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United States Patent 5,677,051
Ueda ,   et al. October 14, 1997

Magnetic recording medium having a specified plasma polymerized hydrogen containing carbon film and lubricant

Abstract

A magnetic recording medium possessing excellent electromagnetic characteristics, corrosion resistance, durability, abrasion resistance and lubricity, has an undercoat layer, a ferromagnetic metal layer, a protective layer and a lubricating layer formed in this order on a non-magnetic substrate, or has an undercoat layer, a ferromagnetic metal layer, an intercepting layer, a protective layer and a lubricating layer formed in this order on a non-magnetic substrate, wherein the protective layer is a plasma-polymerized hydrogen-containing carbon film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, the film thickness of the protective layer or the total film thickness of the protective layer and the intercepting layer is 30 to 150 .ANG., the undercoat layer, as well as the intercepting layer, is a film formed of silicon oxide represented by SiOx (x=1.8-1.95), and the lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; and a method for producing the recording medium.


Inventors: Ueda; Kunihiro (Saku, JP); Nakayama; Masatoshi (Sakura, JP); Yazu; Kiyoshi (Hodonoharano-machi, JP); Kobayashi; Koji (Miyota-machi, JP); Kanazawa; Hiromichi (Saku, JP)
Assignee: TDK Corporation (Tokyo, JP)
Appl. No.: 651902
Filed: May 21, 1996
Foreign Application Priority Data

Nov 30, 1993[JP]5-299682
Nov 30, 1993[JP]5-299683

Current U.S. Class: 428/336; 427/122; 427/131; 427/249.7; 427/479; 427/488; 427/489; 427/577; 427/578; 427/585; 427/906; 428/408; 428/422; 428/446; 428/457; 428/835.2; 428/900
Intern'l Class: G11B 005/66
Field of Search: 428/336,408,446,457,694 TZ,694 TC,900,422,694 TF 427/122,131,249,577,578,585


References Cited
U.S. Patent Documents
4693799Sep., 1987Yanagihara et al.204/165.
4892789Jan., 1990Nakayama et al.428/336.
4925733May., 1990Imataki et al.428/336.
5073785Dec., 1991Jansen et al.346/1.
5182132Jan., 1993Murai et al.427/577.
5232791Aug., 1993Kohler et al.428/694.
5266409Nov., 1993Schmidt et al.428/446.
5275850Jan., 1994Kitoh et al.427/577.
5320875Jun., 1994Hu et al.427/493.
5330852Jul., 1994Gerstenberg et al.428/694.
5352493Oct., 1994Dorfman et al.427/530.
5543203Aug., 1996Tani et al.428/156.
Foreign Patent Documents
57-135443Aug., 1982JP.
57-164432Oct., 1982JP.
3-53691Aug., 1991JP.
4-341918Nov., 1992JP.
5-20663Jan., 1993JP.
5-33456May., 1993JP.


Other References

McGraw-Hill Encyclopedia of Science & Technology, 7th. edition, McGraw-Hill, Inc., New York, 1992.
Van Nostrand's Scientific Encyclopedia, 8th. edition, Van Nostrand Reinhold, New York, 1995.
Dictionary of Physics, edited by John Daintith, Barnes & Noble Books, 1981.

Primary Examiner: Resan; Stevan A.
Attorney, Agent or Firm: Yee; Stephen F. K.

Parent Case Text



CROSS REFERENCE TO RELATED APPLICATION

This application is a continuation-in-part of application Ser. No. 08/350,070, filed on Nov. 29, 1994 now abandoned.
Claims



What is claimed is:

1. A magnetic recording medium comprising a non-magnetic substrate, an undercoat layer, a ferromagnetic metal layer, a protective layer and a lubricating layer formed in this order on the substrate, wherein the protective layer is a plasma-polymerized hydrogen-containing carbon film having, as formed, a refractive index of 1.90 or more, a film thickness of 30 to 150 .ANG. and a contact angle with ion exchanged water of less than 80 degrees, the undercoat layer is a film formed of silicon oxide represented by SiOx (x=1.8-1.95), and the lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds.

2. A magnetic recording medium comprising a non-magnetic substrate, an undercoat layer, a ferromagnetic metal layer, an intercepting layer, a protective layer and a lubricating layer formed in this order on the substrate, wherein the protective layer is a plasma-polymerized hydrogen-containing carbon film (DLC film) having, as formed, a refractive index of 1.90 or more and a contact angle with ion exchanged water of less than 80 degrees, the undercoat layer and the intercepting layer are films formed of silicon oxide represented by SiOx (x=1.8-1.95), the total film thickness of the protective layer and the intercepting layer is 30 to 150 .ANG., and the lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds.

3. The magnetic recording medium according to claim 1 or 2, wherein the ferromagnetic metal layer is formed by vapor deposition.

4. A method for producing a magnetic recording medium according to claim 1 which comprises forming an undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic metal layer thereon in a vapor phase, then plasma polymerizing a hydrocarbon gas and hydrogen at a frequency of 50 kHz to 450 kHz while applying a negative bias to a base side to form a protective layer of a hydrogen-containing carbon film having, as formed, a refractive index of 1.90 or more, a contact angle with ion exchanged water of less than 80 degrees and a film thickness of 30 to 150 .ANG., and finally forming a lubricating layer of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds.

5. A method for producing a magnetic recording medium according to claim 2 which comprises forming an undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic metal layer thereon in a vapor phase, forming an intercepting layer of a film formed of silicon oxide represented by SiOx (x=1.8-1.95) by plasma polymerization, then plasma polymerizing a hydrocarbon gas and hydrogen at a frequency of 50 kHz to 450 kHz while applying a negative bias to a base side to form a protective layer of a hydrogen-containing carbon film having, as formed, a refractive index of 1.90 or more and a contact angle with ion exchanged water of less than 80 degrees, adjusting the total film thickness of the protective layer and the intercepting layer to 30 to 150 .ANG., and finally forming a lubricating layer of a compound selected from the group consisting of polar perfluoro-polyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds.

6. The method according to claim 4 or 5, wherein the negative bias is a pulse bias, the pulse duty factor (ON/OFF ratio) is 0.3 to 3, and the frequency is 10 Hz to 500 Hz.

7. The method according to claim 4 or 5, wherein the formation of the ferromagnetic metal layer in the vapor phase is by vapor deposition.
Description



BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a magnetic recording medium and a method for producing the same, and more particularly to a magnetic recording medium in which a ferromagnetic metal layer serves as a magnetic layer, the ferromagnetic metal layer having improved corrosion resistance, durability, abrasion resistance and lubricity, and a method for its production.

2. Background Art

Magnetic recording media in which ferromagnetic metal layers serve as magnetic layers have excellent characteristics, such as high saturation magnetic flux density and coercive force.

Previously, various magnetic recording media and methods for their production have been proposed to improve the corrosion resistance, durability, abrasion resistance and lubricity of the magnetic recording media in which the ferromagnetic metal layers serve as the magnetic layers.

For example, Japanese Patent Unexamined Publication No. 4-341918 discloses a magnetic recording medium in which a ferromagnetic metal thin film serves as a magnetic layer, the magnetic recording medium comprising a non-magnetic resin substrate, an undercoat layer, a ferromagnetic metal film and a topcoat layer, the undercoat layer and the topcoat layer each containing C and H, and being plasma-polymerized films having a refractive index of 1.8 or more. Japanese Patent Unexamined Publication No. 5-20663 discloses a magnetic recording medium in which the undercoat layer is a plasma-polymerized film containing Si or Si and 0, and the topcoat layer is a plasma-polymerized film containing C and H. Japanese Patent Examined Publication No. 5-33456 discloses a magnetic recording medium comprising a substrate, a magnetic layer formed on the substrate and a protective layer formed on the magnetic layer, the protective layer comprising a hard carbon layer and a fluorine-containing lubricating oil layer. Japanese Patent Unexamined Publication No. 57-135443 discloses a magnetic recording medium in which a vapor stream of a magnetic substance is obliquely incident on a surface of a substrate to deposit a magnetic thin film, and immediately thereafter an organic substance is plasma polymerized on the deposited magnetic film to provide an overcoat thin-film layer. Japanese Patent Unexamined Publication No. 57-164432 discloses a magnetic recording medium in which an organic polymer layer is formed on an oblique deposition type metal magnetic layer and a higher fatty acid or ester layer is formed thereon, the organic polymer layer and the higher fatty acid or ester layer each being formed by vacuum deposition, ion plating, sputtering or plasma polymerization. Japanese Patent Examined Publication No. 3-53691 discloses a magnetic recording medium in which a surface of a magnetic layer is coated with a plasma-polymerized thin film having siloxane bonds and a thickness of 5 to 1000 .ANG..

However, for the prior-an magnetic recording media described in Japanese Patent Unexamined Publication Nos. 4-341918 and 5-20663, the protective layers have insufficient adhesive property and corrosion resistance. Further, the magnetic recording medium described in Japanese Patent Examined Publication No. 5-33456 has the disadvantage of rusting because of lack of an undercoat layer. The magnetic recording medium described in Japanese Patent Unexamined Publication No. 57-135443 in which the organic substance is plasma polymerized on the magnetic layer, and the magnetic recording medium described in Japanese Patent Unexamined Publication No. 57-164432 in which the higher fatty acid or ester is plasma polymerized on the magnetic layer are also not sufficient in corrosion resistance, lubricity and abrasion resistance. Furthermore, the magnetic recording medium described in Japanese Patent Examined Publication No. 3-53691 (Japanese Patent No. 1687307), in which the magnetic layer is coated with the plasma-polymerized film having siloxane bonds, has no undercoat layer, resulting in formation of rust, and is also poor in abrasion resistance.

