Back to EveryPatent.com
United States Patent | 5,328,863 |
Cappelletti ,   et al. | July 12, 1994 |
A process which provides for the creation of regions of source and drain having different doping, wherein the doping, and thus the capacitance, of the drain regions is lower than that of the source regions.
Inventors: | Cappelletti; Paolo (Seveso, IT); Lucherini; Silvia (Milan, IT); Vajana; Bruno (Bergamo, IT) |
Assignee: | SGS-Thomson Microelectronics, S.r.l. (Agrate Brianz, IT) |
Appl. No.: | 668873 |
Filed: | March 13, 1991 |
Mar 15, 1990[IT] | 1969 A/90 |
Current U.S. Class: | 438/278; 257/E21.671; 257/E21.672; 257/E21.673; 257/E27.102; 438/286; 438/290; 438/305 |
Intern'l Class: | H01L 021/70; H01L 027/00 |
Field of Search: | 437/40,41,44,45,48,52 |
4513494 | Apr., 1985 | Batra | 437/48. |
4514897 | May., 1985 | Chiu et al. | 437/48. |
4536944 | Aug., 1985 | Bracco et al. | 437/44. |
4649629 | Mar., 1987 | Miller et al. | 437/48. |
4649638 | Mar., 1987 | Fang et al. | |
4698787 | Oct., 1987 | Mukherjee et al. | |
4852062 | Jul., 1989 | Baker et al. | |
4868619 | Sep., 1989 | Mukherjee et al. | |
4874713 | Oct., 1989 | Gioia. | |
4956308 | Sep., 1990 | Griffin et al. | |
5024960 | Jun., 1991 | Haken. | |
5032881 | Jul., 1991 | Sardo et al. | |
5036017 | Jul., 1991 | Noda. | |
5043294 | Aug., 1991 | Willer et al. | |
5141890 | Aug., 1992 | Haken. | |
5155056 | Oct., 1992 | Jeong-Gyoo | 437/52. |
Foreign Patent Documents | |||
0227965 | Jul., 1987 | EP. | |
0401113 | Dec., 1990 | EP | 437/48. |
0451883 | Oct., 1991 | EP | 437/48. |
Patent Abstracts of Japan, vol. 13, No. 304 (E-786) [3652], published Jul. 12, 1989, relating to Japanese Application JP-A-1 081 360, Hitachi Ltd., Mar. 27, 1989. Patent Abstracts of Japan vol. 9, No. 85 (E-308) [1804], published Apr. 13, 1985, relating to Japanese Application JP-A-59 217 355, Hitachi Seisakusho K.K., Dec. 7, 1984. |