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United States Patent | 5,246,539 |
Canestrari ,   et al. | September 21, 1993 |
Process for producing metrological structures particularly useful for analyzing the accuracy of instruments for measuring alignment on processed substrates. The process produces metrological structures which have measurement profiles defined on substrate regions and on industrially-processed regions on a single wafer. The measurement profiles define statistical distributions which can be detected by measurement machines in order to analyze the measurement accuracy of the machines themselves.
Inventors: | Canestrari; Paolo (Merate, IT); Lietti; Carlo (Busto Arsizio, IT); Rivera; Giovanni (Castiglione Delle Stiviere, IT) |
Assignee: | SGS-Thomson Microelectronics S.r.l. (Agrate Brianza, IT) |
Appl. No.: | 938826 |
Filed: | September 1, 1992 |
Sep 04, 1991[IT] | MI91 A 002345 |
Current U.S. Class: | 216/2; 216/17; 216/47; 216/48; 216/67; 257/E21.53; 356/401 |
Intern'l Class: | H01L 021/306; B44C 001/22; C03C 015/00; C23F 001/00 |
Field of Search: | 156/626,651,652,653,657,659.1,661.1,662,345,656 437/8,225,228,233,235,238,241,245,229 430/313,317,318 73/432.1,865.9 |
4650744 | Mar., 1987 | Amano | 156/626. |
5002902 | Mar., 1991 | Watanabe | 437/235. |
5017512 | May., 1991 | Takagi | 437/227. |
5100508 | Mar., 1992 | Yoshida et al. | 156/659. |
5114531 | May., 1992 | Fukushima et al. | 156/659. |
Foreign Patent Documents | |||
0126621 | Nov., 1984 | EP. | |
0377101 | Jul., 1990 | EP. | |
0411797 | Feb., 1991 | EP. |