Accordingly, a magnetic recording medium having a combination of corrosion resistance, abrasion resistance, friction resistance, durability and lubricity is desirable.

SUMMARY OF THE INVENTION

In order to solve the above-mentioned problem, the present inventors have conducted intensive investigations, and as a result have discovered that the problems can be solved (1) when a magnetic recording medium structurally comprises an SiOx film, a magnetic layer, a protective layer of a diamond like carbon (DLC) film, and further a lubricating layer, all formed on a substrate, said DLC film forming the protective layer being a plasma-polymerized hydrogen-containing carbon film having a specified refractive index and contact angle and formed by applying a negative bias to a base to adjust the frequency (audio frequency, or AF) on the electrode side to a specified value, said lubricating layer being formed of a specified fluorine compound, and (2) when a magnetic recording medium structurally comprises an SiOx film, a magnetic layer, an SiOx film, a protective layer (DLC film) and further a lubricating layer, all formed on a substrate, said DLC film forming the protective layer being a plasma-polymerized hydrogen-containing carbon film having a specified refractive index and contact angle and formed by applying a negative bias to a base to adjust the frequency (AF) on the electrode side to a specified value, said lubricating layer being formed of a specified fluorine compound, thus completing the present invention.

The present invention provides: (1) a magnetic recording medium comprising an undercoat layer, a ferromagnetic metal layer, a protective layer and a lubricating layer, all formed on a non-magnetic substrate in this order, wherein said protective layer is a plasma-polymerized hydrogen-containing carbon film (DLC film) having a refractive index of 1.90 or more, a film thickness of 30 to 150 .ANG. and a contact angle of less than 80 degrees, said undercoat layer is a film formed of silicon oxide represented by SiOx (x=1.8-1.95), and said lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; (2) a magnetic recording medium comprising an undercoat layer, a ferromagnetic metal layer, an intercepting layer, a protective layer and a lubricating layer formed on a non-magnetic substrate in this order, wherein said protective layer is a plasma-polymerized hydrogen-containing carbon film (DLC film) having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, said undercoat layer and said intercepting layer are films formed of silicon oxide represented by SiOx (x=1.8-1.95), the total film thickness of said protective layer and said intercepting layer is 30 to 150 .ANG. and said lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; (3) the magnetic recording medium described in (1) or (2) above, wherein said ferromagnetic metal layer is formed by vapor deposition; (4) a method for producing the magnetic recording medium described in (1) above which comprises forming an undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic metal layer thereon in a vapor phase, then plasma polymerizing a hydrocarbon gas and hydrogen at a frequency of 50 kHz to 450 kHz while applying a negative bias to a base side to form a protective layer of a hydrogen-containing carbon film having a refractive index of 1.90 or more, a contact angle of less than 80 degrees and a film thickness of 30 to 150 .ANG. and finally forming a lubricating layer of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; (5) a method for producing the magnetic recording medium described in (2) above which comprises forming an undercoat layer of silicon oxide represented by SiOx (x=1.8-1.95) on a non-magnetic substrate, forming a ferromagnetic metal layer thereon in a vapor phase, forming an intercepting layer of a film formed of silicon oxide represented by SiOx (x=1.8-1.95) by plasma polymerization, then plasma polymerizing a hydrocarbon gas and hydrogen at a frequency of 50 kHz to 450 kHz while applying a negative bias to a base side to form a protective layer of a hydrogen-containing carbon film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, adjusting the total film thickness of the protective layer and the intercepting layer to 30 to 150 .ANG., and finally forming a lubricating layer of a compound selected from the group consisting of polar perfluoro-polyethers, non-polar perfluoropolyethers, perfluoro-carboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; (6) the method described in (4) or (5) above, wherein the negative bias is a pulse bias, the pulse duty factor (ON/OFF ratio) is 0.3 to 3, and the frequency is 10 Hz to 500 Hz; and (7) the method described in (4) or (5) above, wherein the formation of the ferromagnetic metal layer in the vapor phase is by vapor deposition.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic side view showing an apparatus for producing a DLC film used in the present invention. In the figure, the reference numeral 1 designates electrodes, the reference numeral 2 designates a rotating drum, the reference numerals 3 and 4 designate guide rolls, respectively, the reference numeral 5 designates a tape take-up roll, the reference numeral 6 designates a tape unwinding roll, and the reference numeral 7 designates a power supply for a DC bias.

FIG. 2 is a schematic, to an enlarged scale, of a water droplet on a surface, showing how the contact angle (.theta.) is determined.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the present invention, the plasma-polymerized hydrogen-containing carbon film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees is used as the protective layer, said film being formed by plasma polymerization by applying an audio frequency (AF) of 50 kHz to 450 kHz to the electrode side and a negative bias to the base side.

The plasma polymerization can be achieved by any known methods, for example the method described in Japanese Patent Examined Publication No. 3-53691. A vacuum chamber in which electrodes are arranged is evacuated to 10.sup.-6 Torr, and specific amounts of a raw material gas and hydrogen gas are introduced thereinto by use of a mass flow controller. After maintenance at a specified pressure, an electrical discharge is generated with an AF power supply, and the speed of a running system of a tape is controlled to give a required film thickness. In preparing the DLC film, a DC bias is applied to an electrode on the base side. Then, the vacuum is broken, and the resulting sample on which a polymerized film is formed is taken out.

As the raw materials for the plasma-polymerized hydrogen-containing carbon film forming the protective layer, various gases containing carbon and hydrogen can be used. Usually, one or more of methane, ethane, propane, butane, pentane, ethylene, propylene, butene, butadiene, acetylene, methylacetylene, and other saturated and unsaturated hydrocarbons which are gaseous at ordinary temperatures are used as carbon and hydrogen sources because of their good operability.

When the hydrocarbon gas is plasma polymerized, an audio frequency of 50 kHz to 450 kHz is applied. An audio frequency of less than 50 kHz approaches direct current (DC) in properties. Hence, discharges become unstable as the films are overlapped on the periphery according to long-term operation, which causes abnormal film quality. In addition, great damage due to ions causes damaged properties of the tape. Further, an audio frequency exceeding 450 kHz causes sluggish movement of ions, resulting in soft film quality. The resulting film is therefore poor in durability.

As to the negative bias, a negative potential is applied by DC. A pulse bias is preferably used. As the bias, there also is radio frequency (RF) bias. However, although the RF bias produces a negative potential, the negative potential is partially reversed to a positive potential. Accordingly, a completely negative potential is not necessarily obtained. Experiments show that this case was little different in properties from the case when no bias was applied.

Even when the DC bias is merely applied, the effect is manifested. However, when the DC bias is further pulsed, the sufficient bias effect is obtained even through an insulator for further improvement.

The pulse duty factor (ON/OFF ratio) is preferably 0.3 to 3. A pulse duty factor of less than 0.3 causes unstable discharges, and a pulse duty factor exceeding 3 results in no difference from the case when the DC is applied as a continuous wave (CW). The pulse duty factor is further desirably about 0.8 to 1.5.

Further, the frequency is preferably 10 Hz to 500 Hz. If the frequency is less than 10 Hz, the bias applying effect is not obtained. If the frequency exceeds 500 Hz, the film is not hardened because of its high-frequency behavior.

The refractive index of the plasma-polymerized hydrogen-containing carbon film in the present invention is 1.9 or more. A refractive index of less than 1.9 results in a significant decrease in durability and also deterioration of keeping characteristics. This is because the film hardness is lowered and a decrease in film density allows water to easily pass through the film. The reason for this is that the increased content of hydrogen in the film makes it impossible to form a cross-linked structure.

The plasma-polymerized hydrogen-containing carbon film of the magnetic recording medium of (1) mentioned above of the present invention has a film thickness of 30 to 150 .ANG.. If the film thickness is less than 30 .ANG., the effect is not manifested. If the film thickness exceeds 150 .ANG., the electromagnetic characteristics of the deposited tape itself is affected because of the great spacing loss. Further, the contact angle thereof is less than 80 degrees. If the contact angle shows a value of 80 degrees or more, the still characteristics (durability) is not improved because of insufficient production of C.dbd.C on a surface of the film. With respect to such a film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, the methyl-methylene absorption appearing at 2,900 cm.sup.-1 in Fourier transform infrared (FTIR) spectroscopy is little observed.

The total film thickness of the plasma-polymerized hydrogen-containing carbon film and the intercepting layer of the magnetic recording medium of (2) mentioned above of the present invention is 30 to 150 .ANG.. If the film thickness is less than 30 .ANG., the effect is not manifested. If the film thickness exceeds 150 .ANG., the electromagnetic characteristics of the deposited tape itself are affected because of the great spacing loss. Further, the contact angle thereof is less than 80 degrees. If the contact angle shows a value of 80 degrees or more, the still characteristics are not improved because of insufficient production of C.dbd.C on a surface of the film. With respect to such a film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, the methyl-methylene absorption appearing at 2,900 cm.sup.-1 in FTIR is little observed.

The undercoat layer of the magnetic recording medium of (1) mentioned above is a film formed of silicon oxide represented by SiOx (X=1.8-1.95). In silicon oxide wherein x is less than 1.8, carbon is left in the film, so that the density is not increased. Hence, the water-intercepting property is not manifested. Silicon oxide wherein x exceeds 1.95 is also insufficient in water-intercepting property to function properly as a water-intercepting layer. By the use of electron spectroscopy for chemical analysis (ESCA), it has been determined that the film formed of silicon oxide wherein x is less than 1.8 contains 15 atomic % of unreacted carbon atoms based on all atoms, whereas the film formed of silicon oxide wherein x is 1.8 or more contains less than 1 atomic % of unreacted carbon atoms because the reaction proceeds sufficiently. It becomes clear that the carbon content has a significant effect on water-intercepting property.

