of 0.3% by
weight, thereby forming a lubricating layer. The film thickness was about
40 .ANG..
S20 (Daikin Kogyo Co.) was used as a non-polar perfluoro-polyether (PFPE),
KF-851 (Shinetsu Kagaku Kogyo Co.) as silicone oil, SAl (Daikin Kogyo Co.)
as a polar PFPE, n-C.sub.10 F.sub.20 COOH as a perfluorocarboxylic acid
(PFA), phosphazene (Idemitsu Sekiyu Kagaku Co.) as a phosphazene, FA108 as
a perfluoroacrylate, and n-C.sub.10 F.sub.20 COOC.sub.10 F.sub.20 as a
perfluoroalkylate. The composition and the film thickness of the SiOx
undercoat layers, the plasma frequency and the bias on film formation of
the hydrogen-containing carbon film protective layers, and the film
thickness, the refractive index and the contact angle of the resulting
protective layers are shown in Tables 4-1 to 4-6. When the pulse bias is
used, the pulse is 50 Hz. Further, for the resulting magnetic recording
tapes, the materials of the lubricating layers, the still time, the
corrosion resistance, the initial friction, the durable friction, the
results of surface observation and the electromagnetic characteristics are
shown in Tables 4-7 to 4-12.
The film thickness and the refractive index were measured by ellipsometry.
The composition of SiOx was measured by ESCA. The contact angle was
measured by a droplet dropping system using a contact angle meter (Kyowa
Kaimen Kagaku Co.). For comparison, protective layers were formed using RF
and 1 MHz.
TABLE 4
__________________________________________________________________________
Intercepting Film
Undercoat layer
Protective Film (DLC Film) (SiOx Film)
(SiOx Film)
Plasma Film Film Film
Fre- Thick-
Refrac- Thick- Thick-
quency Bias
ness
tive
Contact
ness
Value
ness
Value
(kHz)
Bias
V (.ANG.)
Index
Angle
(.ANG.)
of x (.ANG.)
of x
__________________________________________________________________________
Example 58
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 59
200 CW -200
50 1.97
77 50 1.90 200 1.90
Example 60
100 CW -200
50 1.98
76 50 1.90 200 1.90
Example 61
50 CW -200
50 2.0 75 50 1.90 200 1.90
Example 62
400 pulse
-200
50 1.97
75 50 1.90 200 1.90
Example 63
200 pulse
-200
50 1.98
75 50 1.90 200 1.90
Example 64
100 pulse
-200
50 2.0 74 50 1.90 200 1.90
Example 65
50 pulse
-200
50 2.1 73 50 1.90 200 1.90
Example 66
400 CW -200
30 1.95
77 50 1.90 200 1.90
Example 67
400 CW -200
80 1.95
77 50 1.90 200 1.90
Example 68
400 CW -200
50 1.95
77 30 1.90 200 1.90
Example 69
400 CW -200
50 1.95
77 80 1.90 200 1.90
Example 70
400 CW -200
50 1.95
77 50 1.80 200 1.90
Example 71
400 CW -200
50 1.95
77 50 1.95 200 1.90
Example 72
400 CW -200
50 1.95
77 50 1.90 150 1.90
Example 73
400 CW -200
50 1.95
77 50 1.90 150 1.90
Example 74
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 75
400 CW -200
50 1.95
77 50 1.90 200 1.95
Example 76
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 77
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 78
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 79
400 pulse
-200
50 1.97
75 50 1.90 200 1.90
Example 80
400 pulse
-200
50 1.97
75 50 1.90 200 1.90
Example 81
400 pulse
-200
50 1.97
75 50 1.90 200 1.90
Example 82
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 83
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 84
400 CW -200
50 1.95
77 100 1.90 200 1.90
Example 85
400 CW -200
100 1.95
77 50 1.90 200 1.90
Comparative
13.51
CW -200
50 1.70
85 50 1.90 200 1.90
Example 37
Comparative
1 CW -200
50 1.80
82 50 1.90 200 1.90
Example 38
Comparative
500 CW -200
50 1.80
81 50 1.90 200 1.90
Example 39
Comparative
20 CW -200
50 1.95
80 50 1.90 200 1.90
Example 40
Comparative
400 -- 0 50 1.85
83 50 1.90 200 1.90
