Back to EveryPatent.com
United States Patent | 5,327,415 |
Vettiger ,   et al. | July 5, 1994 |
An integrated light deflector and fabrication method are disclosed. In accordance with the method, a mold is constructed above the surface of a substrate using a thick photo resist and a mask to define a deflector plane. A collimated light beam is applied at an appropriate angle of incidence to the photo resist material and mask. The developed resist provides a mold into which the deflector body is cast, leaving a deflector body whose front surface serves as the deflecting surface.
Inventors: | Vettiger; Peter (Morgan Hill, CA); Voegeli; Otto (Morgan Hill, CA) |
Assignee: | International Business Machines Corporation (Armonk, NY) |
Appl. No.: | 173720 |
Filed: | December 23, 1993 |
Current U.S. Class: | 369/121; 369/44.12; 369/122 |
Intern'l Class: | G02B 006/32 |
Field of Search: | 369/121,122,44.12,44.14,44.23,44.13 372/43-50 |
4716559 | Dec., 1987 | Hine | 369/121. |
4861128 | Aug., 1989 | Ishikawa et al. | 369/122. |
4893296 | Jan., 1990 | Matsumoto et al. | 369/122. |
4901329 | Feb., 1990 | Leas | 372/50. |
4950622 | Aug., 1990 | Kwon et al. | 437/129. |
5001719 | Mar., 1991 | Trussell | 372/50. |
5218584 | Jun., 1993 | Gfeller | 369/44. |
Foreign Patent Documents | |||
0283044 | Mar., 1988 | EP. | |
0363547 | Sep., 1988 | EP. | |
0373329A3 | Oct., 1989 | EP | . |
0373329A2 | Oct., 1989 | EP | . |
6411390 | Jan., 1989 | JP. | |
641976 | Mar., 1989 | JP. | |
0129900 | Aug., 1989 | JP. | |
01281787 | Nov., 1989 | JP. |
Patent Abstracts of Japan, vol. 016, No. 074 (E-1170) & JP-A-32 65 117 (Mitsubishi Electric Corp), 26 Nov. 1991. Elektronik, vol. 37, No. 8, Jul. 1987, Munchen DE, pp. 69-77, E.-K. Aschmoneit `Mikromechanik in der Elektronik`. J. Mohr et al, "Requirements on Resist Layers in Deep-Etch Synchrotron Radiation Lithography", J. Vac. Sci. Technol B 6(6), Nov.-Dec. 1988, pp. 2264-2267. G. T. Forrest, "Large-scale Laser Integration Arrives", Laser Focus World, Nov. 1989, p. 21. P. Buchmann et al, "Smooth Angled Mirror Facet Fabrication", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 155-156. P. Buchmann et al, "Vertically Emitting Diode Laser with Integrated Front-Beam Monitor Photodiode", IBM Technical Disclosure Bulletin, vol. 32, No. 8A, Jan. 1990, pp. 149-150. P. Mooney, "Photodiode Array for Monitoring Individual Lasers in a Laser Array", IBM Technical Disclosure Bulletin, vol. 27, No. 7B, Dec. 1984, pp. 4344-4345. D. J. Webb et al, "Mirror Fabrication for Full-Wafer Laser Technology", Laser Diode Technology and Applications III, 23-25 Jan. 1991, SPIE Proceedings Series vol. 1418, pp. 231-239. P. Vettiger et al, "Full Wafer Technology-A New Approach to Large-Scale Wafer Fabrication and Integration", IEEE Journal of Quantum Electronics, vol. 27, No. 6, Jun. 1991, pp. 1319-1331. |