The undercoat layer and the intercepting layer of the magnetic recording medium of (2) mentioned above are films formed of silicon oxide represented by SiOx (x=1.8-1.95). In silicon oxide wherein x is less than 1.8, carbon is left in the film, so that the density is not increased. Hence, the water-intercepting property is not manifested. Silicon oxide wherein x exceeds 1.95 is also insufficient in water-intercepting property to function properly as a water-intercepting layer. By the use of electron spectroscopy for chemical analysis (ESCA), it has been determined that the film formed of silicon oxide wherein x is less than 1.8 contains 15 atomic % of unreacted carbon atoms based on all atoms, whereas the film formed of silicon oxide wherein x is 1.8 or more contains less than 1 atomic % of unreacted carbon atoms because the reaction proceeds sufficiently. It becomes clear that the carbon content has a significant effect on water-intercepting property.

The film formed of silicon oxide represented by SiOx (x=1.8-1.95) is prepared by evacuating a vacuum chamber to 10.sup.-6 Torr, then introducing specific amounts of a raw material gas and oxygen gas thereinto by use of a mass flow controller, and generating plasma with an AF power supply. In the case of the DLC film, a DC bias is applied. For the SiOx film, however, such bias is not particularly necessary though it may be applied, with the proviso that the introducing flow ratio of the raw material silane series gas to the oxygen gas (Si/O.sub.2) is required to be 1/3. If the oxygen flow rate is less than this ratio, the film formed of silicon oxide wherein x is 1.8 or more can not be obtained.

The silane series gases used as the raw materials include silane, trimethylsilane, tetramethylsilane, trimethoxysilane, tetramethoxysilane and tetraethoxysilane. From the viewpoint of handling, the materials which are liquid under the standard conditions of 0.degree. C. and 1 atm. are easily handled. As to the boiling point, the materials having a boiling point of about 100.degree. C. are easily handled. The liquid raw materials may be supplied through a mass flow controller by use of a commercial liquid feeder.

The lubricating layer is formed by applying a solution of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds in a solvent. Usually, there is no particular restriction on coating methods, as long as they are methods used for coating of the magnetic recording media, such as gravure coating, reverse coating and die nozzle coating. The concentration of the lubricant based on the solvent is adjusted to within 1 to 0.1% by weight.

Examples of the polar perfluoropolyethers include Crylocks (E. I. Du Pont), Z-DOL, AM2001 (Monte Dison) and SA1, SY3 (Daikin Kogyo Co.). Examples of the non-polar perfluoro-polyethers include S20 (Daikin Kogyo Co.), examples of the perfluorocarboxylic acids include n-C.sub.m F.sub.l COOH (m=7-10,l=14-21), examples of the perfluoroalkylates include FA108 (Kyoeisha Yushikagaku Kogyo Co.), and examples of the perfluoro-acrylate compounds include n-C.sub.m F.sub.l COOC.sub.p F.sub.q (p=7-10,q=14-21, m and l are as defined above).

As the solvents, flon solvents such as L-90, and tributylamine solvents such as EFL-150 (Daikin Kogyo Co.) are used.

Compounds other than these lubricants, for example, saturated carboxylic acids such as stearic acid and myristic acid and silicone oil, do not give the effect. Fluorine lubricants having low surface energy are preferred for the magnetic metal layers.

As the non-magnetic substrates, various usual films are used, as long as they resist heat on vapor deposition of the ferromagnetic metal thin films. Examples of such films include films of polyesters, polyimides, aramides, polysulfones, polyether ether ketone (PEEK). Films of polyethylene terephthalate (PET) and polyethylene naphthalate (PEN) are used.

Metals such as Fe, Co and Ni and various alloys thereof are used in the ferromagnetic metal layers. Co or alloys mainly composed of Co are preferred. The alloys mainly composed of Co include Co--Ni, Co--Fe, Co--Cr, Co--Ni--Cr, Co--Pt--Cr, Co--Cu, Co--Sm and Co--P. The Co--Ni alloys are preferably used, and alloys containing about 80% or more of Co and less than 20% of Ni in molar ratio are particularly preferred. These ferromagnetic metal thin layers are formed by metal thin layer forming methods such as vacuum deposition, ion plating and sputtering. Deposition is preferably used, and oblique deposition is particularly preferred. Oxidative gases such as oxygen may be introduced during formation of the films. The thickness of the magnetic layer is 500 to 3000 .ANG., and preferably 1500 to 2000 .ANG..

In the magnetic recording medium having the ferromagnetic metal layer serving as the magnetic layer, (i) the undercoat layer on the ferromagnetic metal layer is the film formed of silicon oxide represented by SiOx (x=1.8-1.95), and the protective layer is the plasma-polymerized hydrogen-containing carbon film having a refractive index of 1.90 or more, a film thickness of 30 to 150 .ANG. and a contact angle of less than 80 degrees, which is prepared by plasma polymerization while applying an audio frequency of 50 kHz to 450 kHz to the electrode side and a negative bias to the base side; or (ii) the undercoat layer and the intercepting layer on the ferromagnetic metal layer are the films formed of silicon oxide represented by SiOx (x=1.8-1.95), the protective layer is the plasma-polymerized hydrogen-containing carbon film having a refractive index of 1.90 or more and a contact angle of less than 80 degrees, which is prepared by plasma polymerization while applying an audio frequency of 50 kHz to 450 kHz to the electrode side and a negative bias to the base side, and the total thickness of the protective layer and the intercepting layer is 30 to 150 .ANG.; and the lubricating layer is formed of a compound selected from the group consisting of polar perfluoropolyethers, non-polar perfluoropolyethers, perfluorocarboxylic acids, phosphazens, perfluoroalkylates and perfluoroacrylate compounds; whereby the excellent characteristics of the magnetic recording medium having the ferromagnetic metal layer serving as the magnetic layer are maintained, and the corrosion resistance, durability, abrasion resistance and lubricity thereof are improved.

As used herein, the term "contact angle" has the same meaning as commonly used and understood in the art. Definitions can be found, for example, in McGraw-Hill Encyclopedia of Science & Technology, 7th. edition, McGraw-Hill, Inc., New York, 1992, Van Nostrand's Scientific Encyclopedia, 8th. edition, Van Nostrand Reinhold, New York, 1995, and the Dictionary of Physics, edited by John Daintith, Barnes & Noble Books, 1981.

In the wetting or nonwetting of solids by liquids, the usual criterion is the contact angle between the solid and the liquid, as measured through the liquid. When a liquid wets the surface well, i.e., good adhesion, the contact angle is an acute angle, between 0 to 90.degree., and when the liquid does not wet the surface well, i.e., low adhesion, the contact angle is an obtuse angle, greater than 90.degree.. Since an object of the present invention is to provide a magnetic recording medium having improved corrosion resistance by preventing, with a protective layer, the penetration to the magnetic layer of corrosion-causing liquid, the "wetting" of the surface of the protective layer as indicated by the contact angle being less than 80.degree., is a useful gauge of the adhesiveness of the protective layer as formed for the overlying lubricating layer which is applied thereto, and the adhesiveness of the protective layer to the underlying magnetic layer, or to the intermediate layer in the alternate embodiment. Thus, with a contact angle less than 80.degree., the protective layer as formed adheres well to the underlying magnetic film layer or intermediate layer, and provides good adhesiveness for the overlying lubricating layer.

The value of the contact angle depends on the various conditions for forming the protective layer on the magnetic recording tape by plasma polymerization of hydrocarbon gas and hydrogen gas. These conditions include plasma frequency, the use of pulse bias or continuous wave (CW), pulse duty factor and the voltage of the minus bias. In order to obtain a smaller value of contact angle (less than 80.degree.), the following conditions are selected: (1) lower plasma frequency; (2) employment of a pulse bias rather than CW; (3) pulse duty factor between 0.3 and 3; and (4) a larger minus bias value number.

The apparatus used for measuring the contact angle is a contact angle meter, available commercially from Kyowa Kaimen Kagaku Co., Japan. In use, a sample of magnetic recording tape is place on a vertically-adjustable sample stand, with the protective layer of the tape facing upwardly. Ion-exchanged water is dropped from an injector of the apparatus to make a droplet approximately 2 mm in diameter. The water droplet is formed on the tape sample by raising and lowering the sample stand as necessary.

FIG. 2 shows how the contact angle is determined. A water droplet D has been formed on a solid surface S, such as the surface of a protective layer of DLC film. The contact angle theta (.theta.) is measured with respect to a tangent line at the interface between the water droplet, the surface of the solid, and the surrounding atmosphere, and is determined as follows:

.theta.=2(.theta..sub.1)

.theta.=-2 tan.sup.1 (h/b)

where b=1/2 the base B of the water droplet

h=height of the water droplet

The pulse duty factor is the ratio of the time the pulse electric power is applied (ON) to the time the power is not applied (OFF). Generally, when pulse electric power is used, power is applied at a constant interval.

A discharge gives various species. Since a discharge by pulse is intermittent, plasma growth is limited. As a result, plasma is a group of species which have small distribution, is formed under pulse conditions. A film which is made from such plasma is homogeneous. Control of the pulse duty factor between 0.3 and 3 makes the contact angle less than 80.degree..

The film thickness and refractive index are measured by ellipsometry, a common technique for determining the properties of a material from the characteristics of polarized light reflected from its surface. When the electromagnetic waves comprising the light are reflected from the surface of the material, the amplitude of the reflected wave depends upon the properties of the material, the angle of incidence and the polarization of the wave. Further information on ellipsometry, and the procedures and apparatuses involved, can be found in most technical reference publications, such as McGraw-Hill Encyclopedia of Science & Technology and Van Nostrand's Scientific Encyclopedia, both cited above.