Example 41
Comparative
200 -- 0 50 1.86
82 50 1.90 200 1.90
Example 42
Comparative
100 -- 0 50 1.87
81 50 1.90 200 1.90
Example 43
Comparative
50 -- 0 50 1.88
80 50 1.90 200 1.90
Example 44
Comparative
400 CW -200
20 1.95
77 50 1.90 200 1.90
Example 45
Comparative
400 CW -200
100 1.95
77 100 1.90 200 1.90
Example 46
Comparative
400 CW -200
50 1.95
77 20 1.90 200 1.90
Example 47
Comparative
400 CW -200
50 1.95
77 50 1.50 200 1.90
Example 48
Comparative
400 CW -2 00
50 1.95
77 50 1.70 200 1.90
Example 49
Comparative
400 CW -200
50 1.95
77 50 2.0 200 1.90
Example 50
Comparative
400 CW -200
50 1.95
77 50 1.90 100 1.90
Example 51
Comparative
400 CW -200
50 1.95
77 50 1.90 200 1.50
Example 52
Comparative
400 CW -200
50 1.95
77 50 1.90 200 1.70
Example 53
Comparative
400 CW -200
50 1.95
77 50 1.90 200 2.00
Example 54
Comparative
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 55
Comparative
400 CW -200
50 1.95
77 50 1.90 200 1.90
Example 56
Comparative
Example 57
Comparative
Example 58
-- -- -- -- -- -- -- -- -- --
Comparative
-- -- -- -- -- -- 50 1.90 200 1.90
Example 59
Comparative
400 CW -200
50 1.95
77 -- -- 200 1.90
Example 60
Comparative
400 CW -200
50 1.95
77 50 1.90
Example 61
Comparative
400 CW -200
50 1.95
77 50 SiO.sub.2
200 1.90
Example 62 deposition
Comparative
400 CW -200
50 1.95
77 50 1.90 200 SiO.sub.2
Example 63 deposition
Comparative
400 CW -200
50 1.95
77 50 SiO.sub.2
200 1.90
Example 64 deposition
Comparative
400 CW -200
50 1.95
77 50 1.90 200 SiO.sub.2
Example 65 deposition
__________________________________________________________________________
Durable
Electro-
Still
Still Corrosion
Initial
Friction
magnetic
Liquid Lubricant
-1 dB
-5 dB
Scratch
Resistance
Friction
200 passes
Charac-
Name of Material
(min)
(min)
(mN)
(%) (.mu.)
(.mu.) teristics
__________________________________________________________________________
Example 58
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 59
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 60
polar PFPE
100 >120
80 1 0.25
0.40 .smallcircle.
Example 61
polar PFPE
100 >120
80 1 0.25
0.40 .smallcircle.
Example 62
polar PFPE
>120
>120
120 1 0.15
0.20 .smallcircle.
Example 63
polar PFPE
>120
>120
120 1 0.15
0.20 .smallcircle.
Example 64
polar PFPE
>120
>120
120 1 0.15
0.20 .smallcircle.
Example 65
polar PFPE
>120
>120
120 1 0.15
0.20 .smallcircle.
Example 66
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 67
polar PFPE
100 >120
80 1 0.25
0.40 .smallcircle.
Example 68
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 69
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 70
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 71
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 72
polar PFPE
70 100 75 5 0.25
0.45 .smallcircle.
Example 73
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 74
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 75
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 76
non-polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 77
PFA 90 120 80 1 0.20
0.40 .smallcircle.
Example 78
phosphazene
90 120 80 1 0.25
0.38 .smallcircle.
Example 79
non-polar PFPE
>120
>120
80 1 0.15
0.20 .smallcircle.
Example 80
PFA >120
>120
80 1 0.15
0.20 .smallcircle.
Example 81
phosphazene
>120
>120
80 1 0.15
0.20 .smallcircle.
Example 82
FA108 90 120 80 1 0.25
0.40 .smallcircle.
Example 83
alkylate
90 120 80 1 0.20
0.40 .smallcircle.
Example 84
polar PFPE
90 120 80 1 0.25
0.40 .smallcircle.
Example 85
polar PFPE
90 >120
80 1 0.25
0.40 .smallcircle.
Comparative
polar PFPE
0.5 1 10 13 0.50
0.85 .smallcircle.
Example 37
Comparative
polar PFPE
3 5 20 10 0.35
0.80 .smallcircle.
