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United States Patent | 5,017,514 |
Nishimoto | May 21, 1991 |
A semiconductor device has a device section and a peripheral section outside the device section. A main vernier pattern is formed in the peripheral section for inspecting finely an alignment state in a first direction, and a subsidiary vernier pattern is formed in the peripheral section near the main vernier pattern for inspecting coarsely an alignment state in a second direction at a right angle to the first direction.
Inventors: | Nishimoto; Shozo (Tokyo, JP) |
Assignee: | NEC Corporation (JP) |
Appl. No.: | 441522 |
Filed: | November 27, 1989 |
Nov 25, 1988[JP] | 63-298606 |
Current U.S. Class: | 438/14; 356/400; 356/401; 430/5; 430/311; 430/312; 438/975 |
Intern'l Class: | H01L 021/00; H01L 021/02; H01L 021/30; H01L 021/66 |
Field of Search: | 437/8,229 156/659.1,660,661.1 148/DIG. 102 430/5,311,312,313,314,315 250/491.1,492.2 356/123,400,401,399 |
4405238 | Sep., 1983 | Grobman et al. | 356/401. |
4538105 | Aug., 1985 | Ausschnitt | 437/8. |
4547446 | Oct., 1985 | Tam | 356/399. |
4600309 | Jul., 1986 | Fay | 356/401. |
4606643 | Aug., 1986 | Tam | 356/401. |
4610940 | Sep., 1986 | Araihara | 430/5. |
4623257 | Nov., 1986 | Feather | 356/400. |
4626907 | Dec., 1986 | Schedewie | 356/401. |
4742233 | May., 1988 | Kuyel | 250/291. |
Foreign Patent Documents | |||
0101710 | Jun., 1982 | JP. | |
0134826 | Aug., 1984 | JP. | |
0273724 | Nov., 1987 | JP. | |
0273725 | Nov., 1987 | JP. | |
0260045 | Oct., 1988 | JP. | |
2067282 | Jul., 1986 | GB | 356/401. |