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United States Patent | 5,597,868 |
Kunz | January 28, 1997 |
Anti-reflective coatings and methods for forming these anti-reflective coatings are disclosed that have a polymer chemistry and optical characteristics suitable for suppressing the light that reflects off a circuit substrate during a photolithographic process. These anti-reflective coatings include a phenolic polymer material and an epoxide-containing polymer material that can be combined in a select proportion to form a thermally curable polymeric anti-reflective coating. The select proportions of the combined materials tailors the optical characteristic of the anti-reflective coating to attenuate energy about a select range of wavelengths.
Inventors: | Kunz; Roderick R. (Acton, MA) |
Assignee: | Massachusetts Institute of Technology (Cambridge, MA) |
Appl. No.: | 206595 |
Filed: | March 4, 1994 |
Current U.S. Class: | 525/154; 525/451; 525/502; 525/508 |
Intern'l Class: | C08L 061/10; C08L 033/12 |
Field of Search: | 525/154,502,508,451 |
4491628 | Jan., 1985 | Ito et al. | 430/176. |
4910122 | Mar., 1990 | Arnold et al. | 430/313. |
5045431 | Sep., 1991 | Allen et al. | 430/270. |
5071730 | Dec., 1991 | Allen et al. | 430/270. |
5190992 | Mar., 1993 | Kato et al. | 522/180. |
Yen et al., "An Anti-Reflective Coating for Use with PMMA at 193 nm", J. Electrochem Soc., vol. 139, No. 2, pp. 616-619 (1992). Horn, "Antireflection Layers and Planarization for Microlithography", Solid State Technology, pp. 57-62 (1991). "A New Multifunctional Coating that Replaces Adhesion Promoter, Anti-reflective Coating and Release Layer with One Easy to Apply Coat for Photolithography", Brewer Science, Inc. |