Example 38
Comparative
polar PFPE
3 5 25 10 0.32
0.60 .smallcircle.
Example 39
Comparative
polar PFPE
3 5 20 10 0.30
0.50 .smallcircle.
Example 40
Comparative
polar PFPE
1 2 15 12 0.35
0.80 .smallcircle.
Example 41
Comparative
polar PFPE
3 5 20 10 0.30
0.50 .smallcircle.
Example 42
Comparative
polar PFPE
3 5 20 10 0.30
0.50 .smallcircle.
Example 43
Comparative
polar PFPE
3 5 20 10 0.30
0.50 .smallcircle.
Example 44
Comparative
polar PFPE
3 5 20 10 0.35
0.60 .smallcircle.
Example 45
Comparative
polar PFPE
100 >120
80 1 0.25
0.40 x
Example 46
Comparative
polar PFPE
30 45 40 5 0.25
0.60 .smallcircle.
Example 47
Comparative
polar PFPE
3 5 20 12 0.25
0.60 .smallcircle.
Example 48
Comparative
polar PFPE
3 5 25 11 0.25
0.50 .smallcircle.
Example 49
Comparative
polar PFPE
1 2 15 15 0.25
0.65 .smallcircle.
Example 50
Comparative
polar PFPE
30 45 35 17 0.25
0.55 .smallcircle.
Example 51
Comparative
polar PFPE
5 10 20 17 0.25
0.65 .smallcircle.
Example 52
Comparative
polar PFPE
5 10 25 15 0.25
0.60 .smallcircle.
Example 53
Comparative
polar PFPE
3 5 20 17 0.25
0.80 .smallcircle.
Example 54
Comparative
fatty acid
1 2 80 1 0.35
100 passes
.smallcircle.
Example 55 stop
Comparative
silicone oil
1 2 80 1 0.40
100 passes
.smallcircle.
Example 56 stop
Comparative
-- 0.5 0.5 -- 25 0.50
unmeasurable
.smallcircle.
Example 57
Comparative
polar PFPE
0.5 0.5 -- 25 0.30
0.60 .smallcircle.
Example 58
Comparative
polar PFPE
3 5 20 10 0.30
0.50 .smallcircle.
Example 59
Comparative
polar PFPE
3 5 20 5 0.30
0.50 .smallcircle.
Example 60
Comparative
polar PFPE
30 45 20 10 0.25
0.60 .smallcircle.
Example 61
Comparative
polar PFPE
5 20 20 10 0.30
100 passes
.smallcircle.
Example 62 stop
Comparative
polar PFPE
5 20 20 10 0.30
100 passes
.smallcircle.
Example 63 stop
Comparative
polar PFPE
10 30 20 10 0.30
150 passes
.smallcircle.
Example 64 stop
Comparative
polar PFPE
10 30 20 10 0.30
150 passes
.smallcircle.
Example 65 stop
__________________________________________________________________________
EXAMPLES 86 TO 107
SiOx (x=1.900) was plasma polymerized using a mixture of tetramethoxysilane
and oxygen at a discharge frequency of 400 kHz to form an undercoat layer
on a polyethylene terephthalate film substrate having a thickness of 71
.mu.m, and an alloy containing 80% by weight of Co and 20% by weight of Ni
was deposited thereon under an oxygen atmosphere to form a ferromagnetic
metal layer (with a film thickness of 1,500 .ANG.). Then, SiOx (x=1.900)
was plasma polymerized to form an intercepting layer, and each of the
various hydrocarbons shown in Tables 5-1 and 5-2 was plasma polymerized
thereon to form a protective layer. Further, using a polar
perfluoropolyether (PFPE) as a liquid lubricant, a lubricating layer was
formed. The film thickness of the intercepting layers, the kinds of
hydrocarbons, the plasma frequency and the bias on film formation, and the
film thickness, the refractive index and the contact angle of the
resulting protective layers are shown in Tables 5-1 and 5-2, and the film
thickness of the SiOx undercoat layers is shown in Tables 5-3 and 5-4.
Further, for the resulting magnetic recording tapes, the still time, the
corrosion resistance, the initial friction, the durable friction and the
results of surface observation are shown in Tables 5-3 and 5-4.
The film thickness, the refractive index, the composition of SiOx and the
contact angle were measured in the same manner as with Examples 38 to 61.
