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United States Patent | 5,276,339 |
Fujishima | January 4, 1994 |
In a semiconductor equipped with a conductivity modulating MISFET (IGBT) with a high withstand voltage in blocking forward and reverse directions, a withstand power is maintained in lieu of a drain wall disposed to improve the withstand power, and a current-carrying capacity, which is restricted by the drain wall, is increased. A potential at the drain wall disposed between a DMOS section and a collector section is transmitted at a portion between the collector section and an isolation layer by an channel stop electrode (201) that maintains the withstand power, while an increase in the current-carrying capacity is achieved by forming a conductivity modulating layer alone between the above section.
Inventors: | Fujishima; Naoto (Kanagawa, JP) |
Assignee: | Fuji Electric Co., Ltd. (Kawasaki, JP) |
Appl. No.: | 822941 |
Filed: | January 21, 1992 |
Mar 29, 1991[JP] | 3-66897 |
Current U.S. Class: | 257/127; 257/212; 257/378; 257/488; 257/E29.199 |
Intern'l Class: | H01L 027/02 |
Field of Search: | 257/487,488,489,490,494,495,127,378,401,212,124,125,546,587,409,630 |
4377816 | Mar., 1983 | Sittig | 257/495. |
4654691 | Mar., 1987 | Shirasawa et al. | 257/488. |
High Voltage DMOS and IGBT for FPD Driver IC, Proc. of the 1990 Int'l. Symposium on Power Semiconductor Devices & ICs, Tokyo, pp. 60-65. |