The composition of the SiOx film can be determined by electron spectroscopy for chemical analysis, or ESCA, also a known analytic technique. Electron spectroscopy is the study of the energy spectra of photoelectron or Auger electrons emitted from a substance upon bombardment by electromagnetic radiation, electrons, or ions, and is commonly used to investigate atomic, molecular or solid-state structure, and in chemical analysis. ESCA, also sometimes known as x-ray photoelectron spectroscopy, is a form of electron spectroscopy in which a sample is irradiated with a beam of monochromatic x-rays and the energies of the resulting photoelectrons are measured. Additional details on ESCA, and its use to determining chemical composition, can be found in most technical reference publications, such as the McGraw-Hill Encyclopedia of Science & Technology, cited above, Volume 6.

The present invention is described further with reference to the following examples. The characteristics of the magnetic recording tapes were measured as follows:

(1) Still Durability

A signal at 7 MHz was recorded under conditions of 40.degree. C. and 20% relative humidity (RH), and the time required until its output reached -5 dB was measured.

(2) Corrosion Resistance

Each sample was kept under conditions of 60.degree. C. and 90% RH for 1 week, and the reduction rate in saturation magnetic flux density was measured.

(3) Initial Friction

The friction coefficient at the first pass was measured with a commercially-available 180-degree pin friction tester.

(4) Durable Friction

The friction coefficient at the 500th pass was measured with a 180-degree pin friction tester.

(5) Surface Observation

The surface condition of each sample after 200 passes was observed under an optical microscope to examine the extent of surface scratching. No scratch is indicated by .largecircle., 1 to 5 scratches by .DELTA., and 6 scratches or more by X.

(6) Electromagnetic Characteristics

When the output at 7 MHz in Comparative Example 1 given below was taken as 0 dB, a difference in output between the sample in Comparative Example 1 and each sample of less than 2 dB is indicated by .largecircle., and a difference of 2 dB or more by X.

A. Magnetic Recording Media of (1)

EXAMPLES 1 TO 20 AND COMPARATIVE EXAMPLES 1 TO 29

The inside of a chamber was evacuated to 10.sup.-6 Torr, and then tetramethoxysilane as a raw material and oxygen were introduced thereinto at a ratio of 1:3, followed by adjustment of the pressure to 10.sup.-2 Torr. Then, an audio frequency of 100 kHz was applied to an electrode to generate plasma discharges and to plasma polymerize SiOx having each of the various compositions shown in Tables 1-1 to 1-5, thereby forming an undercoat layer on a polyethylene terephthalate film substrate having a thickness of 7 .mu.m. The x value in the SiOx film was changed by varying the ratio of oxygen introduced together with the silane series organic compound.

Subsequently, an alloy containing 80% by weight of Co and 20% by weight of Ni was deposited under an oxygen atmosphere to form a ferromagnetic metal layer (with a film thickness of 1,500 .ANG.). A protective layer was formed thereon by plasma polymerization using methane as a hydrocarbon source by use of a DLC film producing apparatus such as shown in FIG. 1. Namely, the inside of a chamber was evacuated to 10.sup.-6 Torr, and then methane as a raw material and hydrogen were introduced thereinto at a ratio of 1:1, followed by adjustment of the pressure to 10.sup.-2 Torr. Then, electromagnetic waves were applied to electrodes at high frequency to generate plasma discharges. At the same time, a DC bias was applied with the connections as shown in FIG. 1.

The protective layer was further coated by gravure coating with a solution prepared by dissolving each of the various lubricants shown in Tables 1-6 to 1-10 in a solvent, EFL-150 (Daikin Kogyo Co.), in a concentration of 0.3% by weight. The film thickness was about 40 .ANG.. As the DC bias on the base side, one having a pulse generation mechanism was used.

S20 (Daikin Kogyo Co.) was used as a non-polar perfluoro-polyether (PFPE), KF-851 (Shinetsu Kagaku kogyo Co.) as silicone oil, SAl (Daikin Kogyo Co.) as a polar PFPE, n-C.sub.10 F.sub.20 COOH as a perfluorocarboxylic acid (PFA), phosphazene (Idemitsu Sekiyu Kagaku Co.) as a phosphazene, FA108 (Kyoeisha Yushikagaku Kogyo Co.) as a perfluoroacrylate, and n-C.sub.10 F.sub.20 COOC.sub.10 F.sub.20 as a perfluoroalkylate to form a lubricating layer.

The composition and the film thickness of the SiOx undercoat layers, the plasma frequency and the bias on film formation of the plasma-polymerized hydrogen-containing carbon film protective layers, and the film thickness, the refractive index and the contact angle of the resulting protective layers are shown in Tables 1-1 to 1-5. When the pulse bias is used, the pulse is 50 Hz. Further, for the resulting magnetic recording tapes, the materials of the lubricating layers, the still time, the corrosion resistance, the initial friction, the durable friction, the results of surface observation and the electromagnetic characteristics are shown in Tables 1-6 to 1-10.

The film thickness and the refractive index were measured by ellipsometry. The composition of SiOx was measured by ESCA. The contact angle was measured by a droplet dropping system using a contact angle meter (Kyowa Kaimen Kagaku Co.). For comparison, protective layers were formed using RF (radio frequency: 13.56 MHz) and 1 MHz.

                                      TABLE 1
    __________________________________________________________________________
    Protective Film (DLC Film)      Undercoat layer (SiOx)
          Plasma      Film          Film
          Frequency   Thickness
                           Refractive
                                Contact
                                    Thickness
                                          Value
          (kHz)
               Bias
                  Bias V
                      (.ANG.)
                           Index
                                Angle
                                    (.ANG.)
                                          of x
    __________________________________________________________________________
    Example 1
          400  CW -200
                      100  1.95 77  200   1.9
    Example 2
          200  CW -200
                      100  1.97 77  200   1.9
    Example 3
          100  CW -200
                      100  1.98 76  200   1.9
    Example 4
           50  CW -200
                      100  2.0  75  200   1.9
    Example 5
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Example 6
          200  pulse
                  -200
                      100  1.98 75  200   1.9
    Example 7
          100  Pulse
                  -200
                      100  2.0  74  200   1.9
    Example 8
           50  pulse
                  -200
                      100  2.1  73  200   1.9
    Example 9
          400  CW -200
                       30  1.95 77  200   1.9
    Example 10
          400  CW -200
                       50  1.95 77  200   1.9
    Example 11
          400  CW -200
                      150  1.95 77  200   1.9
    Example 12
          400  CW -200
                      100  1.95 77  300   1.9
    Example 13
          400  CW -200
                      100  1.95 77  200   1.8
    Example 14
          400  CW -200
                      100  1.95 77  200   1.95
    Example 15
          400  CW -200
                      100  1.95 77  200   1.9
    Exdmple 16
          400  CW -200
                      100  1.95 77  200   1.9
    Example 17
          400  CW -200
                      100  1.95 77  200   1.9
    Example 18
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Example 19
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Example 20
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Comparative
          --   -- --  --   --   --  --    --
    Example 1
    Comparative
          13.56
               CW -200
                      100  1.7  85  200   1.9
    Example 2
    Comparative
          1    CW -200
                      100  1.8  82  200   1.9
    Example 3
    Comparative
          500  CW -200
                      100  1.8  81  200   1.9
    Example 4
    Comparative
          20   CW -200
                      100  1.95 80  200   1.9
    Example 5
    Comparative
          400  --   0 100  1.85 83  200   1.9
    Example 6
    Comparative
          200  --   0 100  1.86 82  200   1.9
    Example 7
    Comparative
          100  --   0 100  1.87 81  200   1.9
    Example 8
    Comparative
          50   --   0 100  1.88 80  200   1.9
    Example 9
    Comparative
          400  CW -200
                       20  1.95 77  200   1.9
    Example 10
    Comparative
          400  CW -200
                      200  1.95 77  200   1.9
    Example 11
    Comparative
          400  CW -200
                      100  1.95 77   50   1.9
    Example 12
    Comparative
          400  CW -200
                      100  1.95 77  100   1.9
    Example 13
    Comparative
          400  CW -200
                      100  1.95 77  200   1.5
    Example 14
    Comparative
          400  CW -200
                      100  1.95 77  200   1.7
    Example 15
    Comparative
          400  CW -200
                      100  1.95 77  200   2.0
    Example 16
    Comparative
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Example 17
    Comparative
    Example 18
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Comparative
          --   -- --  --   --   --  --    --
    Example 19
    Comparative
          400  CW -200
                      100  1.95 77  200   1.9
    Example 20
    Comparative
          200  CW -200
                      100  1.95 77  200   1.9
    Example 21
    Comparative
          100  CW -200
                      100  1.95 77  200   1.9
    Example 22
    Comparative
          50   CW -200
                      100  1.95 77  200   1.9
    Example 23
    Comparative
          400  pulse
                  -200
                      100  1.97 75  200   1.9
    Example 24
    Comparative
          200  pulse
                  -200
                      100  1.98 75  200   1.9
    Example 25
    Comparative
          100  pulse
                  -200
                      100  2.0  74  200   1.9
    Example 26
    Comparative
          50   pulse
                  -200
                      100  2.1  73  200   1.9
    Example 27
    Comparative
          400  CW -200
                      100  1.95 97  --
    Example 28
    Comparative
          --   -- --  --   --   --  200   1.9
    Example 29
    __________________________________________________________________________
                               Durable    Electro-
                      Corrosion
                           Initial
                               Friction
                                      Surface
                                          magnetic
          Liquid Lubricant
                  Still
                      Resistance
                           Friction
                               500 passes
                                      Obser-
                                          Charac-
          Name of Material
                  (min)
                      (%)  (.mu.)
                               (.mu.) vation
                                          teristics
    __________________________________________________________________________
    Example 1
          polar PFPE
                  90  3    0.2 0.34   .smallcircle.
                                          .smallcircle.
    Example 2
          polar PFPE
                  90  3    0.2 0.33   .smallcircle.
                                          .smallcircle.
    Example 3
          polar PFPE
                  90  3    0.2 0.32   .smallcircle.
                                          .smallcircle.
    Example 4
          polar PFPE
                  90  3    0.2 0.3    .smallcircle.
                                          .smallcircle.
    Example 5
          polar PFPE
                  >120
                      2    0.15
                               0.28   .smallcircle.
                                          .smallcircle.
    Example 6
          polar PFPE
                  >120
                      2    0.15
                               0.27   .smallcircle.
                                          .smallcircle.
    Example 7
          polar PFPE
                  >120
                      2    0.15
                               0,26   .smallcircle.
                                          .smallcircle.
    Example 8
          polar PFPE
                  >120
                      2    0.15
                               0.25   .smallcircle.


