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United States Patent | 5,666,176 |
Kurematsu | September 9, 1997 |
A photomask (5) of a liquid crystal display panel is formed by photolithographic exposure of a photosensitive resin layer through micro-lenses (3), and the apertures thereof are in complete alignment with condensed light through the micro-lenses, so that unnecessary light, such as strayed light, can be effectively masked. The liquid crystal display panel thus formed is provided with an increased effective aperture rate and suitable for a clearer image display.
Inventors: | Kurematsu; Katsumi (Kawasaki, JP) |
Assignee: | Canon Kabushiki Kaisha (Tokyo, JP) |
Appl. No.: | 528650 |
Filed: | September 7, 1995 |
May 11, 1992[JP] | 4-143716 |
Current U.S. Class: | 349/95; 349/110 |
Intern'l Class: | G02F 001/133.5 |
Field of Search: | 354/67,62,40,41,42 349/57,95,110,187 |
3744878 | Jul., 1973 | Kiemle et al. | 359/40. |
4790632 | Dec., 1988 | Miyakawa et al. | 359/40. |
4952026 | Aug., 1990 | Bellman et al. | 350/1. |
4981340 | Jan., 1991 | Kurematsu et al. | 350/333. |
5227900 | Jul., 1993 | Inaba et al. | 359/56. |
Foreign Patent Documents | |||
309948 | Apr., 1989 | EP. | |
157215 | Sep., 1982 | JP. | |
59-172627 | Sep., 1984 | JP | 354/67. |
26213 | Feb., 1985 | JP. | |
1816 | Jan., 1990 | JP. | |
129268 | Apr., 1992 | JP. |