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United States Patent | 5,338,939 |
Nishino ,   et al. | August 16, 1994 |
A charged particle beam exposure method deflects a charged particle beam in a deflection system which includes electromagnetic deflection coils and an electromagnetic lens. The charged particle beam exposure method includes controlling the deflection system based on deflection data, and blocking heat radiation from at least the electromagnetic deflection coils by a partition so as to prevent the heat radiation from reaching the electromagnetic lens and to prevent heat conduction to the electromagnetic lens by the partition.
Inventors: | Nishino; Hisayasu (Kawasaki, JP); Yamada; Akio (Kawasaki, JP); Oae; Yoshihisa (Kawasaki, JP); Yasuda; Hiroshi (Kawasaki, JP) |
Assignee: | Fujitsu Limited (Kawasaki, JP) |
Appl. No.: | 067108 |
Filed: | May 26, 1993 |
Jan 13, 1992[JP] | 4-004195 | |
May 29, 1992[JP] | 4-137330 |
Current U.S. Class: | 250/396ML; 250/492.2; 250/492.3; 335/213 |
Intern'l Class: | H01J 003/32 |
Field of Search: | 250/396 ML,396 R,492.2,492.3 335/210,213 |
4806767 | Feb., 1989 | Kubozoe et al. | 250/396. |
5008549 | Apr., 1991 | Crewe | 250/396. |
5041731 | Aug., 1991 | Oae et al. | 250/396. |
5264706 | Nov., 1993 | Oae et al. | 250/396. |
Foreign Patent Documents | |||
0084653 | Aug., 1983 | EP | 250/396. |
2-232919 | Sep., 1990 | JP. |