.smallcircle. Example 9 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 10 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 11 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 12 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 13 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 14 polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 15 non-polar PFPE 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 16 PFA 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 17 phosphazene 90 3 0.2 0.34 .smallcircle. .smallcircle. Example 18 non-polar PFPE >120 2 0.15 0.28 .smallcircle. .smallcircle. Example 19 PFA >120 2 0.15 0.28 .smallcircle. .smallcircle. Example 20 phosphazene >120 2 0.15 0.28 .smallcircle. .smallcircle. Comparative polar PFPE 0.5 25 0.3 0.65 x .smallcircle. Example 1 Comparative polar PFPE 1 15 0.5 0.85 x .smallcircle. Example 2 Comparative polar PFPE 5 10 0.35 0.8 x .smallcircle. Example 3 Comparative polar PFPE 5 10 0.32 0.65 x .smallcircle. Example 4 Comparative polar PFPE 5 10 0.3 0.5 .DELTA. .smallcircle. Example 5 Comparative polar PFPE 2 15 0.25 0.8 x .smallcircle. Example 6 Comparative polar PFPE 5 15 0.25 0.75 x .smallcircle. Example 7 Comparative polar PFPE 15 10 0.25 0.6 .smallcircle. Example 8 Comparative polar PFPE 15 10 0.25 0.5 .DELTA. .smallcircle. Example 9 Comparative polar PFPE 5 10 0.2 0.65 x .smallcircle. Example 10 Comparative polar PFPE 90 3 0.2 0.34 .smallcircle. x Example 11 Comparative polar PFPE 90 10 0.2 0.65 x .smallcircle. Example 12 Comparative polar PFPE 90 10 0.2 0.65 x .smallcircle. Example 13 Comparative polar PFPE 10 15 0.2 0.65 x .smallcircle. Example 14 Comparative polar PFPE 10 10 0.2 0.65 x .smallcircle. Example 15 Comparative polar PFPE 5 15 0.2 0.3 x .smallcircle. Example 16 Comparative fatty acid 2 2 0.35 100 passes x .smallcircle. Example 17 Comparative silicone oil 2 2 0.4 100 passes x .smallcircle. Example 18 Comparative -- 0.5 25 0.5 unmeasurable x .smallcircle. Example 19 Comparative -- 30 3 0.3 0.65 x .smallcircle. Example 20 Comparative -- 30 3 0.3 0.65 x .smallcircle. Example 21 Comparative -- 30 3 0.3 0.6 5 x .smallcircle. Example 22 Comparative -- 30 3 0.3 0.65 x .smallcircle. Example 23 Comparative -- 30 3 0.3 0.65 x .smallcircle. Example 24 Comparative -- 30 3 0.3 0.65 x .smallcircle. Example 25 Comparative -- 30 3 0.3 0.5 .DELTA. .smallcircle. Example 26 Comparative -- 30 3 0.3 0.5 .DELTA. .smallcircle. Example 27 Comparative polar PFPE 30 15 0.25 0.34 .smallcircle. .smallcircle. Example 28 Comparative polar PFPE 0.5 15 0.25 0.65 x .smallcircle. Example 29 __________________________________________________________________________


EXAMPLES 21 TO 42

SiOx (x=1.900) was plasma polymerized using a mixture of tetramethoxysilane and oxygen at a discharge frequency of 400 kHz to form an undercoat layer on a polyethylene terephthalate film substrate having a thickness of 7 .mu.m, and an alloy containing 80% by weight of Co and 20% by weight of Ni was deposited thereon under an oxygen atmosphere to form a ferromagnetic metal layer (with a film thickness of 1,500 .ANG.). Each of the various hydrocarbons shown in Tables 2-1 and 2-2 was plasma polymerized to form a protective layer. Further, using a polar perfluoropolyether (PFPE) as a liquid lubricant, a lubricating layer was formed.

The film thickness of the SiOx undercoat layers, the kinds of hydrocarbons, the plasma frequency and the bias on film formation, and the film thickness, the refractive index and the contact angle of the resulting protective layers are shown in Tables 2-1 and 2-2. Further, for the resulting magnetic recording tapes, the still time, the corrosion resistance, the initial friction, the durable friction, the results of surface observation and the electromagnetic characteristics are shown in Tables 2-3 and 2-4.

The film thickness, the refractive index, the composition of SiOx and the contact angle were measured in the same manner as with Examples 1 to 20.

                                      TABLE 2
    __________________________________________________________________________
                                          Undercoat layer
    Protective Film (DLC Film)            (SiOx)
          Plasma      Film                Film
          Frequency   Thickness
                           Raw Mate-
                                 Refract-
                                      Contact
                                          Thickness
                                               Value
          (kHz)
               Bias
                  Bias V
                      (.ANG.)
                           rial Gas
                                 ive Index
                                      Angle
                                          (.ANG.)
                                               of x
    __________________________________________________________________________
    Example 21
          400  CW -200
                      100  methane/H2
                                 1.95 77  200  1.9
    Example 22
          400  pulse
                  -200
                      100  methane/H2
                                 1.97 75  200  1.9
    Example 23
          400  CW -200
                      100  ethane
                                 1.95 77  200  1.9
    Example 24
          400  CW -200
                      100  ethane/H2
                                 1.95 77  200  1.9
    Example 25
          400  pulse
                  -200
                      100  ethane
                                 1.97 75  200  1.9
    Example 26
          400  pulse
                  -200
                      100  ethane/H2
                                 1.97 75  200  1.9
    Example 27
          400  CW -200
                      100  propane
                                 1.95 77  200  1.9
    Example 28
          400  CW -200
                      100  propane/H2
                                 1.95 77  200  1.9
    Example 29
          400  pulse
                  -200
                      100  propane
                                 1.97 75  200  1.9
    Example 30
          400  pulse
                  -200
                      100  propane/H2
                                 1.97 75  200  1.9
    Example 31
          400  CW -200
                      100  butane
                                 1.95 77  200  1.9
    Example 32
          400  CW -200
                      100  butane/H2
                                 1.95 77  200  1.9
    Example 33
          400  pulse
                  -200
                      100  butane
                                 1.97 75  200  1.9
    Example 34
          400  pulse
                  -200
                      100  butane/H2
                                 1.97 75  200  1.9
    Example 35
          400  CW -200
                      100  ethylene
                                 1.97 76  200  1.9
    Example 36
          400  CW -200
                      100  ethylene/H2
                                 1.97 76  200  1.9
    Example 37
          400  pulse
                  -200
                      100  ethylene
                                 2.0  74  200  1.9
    Example 38
          400  pulse
                  -200
                      100  ethylene/H2
                                 2.0  74  200  1.9
    Example 39
          400  CW -200
                      100  acetylene
                                 1.97 76  200  1.9
    Example 40
          400  CW -200
                      100  acetylene/H2
                                 1.97 76  200  1.9
    Example 41
          400  pulse
                  -200
                      100  acetylene
                                 2.0  74  200  1.9
    Example 42
          400  pulse
                  -200
                      100  acetylene/H2
                                 2.0  74  200  1.9
    __________________________________________________________________________
                                  Durable   Electro-
                        Corrosion
                              Initial
                                  Friction
                                        Surface
                                            magnetic
          Liquid Lubricant
                   Still
                        Resistance
                              Friction
                                  500 passes
                                        Obser-
                                            Charac-
          Name of Material
                   (min)
                        (%)   (.mu.)
                                  (.mu.)
                                        vation
                                            teristics
    __________________________________________________________________________
    Example 21
          polar PFPE
                     90 3     0.2 0.34  .smallcircle.
                                            .smallcircle.
    Example 22
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 23
          polar PFPE
                     90 3     0.2 0.34  .smallcircle.
                                            .smallcircle.
    Example 24
          polar PFPE
                     90 3     0.2 0.34  .smallcircle.
                                            .smallcircle.
    Example 25
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 26
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 27
          polar PFPE
                     90 3     0.21
                                  0.34  .smallcircle.
                                            .smallcircle.
    Example 28
          polar PFPE
                     90 3     0.2i
                                  0.34  .smallcircle.
                                            .smallcircle.
    Example 29
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 30
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
    Example 31
          polar PFPE
                     90 3     0.22
                                  0.35  .smallcircle.
                                            .smallcircle.
    Example 32
          polar PFPE
                     90 3     0.22
                                  0.34  .smallcircle.
                                            .smallcircle.
    Example 33
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 34
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 35
          polar PFPE
                    100 2     0.18
                                  0.3   .smallcircle.
                                            .smallcircle.
    Example 36
          polar PFPE
                    100 2     0.19
                                  0.3   .smallcircle.
                                            .smallcircle.
    Example 37
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 38
          polar PFPE
                   >120 2     0.15
                                  0.28  .smallcircle.
                                            .smallcircle.
    Example 39
          polar PFPE
                    100 3     0.16
                                  0.3   .smallcircle.
                                            .smallcircle.
    Example 40
          polar PFPE
                    100 3     0.16
                                  0.3   .smallcircle.
                                            .smallcircle.
    Example 41
          polar PFPE
                   >120 2     0.14
                                  0.25  .smallcircle.
                                            .smallcircle.
    Example 42
          polar PFPE
                   >120 2     0.14
                                  0.25  .smallcircle.
                                            .smallcircle.
    __________________________________________________________________________


EXAMPLE 43 TO 57 AND COMPARATIVE EXAMPLES 30 TO 36

Magnetic recording media were produced in the same manner as with the above-mentioned Examples, with the exception that CW and a pulse bias were used as the negative bias, and the pulse frequency Hz, the flow ratio of CH.sub.4 /H and the pulse ratio ON/OFF were variously changed. The pulse ratio was changed by setting the ON/OFF time with a setting switch attached to a power supply.