TABLE 5
__________________________________________________________________________
Intercepting
Protective Film (DLC Film) Film (SiOx)
Plasma Film Film
Frequency Thickness
Refrac-
Contact
Raw Mate-
Thickness
Value
(kHz)
Bias
Bias V
(.ANG.)
tive Index
Angle
rial Gas
(.ANG.)
of x
__________________________________________________________________________
Example 86
400 CW -200
50 1.95 77 methane/H2
50 1.90
Example 87
400 pulse
-200
50 1.97 75 methane/H2
50 1.90
Example 88
400 CW -200
50 1.95 77 ethane
50. 1.90
Example 89
400 CW -200
50 1.95 77 ethane/H2
50 1.90
Example 90
400 pulse
-200
50 1.97 75 ethane
50 1.90
Example 91
400 pulse
-200
50 1.97 75 ethane/H2
50 1.90
Example 92
400 CW -200
50 1.95 77 propane
50 1.90
Example 93
400 CW -200
50 1.95 77 propane/H2
50 1.90
Example 94
400 pulse
-200
50 1.97 75 propane
50 1.90
Example 95
400 pulse
-200
50 1.97 75 propane/H2
50 1.90
Example 96
400 CW -200
50 1.95 77 butane
50 1.90
Example 97
400 CW -200
50 1.95 77 butane/H2
50 1.90
Example 98
400 pulse
-200
50 1.97 75 butane
50 1.90
Example 99
400 pulse
-200
50 1.99 75 butane/H2
50 1.90
Example 100
400 CW -200
50 1.97 76 ethylene
50 1.90
Example 101
400 CW -200
50 1.97 76 ethylene/H2
50 1.90
Example 102
400 pulse
-200
50 2.0 74 ethylene
50 1.90
Example 103
400 pulse
-200
50 2.0 74 ethylene/H2
50 1.90
Example 104
400 CW -200
50 1.97 76 acetylene
50 1.90
Example 105
400 CW -200
50 1.97 76 acetylene/H2
50 1.90
Example 106
400 pulse
-200
50 2.0 74 acetylene
50 1.90
Example 107
400 pulse
-200
50 2.0 74 acetylene/H2
50 1.90
__________________________________________________________________________
Undercoat
layer (SiOx) Corro-
Film sion Durable
Thick- Still
Still Resis-
Initial
Friction
ness
Value
Liquid Lubricant
-1 dB
-5 dB
Scratch
tance
Friction
200 passes
(.ANG.)
of x
Name of Material
(min)
(min)
(mN)
(%) (.mu.)
.mu.)
__________________________________________________________________________
Example 86
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 87
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 88
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 89
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 90
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 91
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 92
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 93
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 94
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 95
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 96
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 97
200 1.90
polar PFPE
100
>120
80 1 0.15
0.20
Example 98
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 99
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 100
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 101
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 102
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 103
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 104
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 105
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 106
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
Example 107
200 1.90
polar PFPE
>120
>120
80 1 0.15
0.20
__________________________________________________________________________
EXAMPLES 108 TO 122 AND COMPARATIVE EXAMPLES 66 TO 72
Magnetic recording media were produced in the same manner as with the
above-mentioned Examples, with the exception that CW and a pulse bias were
used as the negative bias, and the pulse frequency Hz, the flow ratio of
CH.sub.4 /H and the pulse ratio ON/OFF were variously changed. The pulse
ratio was changed by setting the ON/OFF time with a setting switch
attached to a power supply.
Results are shown in the following Tables 6-1 to 6-4.
TABLE 6
__________________________________________________________________________
Plasma Flow Pulse
Pulse
Film
Frequency Ratio
Ratio
Frequency
Thickness
Refract-
Contact
(kHz)
Bias
Bias V
(CH.sub.4 /H.sub.2)
(ON/OFF)
Hz (.ANG.)
