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United States Patent | 5,242,780 |
Lin ,   et al. | September 7, 1993 |
An electrophoretic positive working photosensitive composition for producing a photoresist pattern on metal base plate comprises a photosensitive compound, in which a photosensitive quinone diazide group is grafted on a polyester, and an acrylic copolymer containing carboxyl group, the composition forms a smooth photoresist film on the plate and has a good adhesion to the surface that no pinehole is found.
Inventors: | Lin; Hsien-Kuang (Taipei, TW); Shieh; Jim-Chyuan (Miao Li, TW); Lin; Dhei-Jhai (Taoyuan, TW) |
Assignee: | Industrial Technology Research Institute (TW) |
Appl. No.: | 780691 |
Filed: | October 18, 1991 |
Current U.S. Class: | 430/190; 430/165; 430/168; 430/169; 430/191; 430/192; 430/193; 430/277.1; 430/318; 430/326; 430/910 |
Intern'l Class: | G03F 007/023; G03F 007/32 |
Field of Search: | 430/190,191,192,193,165,169,326 |
3647443 | Mar., 1972 | Rauner et al. | 430/190. |
3738835 | Jun., 1972 | Bakos | 96/36. |
4028111 | Jun., 1977 | Iwasaki et al. | 430/190. |
4681923 | Jul., 1987 | Demmer | 430/190. |
4763458 | Jun., 1987 | Ishikawa | 430/318. |
4975351 | Dec., 1990 | Akaki et al. | 430/192. |
5055374 | Oct., 1991 | Seio et al. | 430/165. |
Foreign Patent Documents | |||
0265387 | Apr., 1988 | EP. | |
63-297473 | Dec., 1988 | JP. | |
1-4672 | Jan., 1989 | JP. | |
1-90270 | Apr., 1989 | JP. |