Results are shown in the following Tables 3-1 to 3-4.

                                      TABLE 3
    __________________________________________________________________________
          Plasma      Flow Pulse
                                Pulse
                                     Film
          Frequency   Ratio
                           Ratio
                                Frequency
                                     Thickness
                                          Refract-
                                               Contact
          (kHz)
               Bias
                  Bias V
                      (CH.sub.4 /H.sub.2)
                           (ON/OFF)
                                Hz   (.ANG.)
                                          ive Index
                                               Angle
    __________________________________________________________________________
    Example 43
          400  CW -200
                      1/3  --   --   100  1.95 77
    Example 44
          400  CW -200
                      1/2  --   --   100  1.95 77
    Example 45
          400  CW -200
                      2/1  --   --   100  1.95 77
    Example 46
          400  CW -200
                      3/1  --   --   100  1.95 77
    Example 47
          400  pulse
                  -200
                      1/1  1/3   50  100  1.95 79
    Example 48
          400  pulse
                  -200
                      1/1  1/2   50  100  1.95 77
    Example 49
          400  pulse
                  -200
                      1/1  2/1   50  100  1.95 77
    Example 50
          400  pulse
                  -200
                      1/1  3/1   50  100  1.95 77
    Example 51
          400  pulse
                  -200
                      1/1  1/1   10  100  1.95 79
    Example 52
          400  pulse
                  -200
                      1/1  1/1   20  100  1.95 77
    Example 53
          400  pulse
                  -200
                      1/1  1/1  100  100  1.95 77
    Example 54
          400  pulse
                  -200
                      1/1  1/1  200  100  1.95 77
    Example 55
          400  pulse
                  -200
                      1/1  1/1  300  100  1.95 77
    Example 56
          400  pulse
                  -200
                      1/1  1/1  400  100  1.95 77
    Example 57
          400  pulse
                  -200
                      1/1  1/1  500  100  1.95 77
    Comparative
          400  CW -200
                      1/4  --   --   100  1.88 80
    Example 30
    Comparative
          400  CW -200
                      4/1  --   --   100  1.9  80
    Example 31
    Compardtive
          400  pulse
                  -200
                      1/1  4/1   50  100  1.88 77
    Example 32
    Comparative
          400  pulse
                  -200
                      1/1  1/4   50  100  1.85 82
    Example 33
    Comparative
          400  pulse
                  -200
                      1/1  1/1   5   100  1.88 80
    Example 34
    Comparative
          400  pulse
                  -200
                      1/1  1/1  600  100  1.8  81
    Example 35
    Comparative
          400  pulse
                  -200
                      1/1  1/1  1000 100  1.8  81
    Example 36
    __________________________________________________________________________
                          Durable
               Corrosion
                      Initial
                          Friction
           Still
               Resistance
                      Friction
                          500 passes
                                   Surface
                                         Electromagnetic
           (min)
               (%)    (.mu.)
                          (.mu.)   Observation
                                         Characteristics
    __________________________________________________________________________
    Example 43
            90 3      0.25
                          0.34     .smallcircle.
    Example 44
            90 3      0.25
                          0.34     .smallcircle.
                                         .smallcircle.
    Example 45
            90 3      0.25
                          0.34     .smallcircle.
                                         .smallcircle.
    Example 46
            90 3      0.25
                          0.34     .smallcircle.
                                         .smallcircle.
    Example 47
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 48
           120 2      0.2 0.34     .smallcircle.
                                         .smallcircle.
    Example 49
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 50
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 51
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 52
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 53
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 54
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 55
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 56
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Example 57
           120 2      0.2 0.35     .smallcircle.
                                         .smallcircle.
    Comparative
            10 5      0.3 0.7      x     x
    Example 30
    Comparative
            10 10     0.3 0.5      .DELTA.
                                         x
    Example 31
    Comparative
            30 10     0.25
                          0.55     x     x
    Example 32
    Comparative
            5  10     0.3 0.7      x     x
    Example 33
    Comparative
            10 5      0.3 0.9      x     x
    Example 34
    Comparative
            5  10     0.32
                          0.6      x     x
    Example 35
    Comparative
            5  10     0.32
                          0.6      x     x
    Example 36
    __________________________________________________________________________


B. Magnetic Recording Media of (2)

EXAMPLES 58 TO 85 AND COMPARATIVE EXAMPLES 37 TO 65

The inside of a chamber was evacuated to 10.sup.-6 Torr, and then tetramethoxysilane as a raw material and oxygen were introduced thereinto at a ratio of 1:3, followed by adjustment of the pressure to 10.sup.-2 Torr. Then, an audio frequency of 100 kHz was applied to an electrode to generate plasma discharges and to plasma polymerize SiOx having each of the various compositions shown in Tables 4-1 to 4-6, thereby forming an undercoat layer on a polyethylene terephthalate film substrate having a thickness of 7 .mu.m. Subsequently, an alloy containing 80% by weight of Co and 20% by weight of Ni was deposited under an oxygen atmosphere to form a ferromagnetic metal layer (with a film thickness of 1,500 .ANG.), and SiOx having each of the various compositions shown in Tables 4-1 to 4-6 was plasma polymerized thereon in a manner similar to that described above to form a intercepting layer. The x value in the SiOx film was changed by varying the ratio of oxygen introduced together with the silane series organic compound.

Then, a protective layer was formed thereon by plasma polymerization using methane as a hydrocarbon source by use of a DLC film producing apparatus such as shown in FIG. 1. Namely, the inside of a chamber was evacuated to 10.sup.-6 Torr, and then methane as a raw material and hydrogen were introduced thereinto at a ratio of 1:1, followed by adjustment of the pressure to 10.sup.-2 Torr. Thereafter, electromagnetic waves were applied to electrodes at high frequency to generate plasma discharges. At the same time, a DC bias was applied connecting as shown in FIG. 1. As the DC bias on the base side, one having a pulse generation mechanism was used.

The protective layer was further coated by gravure coating with a solution prepared by dissolving each of the various lubricants shown in Tables 7 to 12 in a solvent, EFL-150 (Daikin Kogyo Co.), in a concentration of 0.3% by weight, thereby forming a lubricating layer. The film thickness was about 40 .ANG..

S20 (Daikin Kogyo Co.) was used as a non-polar perfluoro-polyether (PFPE), KF-851 (Shinetsu Kagaku Kogyo Co.) as silicone oil, SAl (Daikin Kogyo Co.) as a polar PFPE, n-C.sub.10 F.sub.20 COOH as a perfluorocarboxylic acid (PFA), phosphazene (Idemitsu Sekiyu Kagaku Co.) as a phosphazene, FA108 as a perfluoroacrylate, and n-C.sub.10 F.sub.20 COOC.sub.10 F.sub.20 as a perfluoroalkylate. The composition and the film thickness of the SiOx undercoat layers, the plasma frequency and the bias on film formation of the hydrogen-containing carbon film protective layers, and the film thickness, the refractive index and the contact angle of the resulting protective layers are shown in Tables 4-1 to 4-6. When the pulse bias is used, the pulse is 50 Hz. Further, for the resulting magnetic recording tapes, the materials of the lubricating layers, the still time, the corrosion resistance, the initial friction, the durable friction, the results of surface observation and the electromagnetic characteristics are shown in Tables 4-7 to 4-12.

The film thickness and the refractive index were measured by ellipsometry. The composition of SiOx was measured by ESCA. The contact angle was measured by a droplet dropping system using a contact angle meter (Kyowa Kaimen Kagaku Co.). For comparison, protective layers were formed using RF and 1 MHz.

