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United States Patent | 5,286,533 |
Komatsu ,   et al. | February 15, 1994 |
A method of making hard boron nitride by a plasma CVD method employing beam irradiation comprising the steps of: introducing a boron source gas and a nitrogen source gas into a plasma generated by employing a working gas selected from the group consisted of helium, hydrogen and a mixture of these under pressure of 0.01 through 100 torr, said boron source gas and said nitrogen source gas are provided with volumetric percent of 0.01 through 10% with respect to the working gas; transmitting activating innoculations formed in the plasma to a substrate of which temperature is maintained at 300.degree. through 1100.degree. C; converting the activating innoculations into precursor activating innoculations necessary for forming and growing a hard boron nitride film on the substrate by irradiating an ultraviolet beam to the activation innoculations on the substrate; and accumulating the hard boron nitride on the substrate.
Inventors: | Komatsu; Shojiro (Tsukuba, JP); Moriyoshi; Yusuke (Tokyo, JP); Kasamatsu; Mitsuo (Tsuchiura, JP); Yamada; Kawakatsu (Tsukuba, JP) |
Assignee: | National Institute for Research in Inorganic Materials (Ibaraki, JP) |
Appl. No.: | 082457 |
Filed: | June 25, 1993 |
Jun 25, 1992[JP] | 3-191693 |
Current U.S. Class: | 427/554; 427/314; 427/558; 427/569; 427/585; 427/595; 427/596 |
Intern'l Class: | B05D 003/06 |
Field of Search: | 427/554,255.2,314,554,558,569,585,595,596 |