ive Index
Angle
__________________________________________________________________________
Example 108
400 CW -200
1/3 -- -- 50 1.95 77
Example 109
400 CW -200
1/2 -- -- 50 1.95 77
Example 110
400 CW -200
2/1 -- -- 50 1.95 77
Example 111
400 CW -200
3/1 -- -- 50 1.95 77
Example 112
400 pulse
-200
1/1 1/3 50 50 1.95 77
Example 113
400 pulse
-200
1/1 1/2 50 50 1.95 77
Example 114
400 pulse
-200
1/1 2/1 50 50 1.95 77
Example 115
400 pulse
-200
1/1 3/1 50 50 1.95 77
Example 116
400 pulse
-200
1/1 1/1 10 50 1.95 77
Example 119
400 pulse
-200
1/1 1/1 20 50 1.95 77
Example 118
400 pulse
-200
1/1 1/1 100 50 1.95 77
Example 119
400 pulse
-200
1/1 1/1 200 50 1.95 77
Example 120
400 pulse
-200
1/1 1/1 300 50 1.95 77
Ekample 121
400 pulse
-200
1/1 1/1 400 50 1.95 77
Example 122
400 pulse
-200
1/1 1/1 500 50 1.95 77
Comparative
400 CW -200
1/4 -- -- 50 1.88 80
Example 66
Comparative
400 CW -200
4/1 -- -- 50 1.9 80
Example 67
Comparative
400 pulse
-200
1/1 4/1 50 50 1.88 77
Example 68
Comparative
400 pulse
-200
1/1 1/4 50 50 1.85 82
Example 69
Comparative
400 pulse
-200
1/1 1/1 5 50 1.88 80
Example 70
Comparative
400 pulse
-200
1/1 1/1 600 50 1.8 81
Example 71
Comparative
400 pulse
-200
1/1 1/1 1000 50 1.8 81
Example 72
__________________________________________________________________________
Durable
Still Still
Corrosion
Initial
Friction
-1 dB -5 dB
Resistance
Friction
200 passes
Scratch
Electromagnetic
(min) (min)
(%) (.mu.)
(.mu.) (mN)
Characteristics
__________________________________________________________________________
Example 108
120 90 3 0.25
0.34 80 .smallcircle.
Example 109
120 90 3 0.25
0.34 80 .smallcircle.
Example 110
120 90 3 0.25
0.34 80 .smallcircle.
Example 111
120 90 3 0.25
0.34 80 .smallcircle.
Example 112
>120 120 2 0.2 0.35 90 .smallcircle.
Example 113
>120 120 2 0.2 0.34 100 .smallcircle.
Example 114
>120 120 2 0.2 0.35 120 .smallcircle.
Example 115
>120 120 2 0.2 0.35 120 .smallcircle.
Example 116
>120 120 2 0.2 0.35 90 .smallcircle.
Example 117
>120 120 2 0.2 0.35 100 .smallcircle.
Example 118
>120 120 2 0.2 0.35 120 .smallcircle.
Example 119
>120 120 2 0.2 0.35 120 .smallcircle.
Example 120
>120 120 2 0.2 0.35 120 .smallcircle.
Example 121
>120 120 2 0.2 0.35 120 .smallcircle.
Example 122
>120 120 2 0.2 0.35 120 .smallcircle.
Comparative
30 10 5 0.3 0.7 25 x
Example 66
Comparative
30 10 10 0.3 0.5 25 x
Example 67
Comparative
10 30 10 0.25
0.55 25 x
Example 68
Comparative
30 5 10 0.3 0.7 20 x
Example 69
Comparative
20 10 5 0.3 0.7 20 x
Example 70
Comparative
20 5 10 0.32
0.6 20 x
Example 71
Comparative
20 5 10 0.32
0.6 20 x
Example 72
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In the magnetic recording medium of the present invention having the
ferromagnetic metal layer serving as the magnetic layer, the specified
silicon oxide films are used as the undercoat layer and the insulating
layer for the magnetic layer, the plasma-polymerized hydrogen-containing
carbon film, plasma polymerized under the specified applying conditions
and having the specified characteristics, is used as the protective layer,
and the lubricating layer is formed of the specified fluorine compound,
thereby providing the magnetic recording medium with excellent
electromagnetic characteristics, corrosion resistance, durability,
abrasion resistance and lubricity.
By the combination of the foregoing and the contact angle of the
protective, as formed, being less than 80.degree., as set forth in the
following claims, the present invention has excellent effect in the still
durability. This is shown in Table 1, especially Tables 1-6 to 1-10, and
Comparative Examples 2 to 9. In addition to the still durability, the
present invention has better effect in initial friction and durable
friction as compared to a magnetic recording tape whose contact angle is
80.degree. or more, as shown in Comparative Examples 2 to 9.
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