                                      TABLE 4
    __________________________________________________________________________
                                 Intercepting Film
                                          Undercoat layer
    Protective Film (DLC Film)   (SiOx Film)
                                          (SiOx Film)
          Plasma     Film        Film     Film
          Fre-       Thick-
                         Refrac- Thick-   Thick-
          quency Bias
                     ness
                         tive
                             Contact
                                 ness
                                     Value
                                          ness
                                              Value
          (kHz)
              Bias
                 V   (.ANG.)
                         Index
                             Angle
                                 (.ANG.)
                                     of x (.ANG.)
                                              of x
    __________________________________________________________________________
    Example 58
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 59
          200 CW -200
                     50  1.97
                             77  50  1.90 200 1.90
    Example 60
          100 CW -200
                     50  1.98
                             76  50  1.90 200 1.90
    Example 61
          50  CW -200
                     50  2.0 75  50  1.90 200 1.90
    Example 62
          400 pulse
                 -200
                     50  1.97
                             75  50  1.90 200 1.90
    Example 63
          200 pulse
                 -200
                     50  1.98
                             75  50  1.90 200 1.90
    Example 64
          100 pulse
                 -200
                     50  2.0 74  50  1.90 200 1.90
    Example 65
          50  pulse
                 -200
                     50  2.1 73  50  1.90 200 1.90
    Example 66
          400 CW -200
                     30  1.95
                             77  50  1.90 200 1.90
    Example 67
          400 CW -200
                     80  1.95
                             77  50  1.90 200 1.90
    Example 68
          400 CW -200
                     50  1.95
                             77  30  1.90 200 1.90
    Example 69
          400 CW -200
                     50  1.95
                             77  80  1.90 200 1.90
    Example 70
          400 CW -200
                     50  1.95
                             77  50  1.80 200 1.90
    Example 71
          400 CW -200
                     50  1.95
                             77  50  1.95 200 1.90
    Example 72
          400 CW -200
                     50  1.95
                             77  50  1.90 150 1.90
    Example 73
          400 CW -200
                     50  1.95
                             77  50  1.90 150 1.90
    Example 74
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 75
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.95
    Example 76
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 77
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 78
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 79
          400 pulse
                 -200
                     50  1.97
                             75  50  1.90 200 1.90
    Example 80
          400 pulse
                 -200
                     50  1.97
                             75  50  1.90 200 1.90
    Example 81
          400 pulse
                 -200
                     50  1.97
                             75  50  1.90 200 1.90
    Example 82
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 83
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 84
          400 CW -200
                     50  1.95
                             77  100 1.90 200 1.90
    Example 85
          400 CW -200
                     100 1.95
                             77  50  1.90 200 1.90
    Comparative
          13.51
              CW -200
                     50  1.70
                             85  50  1.90 200 1.90
    Example 37
    Comparative
          1   CW -200
                     50  1.80
                             82  50  1.90 200 1.90
    Example 38
    Comparative
          500 CW -200
                     50  1.80
                             81  50  1.90 200 1.90
    Example 39
    Comparative
          20  CW -200
                     50  1.95
                             80  50  1.90 200 1.90
    Example 40
    Comparative
          400 -- 0   50  1.85
                             83  50  1.90 200 1.90
    Example 41
    Comparative
          200 -- 0   50  1.86
                             82  50  1.90 200 1.90
    Example 42
    Comparative
          100 -- 0   50  1.87
                             81  50  1.90 200 1.90
    Example 43
    Comparative
          50  -- 0   50  1.88
                             80  50  1.90 200 1.90
    Example 44
    Comparative
          400 CW -200
                     20  1.95
                             77  50  1.90 200 1.90
    Example 45
    Comparative
          400 CW -200
                     100 1.95
                             77  100 1.90 200 1.90
    Example 46
    Comparative
          400 CW -200
                     50  1.95
                             77  20  1.90 200 1.90
    Example 47
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.50 200 1.90
    Example 48
    Comparative
          400 CW -2 00
                     50  1.95
                             77  50  1.70 200 1.90
    Example 49
    Comparative
          400 CW -200
                     50  1.95
                             77  50  2.0  200 1.90
    Example 50
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 100 1.90
    Example 51
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.50
    Example 52
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.70
    Example 53
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 200 2.00
    Example 54
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 55
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90 200 1.90
    Example 56
    Comparative
    Example 57
    Comparative
    Example 58
          --  -- --  --  --  --  --  --   --  --
    Comparative
          --  -- --  --  --  --  50  1.90 200 1.90
    Example 59
    Comparative
          400 CW -200
                     50  1.95
                             77  --  --   200 1.90
    Example 60
    Comparative
          400 CW -200
                     50  1.95
                             77  50  1.90
    Example 61


Comparative 400 CW -200 50 1.95 77 50 SiO.sub.2 200 1.90 Example 62 deposition Comparative 400 CW -200 50 1.95 77 50 1.90 200 SiO.sub.2 Example 63 deposition Comparative 400 CW -200 50 1.95 77 50 SiO.sub.2 200 1.90 Example 64 deposition Comparative 400 CW -200 50 1.95 77 50 1.90 200 SiO.sub.2 Example 65 deposition __________________________________________________________________________ Durable Electro- Still Still Corrosion Initial Friction magnetic Liquid Lubricant -1 dB -5 dB Scratch Resistance Friction 200 passes Charac- Name of Material (min) (min) (mN) (%) (.mu.) (.mu.) teristics __________________________________________________________________________ Example 58 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 59 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 60 polar PFPE 100 >120 80 1 0.25 0.40 .smallcircle. Example 61 polar PFPE 100 >120 80 1 0.25 0.40 .smallcircle. Example 62 polar PFPE >120 >120 120 1 0.15 0.20 .smallcircle. Example 63 polar PFPE >120 >120 120 1 0.15 0.20 .smallcircle. Example 64 polar PFPE >120 >120 120 1 0.15 0.20 .smallcircle. Example 65 polar PFPE >120 >120 120 1 0.15 0.20 .smallcircle. Example 66 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 67 polar PFPE 100 >120 80 1 0.25 0.40 .smallcircle. Example 68 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 69 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 70 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 71 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 72 polar PFPE 70 100 75 5 0.25 0.45 .smallcircle. Example 73 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 74 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 75 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 76 non-polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 77 PFA 90 120 80 1 0.20 0.40 .smallcircle. Example 78 phosphazene 90 120 80 1 0.25 0.38 .smallcircle. Example 79 non-polar PFPE >120 >120 80 1 0.15 0.20 .smallcircle. Example 80 PFA >120 >120 80 1 0.15 0.20 .smallcircle. Example 81 phosphazene >120 >120 80 1 0.15 0.20 .smallcircle. Example 82 FA108 90 120 80 1 0.25 0.40 .smallcircle. Example 83 alkylate 90 120 80 1 0.20 0.40 .smallcircle. Example 84 polar PFPE 90 120 80 1 0.25 0.40 .smallcircle. Example 85 polar PFPE 90 >120 80 1 0.25 0.40 .smallcircle. Comparative polar PFPE 0.5 1 10 13 0.50 0.85 .smallcircle. Example 37 Comparative polar PFPE 3 5 20 10 0.35 0.80 .smallcircle. Example 38 Comparative polar PFPE 3 5 25 10 0.32 0.60 .smallcircle. Example 39 Comparative polar PFPE 3 5 20 10 0.30 0.50 .smallcircle. Example 40 Comparative polar PFPE 1 2 15 12 0.35 0.80 .smallcircle. Example 41 Comparative polar PFPE 3 5 20 10 0.30 0.50 .smallcircle. Example 42 Comparative polar PFPE 3 5 20 10 0.30 0.50 .smallcircle. Example 43 Comparative polar PFPE 3 5 20 10 0.30 0.50 .smallcircle. Example 44 Comparative polar PFPE 3 5 20 10 0.35 0.60 .smallcircle. Example 45 Comparative polar PFPE 100 >120 80 1 0.25 0.40 x Example 46 Comparative polar PFPE 30 45 40 5 0.25 0.60 .smallcircle. Example 47 Comparative polar PFPE 3 5 20 12 0.25 0.60 .smallcircle. Example 48 Comparative polar PFPE 3 5 25 11 0.25 0.50 .smallcircle. Example 49 Comparative polar PFPE 1 2 15 15 0.25 0.65 .smallcircle. Example 50 Comparative polar PFPE 30 45 35 17 0.25 0.55 .smallcircle. Example 51 Comparative polar PFPE 5 10 20 17 0.25 0.65 .smallcircle. Example 52 Comparative polar PFPE 5 10 25 15 0.25 0.60 .smallcircle.

Example 53 Comparative polar PFPE 3 5 20 17 0.25 0.80 .smallcircle. Example 54 Comparative fatty acid 1 2 80 1 0.35 100 passes .smallcircle. Example 55 stop Comparative silicone oil 1 2 80 1 0.40 100 passes .smallcircle. Example 56 stop Comparative -- 0.5 0.5 -- 25 0.50 unmeasurable .smallcircle. Example 57 Comparative polar PFPE 0.5 0.5 -- 25 0.30 0.60 .smallcircle. Example 58 Comparative polar PFPE 3 5 20 10 0.30 0.50 .smallcircle. Example 59 Comparative polar PFPE 3 5 20 5 0.30 0.50 .smallcircle. Example 60 Comparative polar PFPE 30 45 20 10 0.25 0.60 .smallcircle. Example 61 Comparative polar PFPE 5 20 20 10 0.30 100 passes .smallcircle. Example 62 stop Comparative polar PFPE 5 20 20 10 0.30 100 passes .smallcircle. Example 63 stop Comparative polar PFPE 10 30 20 10 0.30 150 passes .smallcircle. Example 64 stop Comparative polar PFPE 10 30 20 10 0.30 150 passes .smallcircle. Example 65 stop __________________________________________________________________________


EXAMPLES 86 TO 107

SiOx (x=1.900) was plasma polymerized using a mixture of tetramethoxysilane and oxygen at a discharge frequency of 400 kHz to form an undercoat layer on a polyethylene terephthalate film substrate having a thickness of 71 .mu.m, and an alloy containing 80% by weight of Co and 20% by weight of Ni was deposited thereon under an oxygen atmosphere to form a ferromagnetic metal layer (with a film thickness of 1,500 .ANG.). Then, SiOx (x=1.900) was plasma polymerized to form an intercepting layer, and each of the various hydrocarbons shown in Tables 5-1 and 5-2 was plasma polymerized thereon to form a protective layer. Further, using a polar perfluoropolyether (PFPE) as a liquid lubricant, a lubricating layer was formed. The film thickness of the intercepting layers, the kinds of hydrocarbons, the plasma frequency and the bias on film formation, and the film thickness, the refractive index and the contact angle of the resulting protective layers are shown in Tables 5-1 and 5-2, and the film thickness of the SiOx undercoat layers is shown in Tables 5-3 and 5-4. Further, for the resulting magnetic recording tapes, the still time, the corrosion resistance, the initial friction, the durable friction and the results of surface observation are shown in Tables 5-3 and 5-4.

The film thickness, the refractive index, the composition of SiOx and the contact angle were measured in the same manner as with Examples 38 to 61.

                                      TABLE 5
    __________________________________________________________________________
                                          Intercepting
    Protective Film (DLC Film)            Film (SiOx)
          Plasma      Film                Film
          Frequency   Thickness
                           Refrac-
                                Contact
                                    Raw Mate-
                                          Thickness
                                               Value
          (kHz)
               Bias
                  Bias V
                      (.ANG.)
                           tive Index
                                Angle
                                    rial Gas
                                          (.ANG.)
                                               of x
    __________________________________________________________________________
    Example 86
          400  CW -200
                      50   1.95 77  methane/H2
                                          50   1.90
    Example 87
          400  pulse
                  -200
                      50   1.97 75  methane/H2
                                          50   1.90
    Example 88
          400  CW -200
                      50   1.95 77  ethane
                                          50.  1.90
    Example 89
          400  CW -200
                      50   1.95 77  ethane/H2
                                          50   1.90
    Example 90
          400  pulse
                  -200
                      50   1.97 75  ethane
                                          50   1.90
    Example 91
          400  pulse
                  -200
                      50   1.97 75  ethane/H2
                                          50   1.90
    Example 92
          400  CW -200
                      50   1.95 77  propane
                                          50   1.90
    Example 93
          400  CW -200
                      50   1.95 77  propane/H2
                                          50   1.90
    Example 94
          400  pulse
                  -200
                      50   1.97 75  propane
                                          50   1.90
    Example 95
          400  pulse
                  -200
                      50   1.97 75  propane/H2
                                          50   1.90
    Example 96
          400  CW -200
                      50   1.95 77  butane
                                          50   1.90
    Example 97
          400  CW -200
                      50   1.95 77  butane/H2
                                          50   1.90
    Example 98
          400  pulse
                  -200
                      50   1.97 75  butane
                                          50   1.90
    Example 99
          400  pulse
                  -200
                      50   1.99 75  butane/H2
                                          50   1.90
    Example 100
          400  CW -200
                      50   1.97 76  ethylene
                                          50   1.90
    Example 101
          400  CW -200
                      50   1.97 76  ethylene/H2
                                          50   1.90
    Example 102
          400  pulse
                  -200
                      50   2.0  74  ethylene
                                          50   1.90
    Example 103
          400  pulse
                  -200
                      50   2.0  74  ethylene/H2
                                          50   1.90
    Example 104
          400  CW -200
                      50   1.97 76  acetylene
                                          50   1.90
    Example 105
          400  CW -200
                      50   1.97 76  acetylene/H2
                                          50   1.90
    Example 106
          400  pulse
                  -200
                      50   2.0  74  acetylene
                                          50   1.90
    Example 107
          400  pulse
                  -200
                      50   2.0  74  acetylene/H2
                                          50   1.90
    __________________________________________________________________________
    Undercoat
    layer (SiOx)                     Corro-
          Film                       sion    Durable
          Thick-         Still
                             Still   Resis-
                                         Initial
                                             Friction
          ness
              Value
                 Liquid Lubricant
                         -1 dB
                             -5 dB
                                 Scratch
                                     tance
                                         Friction
                                             200 passes
          (.ANG.)
              of x
                 Name of Material
                         (min)
                             (min)
                                 (mN)
                                     (%) (.mu.)
                                             .mu.)
    __________________________________________________________________________
    Example 86
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 87
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 88
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 89
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 90
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 91
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 92
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 93
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 94
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 95
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 96
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 97
          200 1.90
                 polar PFPE
                          100
                             >120
                                 80  1   0.15
                                             0.20
    Example 98
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 99
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 100
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15
                                             0.20
    Example 101
          200 1.90
                 polar PFPE
                         >120
                             >120
                                 80  1   0.15


0.20 Example 102 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 Example 103 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 Example 104 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 Example 105 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 Example 106 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 Example 107 200 1.90 polar PFPE >120 >120 80 1 0.15 0.20 __________________________________________________________________________


EXAMPLES 108 TO 122 AND COMPARATIVE EXAMPLES 66 TO 72

Magnetic recording media were produced in the same manner as with the above-mentioned Examples, with the exception that CW and a pulse bias were used as the negative bias, and the pulse frequency Hz, the flow ratio of CH.sub.4 /H and the pulse ratio ON/OFF were variously changed. The pulse ratio was changed by setting the ON/OFF time with a setting switch attached to a power supply.

Results are shown in the following Tables 6-1 to 6-4.

                                      TABLE 6
    __________________________________________________________________________
          Plasma      Flow Pulse
                                Pulse
                                     Film
          Frequency   Ratio
                           Ratio
                                Frequency
                                     Thickness
                                          Refract-
                                               Contact
          (kHz)
               Bias
                  Bias V
                      (CH.sub.4 /H.sub.2)
                           (ON/OFF)
                                Hz   (.ANG.)
                                          ive Index
                                               Angle
    __________________________________________________________________________
    Example 108
          400  CW -200
                      1/3  --   --   50   1.95 77
    Example 109
          400  CW -200
                      1/2  --   --   50   1.95 77
    Example 110
          400  CW -200
                      2/1  --   --   50   1.95 77
    Example 111
          400  CW -200
                      3/1  --   --   50   1.95 77
    Example 112
          400  pulse
                  -200
                      1/1  1/3   50  50   1.95 77
    Example 113
          400  pulse
                  -200
                      1/1  1/2   50  50   1.95 77
    Example 114
          400  pulse
                  -200
                      1/1  2/1   50  50   1.95 77
    Example 115
          400  pulse
                  -200
                      1/1  3/1   50  50   1.95 77
    Example 116
          400  pulse
                  -200
                      1/1  1/1   10  50   1.95 77
    Example 119
          400  pulse
                  -200
                      1/1  1/1   20  50   1.95 77
    Example 118
          400  pulse
                  -200
                      1/1  1/1  100  50   1.95 77
    Example 119
          400  pulse
                  -200
                      1/1  1/1  200  50   1.95 77
    Example 120
          400  pulse
                  -200
                      1/1  1/1  300  50   1.95 77
    Ekample 121
          400  pulse
                  -200
                      1/1  1/1  400  50   1.95 77
    Example 122
          400  pulse
                  -200
                      1/1  1/1  500  50   1.95 77
    Comparative
          400  CW -200
                      1/4  --   --   50   1.88 80
    Example 66
    Comparative
          400  CW -200
                      4/1  --   --   50   1.9  80
    Example 67
    Comparative
          400  pulse
                  -200
                      1/1  4/1   50  50   1.88 77
    Example 68
    Comparative
          400  pulse
                  -200
                      1/1  1/4   50  50   1.85 82
    Example 69
    Comparative
          400  pulse
                  -200
                      1/1  1/1   5   50   1.88 80
    Example 70
    Comparative
          400  pulse
                  -200
                      1/1  1/1  600  50   1.8  81
    Example 71
    Comparative
          400  pulse
                  -200
                      1/1  1/1  1000 50   1.8  81
    Example 72
    __________________________________________________________________________
                               Durable
          Still Still
                    Corrosion
                           Initial
                               Friction
          -1 dB -5 dB
                    Resistance
                           Friction
                               200 passes
                                      Scratch
                                          Electromagnetic
          (min) (min)
                    (%)    (.mu.)
                               (.mu.) (mN)
                                          Characteristics
    __________________________________________________________________________
    Example 108
           120   90 3      0.25
                               0.34    80 .smallcircle.
    Example 109
           120   90 3      0.25
                               0.34    80 .smallcircle.
    Example 110
           120   90 3      0.25
                               0.34    80 .smallcircle.
    Example 111
           120   90 3      0.25
                               0.34    80 .smallcircle.
    Example 112
          >120  120 2      0.2 0.35    90 .smallcircle.
    Example 113
          >120  120 2      0.2 0.34   100 .smallcircle.
    Example 114
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 115
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 116
          >120  120 2      0.2 0.35    90 .smallcircle.
    Example 117
          >120  120 2      0.2 0.35   100 .smallcircle.
    Example 118
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 119
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 120
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 121
          >120  120 2      0.2 0.35   120 .smallcircle.
    Example 122
          >120  120 2      0.2 0.35   120 .smallcircle.
    Comparative
            30   10 5      0.3 0.7     25 x
    Example 66
    Comparative
            30   10 10     0.3 0.5     25 x
    Example 67
    Comparative
            10   30 10     0.25
                               0.55    25 x
    Example 68
    Comparative
            30   5  10     0.3 0.7     20 x
    Example 69
    Comparative
            20   10 5      0.3 0.7     20 x
    Example 70
    Comparative
            20   5  10     0.32
                               0.6     20 x
    Example 71
    Comparative
            20   5  10     0.32
                               0.6     20 x
    Example 72
    __________________________________________________________________________


In the magnetic recording medium of the present invention having the ferromagnetic metal layer serving as the magnetic layer, the specified silicon oxide films are used as the undercoat layer and the insulating layer for the magnetic layer, the plasma-polymerized hydrogen-containing carbon film, plasma polymerized under the specified applying conditions and having the specified characteristics, is used as the protective layer, and the lubricating layer is formed of the specified fluorine compound, thereby providing the magnetic recording medium with excellent electromagnetic characteristics, corrosion resistance, durability, abrasion resistance and lubricity.

By the combination of the foregoing and the contact angle of the protective, as formed, being less than 80.degree., as set forth in the following claims, the present invention has excellent effect in the still durability. This is shown in Table 1, especially Tables 1-6 to 1-10, and Comparative Examples 2 to 9. In addition to the still durability, the present invention has better effect in initial friction and durable friction as compared to a magnetic recording tape whose contact angle is 80.degree. or more, as shown in Comparative Examples 2 to 9.


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